Anodization of aluminum and silicon in plasma of a non-self-sustained glow discharge View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2011-12

AUTHORS

Yu. A. Burachevsky, V. A. Burdovitsin, E. M. Oks

ABSTRACT

The results of anodization of aluminum and silicon in an oxygen plasma are presented. The plasma was generated by a non-self-sustained glow discharge with a hollow cathode excited by an electron beam at the oxygen pressure of 20 Pa. The density of the current flowing through the anodized specimen did not exceed 1.5 mA/cm2, and its temperature was 200–250°C. Continuous Al2O3 and SiO2 films were formed on the aluminum and silicon surfaces. The growth rate of the oxide layers was 150–200 nm/h for Al2O3 and 400–800 nm/h for SiO2. More... »

PAGES

1242-1245

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s1063780x11120014

DOI

http://dx.doi.org/10.1134/s1063780x11120014

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1007676147


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Tomsk State University of Control Systems and Radio-Electronics", 
          "id": "https://www.grid.ac/institutes/grid.440738.c", 
          "name": [
            "Tomsk State University of Control Systems and Radioelectronics, ul. Lenina 40, 634050, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Burachevsky", 
        "givenName": "Yu. A.", 
        "id": "sg:person.01053645532.41", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01053645532.41"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Tomsk State University of Control Systems and Radio-Electronics", 
          "id": "https://www.grid.ac/institutes/grid.440738.c", 
          "name": [
            "Tomsk State University of Control Systems and Radioelectronics, ul. Lenina 40, 634050, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Burdovitsin", 
        "givenName": "V. A.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Tomsk State University of Control Systems and Radio-Electronics", 
          "id": "https://www.grid.ac/institutes/grid.440738.c", 
          "name": [
            "Tomsk State University of Control Systems and Radioelectronics, ul. Lenina 40, 634050, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Oks", 
        "givenName": "E. M.", 
        "id": "sg:person.01150713152.97", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01150713152.97"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1016/j.surfcoat.2004.06.020", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1012395736"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1134/s1063784207090186", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1032768848", 
          "https://doi.org/10.1134/s1063784207090186"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1017/s0263034608000694", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1053753028"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1147/rd.431.0127", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063182411"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2011-12", 
    "datePublishedReg": "2011-12-01", 
    "description": "The results of anodization of aluminum and silicon in an oxygen plasma are presented. The plasma was generated by a non-self-sustained glow discharge with a hollow cathode excited by an electron beam at the oxygen pressure of 20 Pa. The density of the current flowing through the anodized specimen did not exceed 1.5 mA/cm2, and its temperature was 200\u2013250\u00b0C. Continuous Al2O3 and SiO2 films were formed on the aluminum and silicon surfaces. The growth rate of the oxide layers was 150\u2013200 nm/h for Al2O3 and 400\u2013800 nm/h for SiO2.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1134/s1063780x11120014", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1136237", 
        "issn": [
          "1063-780X", 
          "1562-6938"
        ], 
        "name": "Plasma Physics Reports", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "13", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "37"
      }
    ], 
    "name": "Anodization of aluminum and silicon in plasma of a non-self-sustained glow discharge", 
    "pagination": "1242-1245", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "249072108509b2fda118c2c996ca890046eae2773769b57fe1ec318094157ad2"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1134/s1063780x11120014"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1007676147"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1134/s1063780x11120014", 
      "https://app.dimensions.ai/details/publication/pub.1007676147"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-10T21:35", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8687_00000503.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1134%2FS1063780X11120014"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1134/s1063780x11120014'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1134/s1063780x11120014'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1134/s1063780x11120014'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1134/s1063780x11120014'


 

This table displays all metadata directly associated to this object as RDF triples.

