Study of the Effect of Laser Radiation on the Parameters of Alumina Films Formed by Atomic Layer Deposition View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2018-09

AUTHORS

A. A. Dedkova, N. A. Dyuzhev, V. Yu. Kireev, I. E. Klemente, A. V. Myakon’kikh, K. V. Rudenko

ABSTRACT

The effect of laser radiation with a wavelength of 970 nm and a power density of 0.29–2.10 W/cm2 on the process of atomic layer deposition of alumina films from precursors (trimethylaluminium + water vapor) is studied. Laser irradiation is performed at the stages of reactor purging after the introduction of precursors. The results of a comprehensive analysis involving spectral ellipsometry, atomic force microscopy, X-ray diffractometry, and secondary-ion mass spectrometry have revealed that laser irradiation (i) does not alter the rate of deposition of alumina films onto silicon slices; (ii) does not alter the surface relief (roughness) of alumina films; (iii) does not alter the depth profile of the chemical composition of alumina films; (iv) reduces the average density of irradiated regions of alumina films by 5–10% relative to the density of nonirradiated regions. More... »

PAGES

502-507

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s199507801805004x

DOI

http://dx.doi.org/10.1134/s199507801805004x

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1112856865


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0306", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Physical Chemistry (incl. Structural)", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/03", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Chemical Sciences", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "National Research University of Electronic Technology", 
          "id": "https://www.grid.ac/institutes/grid.436529.f", 
          "name": [
            "National Research University of Electronic Technology, 124498, MoscowZelenograd, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Dedkova", 
        "givenName": "A. A.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "National Research University of Electronic Technology", 
          "id": "https://www.grid.ac/institutes/grid.436529.f", 
          "name": [
            "National Research University of Electronic Technology, 124498, MoscowZelenograd, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Dyuzhev", 
        "givenName": "N. A.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "National Research University of Electronic Technology", 
          "id": "https://www.grid.ac/institutes/grid.436529.f", 
          "name": [
            "National Research University of Electronic Technology, 124498, MoscowZelenograd, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Kireev", 
        "givenName": "V. Yu.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Russian Academy of Sciences", 
          "id": "https://www.grid.ac/institutes/grid.4886.2", 
          "name": [
            "Valiev Institute of Physics and Technology, Russian Academy of Sciences, 117218, Moscow, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Klemente", 
        "givenName": "I. E.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Russian Academy of Sciences", 
          "id": "https://www.grid.ac/institutes/grid.4886.2", 
          "name": [
            "Valiev Institute of Physics and Technology, Russian Academy of Sciences, 117218, Moscow, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Myakon\u2019kikh", 
        "givenName": "A. V.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Russian Academy of Sciences", 
          "id": "https://www.grid.ac/institutes/grid.4886.2", 
          "name": [
            "Valiev Institute of Physics and Technology, Russian Academy of Sciences, 117218, Moscow, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Rudenko", 
        "givenName": "K. V.", 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "sg:pub.10.1134/s1063784209120159", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1029734735", 
          "https://doi.org/10.1134/s1063784209120159"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1134/s1063784209120159", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1029734735", 
          "https://doi.org/10.1134/s1063784209120159"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1134/s1995078010090144", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1044535159", 
          "https://doi.org/10.1134/s1995078010090144"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1134/s1995078010090144", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1044535159", 
          "https://doi.org/10.1134/s1995078010090144"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2018-09", 
    "datePublishedReg": "2018-09-01", 
    "description": "The effect of laser radiation with a wavelength of 970 nm and a power density of 0.29\u20132.10 W/cm2 on the process of atomic layer deposition of alumina films from precursors (trimethylaluminium + water vapor) is studied. Laser irradiation is performed at the stages of reactor purging after the introduction of precursors. The results of a comprehensive analysis involving spectral ellipsometry, atomic force microscopy, X-ray diffractometry, and secondary-ion mass spectrometry have revealed that laser irradiation (i) does not alter the rate of deposition of alumina films onto silicon slices; (ii) does not alter the surface relief (roughness) of alumina films; (iii) does not alter the depth profile of the chemical composition of alumina films; (iv) reduces the average density of irradiated regions of alumina films by 5\u201310% relative to the density of nonirradiated regions.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1134/s199507801805004x", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1052540", 
        "issn": [
          "1995-0780", 
          "1995-0799"
        ], 
        "name": "Nanotechnologies in Russia", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "9-10", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "13"
      }
    ], 
    "name": "Study of the Effect of Laser Radiation on the Parameters of Alumina Films Formed by Atomic Layer Deposition", 
    "pagination": "502-507", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "c2e5bb7fdbbd47007722923e4f68c1ae7a8994f6f79b650f1846aea4de28dad6"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1134/s199507801805004x"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1112856865"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1134/s199507801805004x", 
      "https://app.dimensions.ai/details/publication/pub.1112856865"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T12:11", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000361_0000000361/records_53981_00000002.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "https://link.springer.com/10.1134%2FS199507801805004X"
  }
]
 

