The role of stress distribution at the film/barrier interface in formation of copper silicides View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2010-01

AUTHORS

A. V. Panin, A. R. Shugurov, I. V. Ivonin, Ye. V. Shesterikov

ABSTRACT

Silicide formation in thin Cu films subjected to thermal annealing has been investigated by atomic force microscopy, scanning electron microscopy, X-ray diffraction, and energy-dispersive X-ray spectroscopy. It is shown that the periodic stress distribution at the film/barrier interface under elevated temperatures can govern the character of copper silicide formation. The effect of barrier layer material and substrate orientation on the distribution density and shape of Cu3Si crystallites has been studied. More... »

PAGES

116-122

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s1063782610010203

DOI

http://dx.doi.org/10.1134/s1063782610010203

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1001624451


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0299", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Other Physical Sciences", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/02", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Physical Sciences", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Institute of Strength Physics and Materials Science", 
          "id": "https://www.grid.ac/institutes/grid.467103.7", 
          "name": [
            "Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences, 634021, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Panin", 
        "givenName": "A. V.", 
        "id": "sg:person.014616167505.66", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014616167505.66"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Institute of Strength Physics and Materials Science", 
          "id": "https://www.grid.ac/institutes/grid.467103.7", 
          "name": [
            "Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences, 634021, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Shugurov", 
        "givenName": "A. R.", 
        "id": "sg:person.011712150477.60", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011712150477.60"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Tomsk State University", 
          "id": "https://www.grid.ac/institutes/grid.77602.34", 
          "name": [
            "Tomsk State University, 634050, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Ivonin", 
        "givenName": "I. V.", 
        "id": "sg:person.011647535263.99", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011647535263.99"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "name": [
            "Mikran Research and Production Company, 634034, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Shesterikov", 
        "givenName": "Ye. V.", 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1016/s0921-5107(99)00499-7", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1002310033"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1557/jmr.1999.0385", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1011236995"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s1359-6454(00)00053-7", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1013458757"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s11664-001-0040-0", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1015695816", 
          "https://doi.org/10.1007/s11664-001-0040-0"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/bf00188954", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1019235899", 
          "https://doi.org/10.1007/bf00188954"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s11664-006-0187-9", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1021852208", 
          "https://doi.org/10.1007/s11664-006-0187-9"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s11664-006-0187-9", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1021852208", 
          "https://doi.org/10.1007/s11664-006-0187-9"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.microrel.2003.11.004", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1027778220"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/bf00664712", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1033474938", 
          "https://doi.org/10.1007/bf00664712"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/bf00664712", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1033474938", 
          "https://doi.org/10.1007/bf00664712"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1023/a:1018848607100", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1035047989", 
          "https://doi.org/10.1023/a:1018848607100"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1023/a:1021184726278", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1040869730", 
          "https://doi.org/10.1023/a:1021184726278"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s11664-006-0178-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1042980005", 
          "https://doi.org/10.1007/s11664-006-0178-x"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s11664-006-0178-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1042980005", 
          "https://doi.org/10.1007/s11664-006-0178-x"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s11664-007-0094-8", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1049970904", 
          "https://doi.org/10.1007/s11664-007-0094-8"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s11664-007-0094-8", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1049970904", 
          "https://doi.org/10.1007/s11664-007-0094-8"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.346912", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057957139"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1238/physica.topical.079a00228", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1064438487"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2010-01", 
    "datePublishedReg": "2010-01-01", 
    "description": "Silicide formation in thin Cu films subjected to thermal annealing has been investigated by atomic force microscopy, scanning electron microscopy, X-ray diffraction, and energy-dispersive X-ray spectroscopy. It is shown that the periodic stress distribution at the film/barrier interface under elevated temperatures can govern the character of copper silicide formation. The effect of barrier layer material and substrate orientation on the distribution density and shape of Cu3Si crystallites has been studied.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1134/s1063782610010203", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1136692", 
        "issn": [
          "1063-7826", 
          "1090-6479"
        ], 
        "name": "Semiconductors", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "1", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "44"
      }
    ], 
    "name": "The role of stress distribution at the film/barrier interface in formation of copper silicides", 
    "pagination": "116-122", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "07bce4df8fa1dffdcb36f6a993b14e0503818c1fc0a954229dca415c1b51bd8f"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1134/s1063782610010203"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1001624451"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1134/s1063782610010203", 
      "https://app.dimensions.ai/details/publication/pub.1001624451"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T09:50", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000347_0000000347/records_89786_00000000.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1134%2FS1063782610010203"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1134/s1063782610010203'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1134/s1063782610010203'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1134/s1063782610010203'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1134/s1063782610010203'


 

This table displays all metadata directly associated to this object as RDF triples.

