Structure of CNx films (0 ≤ x ≤ 0.5) deposited by arc sputtering of graphite View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2007-06

AUTHORS

A. P. Rubshtein, I. Sh. Trakhtenberg, E. G. Volkova, A. B. Vladimirov, V. A. Yugov, A. G. Gontar, V. N. Tkach

ABSTRACT

The structure of a-C and CNx coatings 1–3 μ thick deposited on metal substrates by arc-pulse sputtering of graphite target in nitrogen background at P = (10−2 −5) Pa was studied by transmission electron microscopy and scanning electron microscopy. Concentration and depth distribution of nitrogen in CNx depend on progressive saturation of graphite target. Nitrogen-free coatings (x = 0) consist of amorphous matrix with multiwalled nanotubes. Structure of carbon nitride coatings depends on nitrogen concentration. Over the range of CN/CC < 0.15 and CN/CC > 0.4 CNx coatings are amorphous. The structure of CN0.15 More... »

PAGES

142-146

Journal

TITLE

Journal of Superhard Materials

ISSUE

3

VOLUME

29

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.3103/s1063457607030057

DOI

http://dx.doi.org/10.3103/s1063457607030057

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1000693995


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