Microstructure and optical properties of Pr3+-doped hafnium silicate films View Full Text


Ontology type: schema:ScholarlyArticle      Open Access: True


Article Info

DATE

2013-01-21

AUTHORS

YongTao An, Christophe Labbé, Larysa Khomenkova, Magali Morales, Xavier Portier, Fabrice Gourbilleau

ABSTRACT

In this study, we report on the evolution of the microstructure and photoluminescence properties of Pr3+-doped hafnium silicate thin films as a function of annealing temperature (TA). The composition and microstructure of the films were characterized by means of Rutherford backscattering spectrometry, spectroscopic ellipsometry, Fourier transform infrared absorption, and X-ray diffraction, while the emission properties have been studied by means of photoluminescence (PL) and PL excitation (PLE) spectroscopies. It was observed that a post-annealing treatment favors the phase separation in hafnium silicate matrix being more evident at 950°C. The HfO2 phase demonstrates a pronounced crystallization in tetragonal phase upon 950°C annealing. Pr3+ emission appeared at TA = 950°C, and the highest efficiency of Pr3+ ion emission was detected upon a thermal treatment at 1,000°C. Analysis of the PLE spectra reveals an efficient energy transfer from matrix defects towards Pr3+ ions. It is considered that oxygen vacancies act as effective Pr3+ sensitizer. Finally, a PL study of undoped HfO2 and HfSiOx matrices is performed to evidence the energy transfer. More... »

PAGES

43

Identifiers

URI

http://scigraph.springernature.com/pub.10.1186/1556-276x-8-43

DOI

http://dx.doi.org/10.1186/1556-276x-8-43

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1004028252

PUBMED

https://www.ncbi.nlm.nih.gov/pubmed/23336520


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