136 TRIPLES      21 PREDICATES      41 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1134/s1063782610010203 schema:about anzsrc-for:02
2 anzsrc-for:0299
3 schema:author N6ed6bf51667f48e19211b778a83e76ea
4 schema:citation sg:pub.10.1007/bf00188954
5 sg:pub.10.1007/bf00664712
6 sg:pub.10.1007/s11664-001-0040-0
7 sg:pub.10.1007/s11664-006-0178-x
8 sg:pub.10.1007/s11664-006-0187-9
9 sg:pub.10.1007/s11664-007-0094-8
10 sg:pub.10.1023/a:1018848607100
11 sg:pub.10.1023/a:1021184726278
12 https://doi.org/10.1016/j.microrel.2003.11.004
13 https://doi.org/10.1016/s0921-5107(99)00499-7
14 https://doi.org/10.1016/s1359-6454(00)00053-7
15 https://doi.org/10.1063/1.346912
16 https://doi.org/10.1238/physica.topical.079a00228
17 https://doi.org/10.1557/jmr.1999.0385
18 schema:datePublished 2010-01
19 schema:datePublishedReg 2010-01-01
20 schema:description Silicide formation in thin Cu films subjected to thermal annealing has been investigated by atomic force microscopy, scanning electron microscopy, X-ray diffraction, and energy-dispersive X-ray spectroscopy. It is shown that the periodic stress distribution at the film/barrier interface under elevated temperatures can govern the character of copper silicide formation. The effect of barrier layer material and substrate orientation on the distribution density and shape of Cu3Si crystallites has been studied.
21 schema:genre research_article
22 schema:inLanguage en
23 schema:isAccessibleForFree false
24 schema:isPartOf N380545e5b778466786697f7dd92f22ee
25 Nabcf11b9d9504cf39e6e1e6aa6602994
26 sg:journal.1136692
27 schema:name The role of stress distribution at the film/barrier interface in formation of copper silicides
28 schema:pagination 116-122
29 schema:productId N17e69d7103af40079db727f0b4381f26
30 N8e855b29a2944e1fb2bad9a70bcab5f5
31 Nf413a522dbfc4911a5145ac15477585e
32 schema:sameAs https://app.dimensions.ai/details/publication/pub.1001624451
33 https://doi.org/10.1134/s1063782610010203
34 schema:sdDatePublished 2019-04-11T09:50
35 schema:sdLicense https://scigraph.springernature.com/explorer/license/
36 schema:sdPublisher N67c8c5ba21ad403ca6c606d20888eadd
37 schema:url http://link.springer.com/10.1134%2FS1063782610010203
38 sgo:license sg:explorer/license/
39 sgo:sdDataset articles
40 rdf:type schema:ScholarlyArticle
41 N17e69d7103af40079db727f0b4381f26 schema:name doi
42 schema:value 10.1134/s1063782610010203
43 rdf:type schema:PropertyValue
44 N380545e5b778466786697f7dd92f22ee schema:volumeNumber 44
45 rdf:type schema:PublicationVolume
46 N3e934a204ba24e8992f6322c91912214 schema:name Mikran Research and Production Company, 634034, Tomsk, Russia
47 rdf:type schema:Organization
48 N54fd270ec9204d2783be9edc10c1b0ac rdf:first sg:person.011712150477.60
49 rdf:rest N5ded598c890b429eba14edc7922e71b1
50 N5ded598c890b429eba14edc7922e71b1 rdf:first sg:person.011647535263.99
51 rdf:rest N861a22c7fb5b49f282339fd3cf810f45
52 N67c8c5ba21ad403ca6c606d20888eadd schema:name Springer Nature - SN SciGraph project
53 rdf:type schema:Organization
54 N6dd797ae16a3491a9fbb0912a3797655 schema:affiliation N3e934a204ba24e8992f6322c91912214
55 schema:familyName Shesterikov
56 schema:givenName Ye. V.
57 rdf:type schema:Person
58 N6ed6bf51667f48e19211b778a83e76ea rdf:first sg:person.014616167505.66
59 rdf:rest N54fd270ec9204d2783be9edc10c1b0ac
60 N861a22c7fb5b49f282339fd3cf810f45 rdf:first N6dd797ae16a3491a9fbb0912a3797655
61 rdf:rest rdf:nil
62 N8e855b29a2944e1fb2bad9a70bcab5f5 schema:name readcube_id
63 schema:value 07bce4df8fa1dffdcb36f6a993b14e0503818c1fc0a954229dca415c1b51bd8f
64 rdf:type schema:PropertyValue
65 Nabcf11b9d9504cf39e6e1e6aa6602994 schema:issueNumber 1
66 rdf:type schema:PublicationIssue
67 Nf413a522dbfc4911a5145ac15477585e schema:name dimensions_id
68 schema:value pub.1001624451
69 rdf:type schema:PropertyValue
70 anzsrc-for:02 schema:inDefinedTermSet anzsrc-for:
71 schema:name Physical Sciences
