Magnetic properties of cobalt films at the initial stage of ion-beam deposition View Full Text


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Article Info

DATE

2009-06

AUTHORS

A. I. Stognij, V. F. Meshcheryakov, N. N. Novitskii, F. Fettar, M. V. Pashkevich

ABSTRACT

Variations in the magnetic properties of ion-beam-deposited cobalt (Co) films from the onset of nucleation until the passage to a bulk-like state have been studied using ferromagnetic resonance (FMR) measurements at 9.55 GHz and SQUID magnetometry. Depending on the Co film thickness, the FMR line width ΔH exhibits a sharp transition from large values (0.24 kOe < ΔH < 0.33 kOe) at the initial deposition stage to slightly varying values of ΔH < 0.16 kOe for film thicknesses above 1 nm. Similarly, Co films with thicknesses below 1 nm exhibit a significant coercivity (HC > 0.54 kOe at 10 K), while thicker films are characterized by HC < 0.16 kOe in the entire range of temperatures up to 300 K. Large values of ΔH and HC at the nucleation and initial growth stages are related to the contribution from a transition Co/Si layer formed under the action of self-irradiation with a high-energy component of the deposited flux, which is inherent in the ion-beam sputtering in high vacuum. This fraction of high-energy Co atoms does not exceed 10% of their total flux and is characterized by a mean projected range of 0.8 nm in the growing Co layer and 1.2 nm in the Si substrate. Conditions of using Co films with intermediate thicknesses within 0.8 nm < t ≤2 nm for the injection of a spin-polarized current into silicon at room temperature are discussed. More... »

PAGES

528-531

References to SciGraph publications

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s1063785009060145

DOI

http://dx.doi.org/10.1134/s1063785009060145

DIMENSIONS

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