Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2013-09

AUTHORS

S. G. Psakh’e, A. I. Lotkov, S. N. Meisner, L. L. Meisner, V. P. Sergeev, A. R. Sungatulin

ABSTRACT

Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ∼20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 μm. It was suggested that grain orientation influences the observed effect. More... »

PAGES

457-463

References to SciGraph publications

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s2075113313050134

DOI

http://dx.doi.org/10.1134/s2075113313050134

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1039554785


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