Effect of Low-Energy Ion-Plasma Treatment on Residual Stresses in Thin Chromium Films View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2018-12

AUTHORS

A. S. Babushkin, I. V. Uvarov, I. I. Amirov

ABSTRACT

The results of studying the effect of low-energy argon ion bombardment (~30 eV) on residual mechanical stresses in a thin chromium film are presented. The change in the mean value and stress gradient as a function of the ion bombardment duration was determined by the change in the bend of test micromechanical bridges and cantilevers. A method is proposed for calculating the depth of the stress modification in a film using these structures. It has been established that the long-term ion-plasma treatment at room temperature affects stresses at a depth of more than 100 nm. More... »

PAGES

1800-1807

References to SciGraph publications

Journal

TITLE

Technical Physics

ISSUE

12

VOLUME

63

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s1063784218120228

DOI

http://dx.doi.org/10.1134/s1063784218120228

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1111752958


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