Ontology type: schema:ScholarlyArticle
2020-12
AUTHORSE. A. Lubyankina, V. V. Toporov, A. M. Mizerov, S. N. Timoshnev, K. Yu. Shubina, B. H. Bairamov, A. D. Bouravleuv
ABSTRACTInvestigation of GaN epitaxial layers on silicon substrates is driven by high potential for fabrication of high efficiency and relatively low-cost electronic devises. Growth process of GaN layers on Si by molecular-beam epitaxy is complicated by mutual diffusion of Si and Ga and differences in thermal expansion coefficients and lattice parameters causing large number of defects. To improve the quality of GaN layers high temperature nitridation of silicon substrates was applied leading to stress relaxation and decrease of diffusion. More... »
PAGES1847-1849
http://scigraph.springernature.com/pub.10.1134/s1063782620140183
DOIhttp://dx.doi.org/10.1134/s1063782620140183
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