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This table displays all metadata directly associated to this object as RDF triples.

101 TRIPLES      21 PREDICATES      29 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1134/s199507801805004x schema:about anzsrc-for:03
2 anzsrc-for:0306
3 schema:author N7acbff23c8094cafa519643ec75ef9a2
4 schema:citation sg:pub.10.1134/s1063784209120159
5 sg:pub.10.1134/s1995078010090144
6 schema:datePublished 2018-09
7 schema:datePublishedReg 2018-09-01
8 schema:description The effect of laser radiation with a wavelength of 970 nm and a power density of 0.29–2.10 W/cm2 on the process of atomic layer deposition of alumina films from precursors (trimethylaluminium + water vapor) is studied. Laser irradiation is performed at the stages of reactor purging after the introduction of precursors. The results of a comprehensive analysis involving spectral ellipsometry, atomic force microscopy, X-ray diffractometry, and secondary-ion mass spectrometry have revealed that laser irradiation (i) does not alter the rate of deposition of alumina films onto silicon slices; (ii) does not alter the surface relief (roughness) of alumina films; (iii) does not alter the depth profile of the chemical composition of alumina films; (iv) reduces the average density of irradiated regions of alumina films by 5–10% relative to the density of nonirradiated regions.
9 schema:genre research_article
10 schema:inLanguage en
11 schema:isAccessibleForFree false
12 schema:isPartOf N292971326acc48ef87c234766383d879
13 N8b89401c67d74ad380d261e5ac5d6455
14 sg:journal.1052540
15 schema:name Study of the Effect of Laser Radiation on the Parameters of Alumina Films Formed by Atomic Layer Deposition
16 schema:pagination 502-507
17 schema:productId N7d7b8342876840988c6234478a7e13b9
18 N8c241b13d4ea4d769e92f99326e58568
19 Nf553d9fcd497455fa5d318936d83fe23
20 schema:sameAs https://app.dimensions.ai/details/publication/pub.1112856865
21 https://doi.org/10.1134/s199507801805004x
22 schema:sdDatePublished 2019-04-11T12:11
23 schema:sdLicense https://scigraph.springernature.com/explorer/license/
24 schema:sdPublisher Nf161ba8d2523439a85b818c688f5c15a
25 schema:url https://link.springer.com/10.1134%2FS199507801805004X
26 sgo:license sg:explorer/license/
27 sgo:sdDataset articles
28 rdf:type schema:ScholarlyArticle
29 N058254435ad44e0f99685ee6a8cda732 schema:affiliation https://www.grid.ac/institutes/grid.436529.f
30 schema:familyName Dedkova
31 schema:givenName A. A.
32 rdf:type schema:Person
33 N1f076f327e914a5b878e7601b394ad7d schema:affiliation https://www.grid.ac/institutes/grid.4886.2
34 schema:familyName Klemente
35 schema:givenName I. E.
36 rdf:type schema:Person
37 N292971326acc48ef87c234766383d879 schema:volumeNumber 13
38 rdf:type schema:PublicationVolume
39 N3d4a1956a21d48aab0c02446ac51112b schema:affiliation https://www.grid.ac/institutes/grid.4886.2
40 schema:familyName Rudenko
41 schema:givenName K. V.
42 rdf:type schema:Person
43 N3decf68f1f854eac9622d63cae59dae1 schema:affiliation https://www.grid.ac/institutes/grid.4886.2
44 schema:familyName Myakon’kikh