72 rdf:type schema:DefinedTerm
73 anzsrc-for:0299 schema:inDefinedTermSet anzsrc-for:
74 schema:name Other Physical Sciences
75 rdf:type schema:DefinedTerm
76 sg:journal.1136692 schema:issn 1063-7826
77 1090-6479
78 schema:name Semiconductors
79 rdf:type schema:Periodical
80 sg:person.011647535263.99 schema:affiliation https://www.grid.ac/institutes/grid.77602.34
81 schema:familyName Ivonin
82 schema:givenName I. V.
83 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011647535263.99
84 rdf:type schema:Person
85 sg:person.011712150477.60 schema:affiliation https://www.grid.ac/institutes/grid.467103.7
86 schema:familyName Shugurov
87 schema:givenName A. R.
88 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011712150477.60
89 rdf:type schema:Person
90 sg:person.014616167505.66 schema:affiliation https://www.grid.ac/institutes/grid.467103.7
91 schema:familyName Panin
92 schema:givenName A. V.
93 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014616167505.66
94 rdf:type schema:Person
95 sg:pub.10.1007/bf00188954 schema:sameAs https://app.dimensions.ai/details/publication/pub.1019235899
96 https://doi.org/10.1007/bf00188954
97 rdf:type schema:CreativeWork
98 sg:pub.10.1007/bf00664712 schema:sameAs https://app.dimensions.ai/details/publication/pub.1033474938
99 https://doi.org/10.1007/bf00664712
100 rdf:type schema:CreativeWork
101 sg:pub.10.1007/s11664-001-0040-0 schema:sameAs https://app.dimensions.ai/details/publication/pub.1015695816
102 https://doi.org/10.1007/s11664-001-0040-0
103 rdf:type schema:CreativeWork
104 sg:pub.10.1007/s11664-006-0178-x schema:sameAs https://app.dimensions.ai/details/publication/pub.1042980005
105 https://doi.org/10.1007/s11664-006-0178-x
106 rdf:type schema:CreativeWork
107 sg:pub.10.1007/s11664-006-0187-9 schema:sameAs https://app.dimensions.ai/details/publication/pub.1021852208
108 https://doi.org/10.1007/s11664-006-0187-9
109 rdf:type schema:CreativeWork
110 sg:pub.10.1007/s11664-007-0094-8 schema:sameAs https://app.dimensions.ai/details/publication/pub.1049970904
111 https://doi.org/10.1007/s11664-007-0094-8
112 rdf:type schema:CreativeWork
113 sg:pub.10.1023/a:1018848607100 schema:sameAs https://app.dimensions.ai/details/publication/pub.1035047989
114 https://doi.org/10.1023/a:1018848607100
115 rdf:type schema:CreativeWork
116 sg:pub.10.1023/a:1021184726278 schema:sameAs https://app.dimensions.ai/details/publication/pub.1040869730
117 https://doi.org/10.1023/a:1021184726278
118 rdf:type schema:CreativeWork
119 https://doi.org/10.1016/j.microrel.2003.11.004 schema:sameAs https://app.dimensions.ai/details/publication/pub.1027778220
120 rdf:type schema:CreativeWork
121 https://doi.org/10.1016/s0921-5107(99)00499-7 schema:sameAs https://app.dimensions.ai/details/publication/pub.1002310033
122 rdf:type schema:CreativeWork
123 https://doi.org/10.1016/s1359-6454(00)00053-7 schema:sameAs https://app.dimensions.ai/details/publication/pub.1013458757
124 rdf:type schema:CreativeWork
125 https://doi.org/10.1063/1.346912 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057957139
126 rdf:type schema:CreativeWork
127 https://doi.org/10.1238/physica.topical.079a00228 schema:sameAs https://app.dimensions.ai/details/publication/pub.1064438487
128 rdf:type schema:CreativeWork
129 https://doi.org/10.1557/jmr.1999.0385 schema:sameAs https://app.dimensions.ai/details/publication/pub.1011236995
130 rdf:type schema:CreativeWork
131 https://www.grid.ac/institutes/grid.467103.7 schema:alternateName Institute of Strength Physics and Materials Science
132 schema:name Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences, 634021, Tomsk, Russia
133 rdf:type schema:Organization
134 https://www.grid.ac/institutes/grid.77602.34 schema:alternateName Tomsk State University
135 schema:name Tomsk State University, 634050, Tomsk, Russia
136 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...