Ontology type: schema:ScholarlyArticle
2016-06
AUTHORSN. V. Kuznetsova, D. V. Nechaev, N. M. Shmidt, S. Yu. Karpov, N. V. Rzheutskii, V. E. Zemlyakov, V. Kh. Kaibyshev, D. Yu. Kazantsev, S. I. Troshkov, V. I. Egorkin, B. Ya. Ber, E. V. Lutsenko, S. V. Ivanov, V. N. Jmerik
ABSTRACTPolarization-induced p-type doping of AlGaN layers with high aluminum content during plasmaassisted MBE growth has been studied. It is shown that a gradient of the AlN molar fraction in AlGaN (composition gradient) on a level of 0.005 nm–1 must be set in order to obtain a hole concentration of ~1018 cm–3 (measured by the C–V method) in AlxGa1–xN:Mg (x = 0.52–0.32) layers with dopant concentration [Mg] = 1.3 × 1018 cm–3. p–i–n photodiodes based on AlGaN heterostructures with such layers as p-emitters showed maximum photoresponsitivity in the solar-blind wavelength range (λ = 281 nm) about 35 and 48 mA/W at reverse bias voltage U = 0 and–5 V, respectively, and exhibited a dark current density of 3.9 × 10–8 A/cm2 at U =–5 V. More... »
PAGES635-638
http://scigraph.springernature.com/pub.10.1134/s1063785016060250
DOIhttp://dx.doi.org/10.1134/s1063785016060250
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