45 schema:givenName A. V.
46 rdf:type schema:Person
47 N43998b6759c241ae8b3ef69e1606b509 schema:affiliation https://www.grid.ac/institutes/grid.436529.f
48 schema:familyName Kireev
49 schema:givenName V. Yu.
50 rdf:type schema:Person
51 N524839ac4e8a43f0a3e1a5c28dc68d52 rdf:first N3d4a1956a21d48aab0c02446ac51112b
52 rdf:rest rdf:nil
53 N5678735dc6ef45ba851400d91667514f rdf:first Nc82ebd375d5b484f8b78266bbee0f990
54 rdf:rest Na0c30dd37f38480b95965e1991f6404a
55 N7acbff23c8094cafa519643ec75ef9a2 rdf:first N058254435ad44e0f99685ee6a8cda732
56 rdf:rest N5678735dc6ef45ba851400d91667514f
57 N7d7b8342876840988c6234478a7e13b9 schema:name readcube_id
58 schema:value c2e5bb7fdbbd47007722923e4f68c1ae7a8994f6f79b650f1846aea4de28dad6
59 rdf:type schema:PropertyValue
60 N8b89401c67d74ad380d261e5ac5d6455 schema:issueNumber 9-10
61 rdf:type schema:PublicationIssue
62 N8c241b13d4ea4d769e92f99326e58568 schema:name doi
63 schema:value 10.1134/s199507801805004x
64 rdf:type schema:PropertyValue
65 Na0c30dd37f38480b95965e1991f6404a rdf:first N43998b6759c241ae8b3ef69e1606b509
66 rdf:rest Nebfc12f4d53d4dcca38c5a730a1a9850
67 Nbdfb3ace859e42e2be7ab7f0239d80f8 rdf:first N3decf68f1f854eac9622d63cae59dae1
68 rdf:rest N524839ac4e8a43f0a3e1a5c28dc68d52
69 Nc82ebd375d5b484f8b78266bbee0f990 schema:affiliation https://www.grid.ac/institutes/grid.436529.f
70 schema:familyName Dyuzhev
71 schema:givenName N. A.
72 rdf:type schema:Person
73 Nebfc12f4d53d4dcca38c5a730a1a9850 rdf:first N1f076f327e914a5b878e7601b394ad7d
74 rdf:rest Nbdfb3ace859e42e2be7ab7f0239d80f8
75 Nf161ba8d2523439a85b818c688f5c15a schema:name Springer Nature - SN SciGraph project
76 rdf:type schema:Organization
77 Nf553d9fcd497455fa5d318936d83fe23 schema:name dimensions_id
78 schema:value pub.1112856865
79 rdf:type schema:PropertyValue
80 anzsrc-for:03 schema:inDefinedTermSet anzsrc-for:
81 schema:name Chemical Sciences
82 rdf:type schema:DefinedTerm
83 anzsrc-for:0306 schema:inDefinedTermSet anzsrc-for:
84 schema:name Physical Chemistry (incl. Structural)
85 rdf:type schema:DefinedTerm
86 sg:journal.1052540 schema:issn 1995-0780
87 1995-0799
88 schema:name Nanotechnologies in Russia
89 rdf:type schema:Periodical
90 sg:pub.10.1134/s1063784209120159 schema:sameAs https://app.dimensions.ai/details/publication/pub.1029734735
91 https://doi.org/10.1134/s1063784209120159
92 rdf:type schema:CreativeWork
93 sg:pub.10.1134/s1995078010090144 schema:sameAs https://app.dimensions.ai/details/publication/pub.1044535159
94 https://doi.org/10.1134/s1995078010090144
95 rdf:type schema:CreativeWork
96 https://www.grid.ac/institutes/grid.436529.f schema:alternateName National Research University of Electronic Technology
97 schema:name National Research University of Electronic Technology, 124498, MoscowZelenograd, Russia
98 rdf:type schema:Organization
99 https://www.grid.ac/institutes/grid.4886.2 schema:alternateName Russian Academy of Sciences
100 schema:name Valiev Institute of Physics and Technology, Russian Academy of Sciences, 117218, Moscow, Russia
101 rdf:type schema:Organization
 




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