87 TRIPLES      21 PREDICATES      31 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1134/s1063780x11120014 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N4c8d75ebad924a19b38392a48229e01c
4 schema:citation sg:pub.10.1134/s1063784207090186
5 https://doi.org/10.1016/j.surfcoat.2004.06.020
6 https://doi.org/10.1017/s0263034608000694
7 https://doi.org/10.1147/rd.431.0127
8 schema:datePublished 2011-12
9 schema:datePublishedReg 2011-12-01
10 schema:description The results of anodization of aluminum and silicon in an oxygen plasma are presented. The plasma was generated by a non-self-sustained glow discharge with a hollow cathode excited by an electron beam at the oxygen pressure of 20 Pa. The density of the current flowing through the anodized specimen did not exceed 1.5 mA/cm2, and its temperature was 200–250°C. Continuous Al2O3 and SiO2 films were formed on the aluminum and silicon surfaces. The growth rate of the oxide layers was 150–200 nm/h for Al2O3 and 400–800 nm/h for SiO2.
11 schema:genre research_article
12 schema:inLanguage en
13 schema:isAccessibleForFree false
14 schema:isPartOf N67a2341e9a62460480bafbd811c6e3b5
15 Nb14066caf44d450394fa73fdf1cf0488
16 sg:journal.1136237
17 schema:name Anodization of aluminum and silicon in plasma of a non-self-sustained glow discharge
18 schema:pagination 1242-1245
19 schema:productId N12eda6eb23b945deb230dcd065765f6a
20 N7a5560c0bc99406f9667b11232cdc228
21 Nd372971fe0d2489fb998d98f619d3742
22 schema:sameAs https://app.dimensions.ai/details/publication/pub.1007676147
23 https://doi.org/10.1134/s1063780x11120014
24 schema:sdDatePublished 2019-04-10T21:35
25 schema:sdLicense https://scigraph.springernature.com/explorer/license/
26 schema:sdPublisher N1a8e2d3cea194c9ca0d8a9160b627a0f
27 schema:url http://link.springer.com/10.1134%2FS1063780X11120014
28 sgo:license sg:explorer/license/
29 sgo:sdDataset articles
30 rdf:type schema:ScholarlyArticle
31 N12eda6eb23b945deb230dcd065765f6a schema:name dimensions_id
32 schema:value pub.1007676147
33 rdf:type schema:PropertyValue
34 N1a8e2d3cea194c9ca0d8a9160b627a0f schema:name Springer Nature - SN SciGraph project
35 rdf:type schema:Organization
36 N4c8d75ebad924a19b38392a48229e01c rdf:first sg:person.01053645532.41
37 rdf:rest Nfd0110e56e9f44b9bf744e38fe83f9e6
38 N67a2341e9a62460480bafbd811c6e3b5 schema:volumeNumber 37
39 rdf:type schema:PublicationVolume
40 N67dfa8e589f74b119f48ac4076d84bdc rdf:first sg:person.01150713152.97
41 rdf:rest rdf:nil
42 N7a5560c0bc99406f9667b11232cdc228 schema:name readcube_id
43 schema:value 249072108509b2fda118c2c996ca890046eae2773769b57fe1ec318094157ad2
44 rdf:type schema:PropertyValue
45 Nb14066caf44d450394fa73fdf1cf0488 schema:issueNumber 13
46 rdf:type schema:PublicationIssue
47 Nd372971fe0d2489fb998d98f619d3742 schema:name doi
48 schema:value 10.1134/s1063780x11120014
49 rdf:type schema:PropertyValue
50 Nf4f9f4a011bd4358b6c2b710b34f9d70 schema:affiliation https://www.grid.ac/institutes/grid.440738.c
51 schema:familyName Burdovitsin
52 schema:givenName V. A.
53 rdf:type schema:Person
54 Nfd0110e56e9f44b9bf744e38fe83f9e6 rdf:first Nf4f9f4a011bd4358b6c2b710b34f9d70
55 rdf:rest N67dfa8e589f74b119f48ac4076d84bdc
56 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
57 schema:name Engineering
58 rdf:type schema:DefinedTerm
59 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
60 schema:name Materials Engineering
61 rdf:type schema:DefinedTerm
62 sg:journal.1136237 schema:issn 1063-780X
63 1562-6938
64 schema:name Plasma Physics Reports
65 rdf:type schema:Periodical
66 sg:person.01053645532.41 schema:affiliation https://www.grid.ac/institutes/grid.440738.c
67 schema:familyName Burachevsky
68 schema:givenName Yu. A.
69 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01053645532.41
70 rdf:type schema:Person
71 sg:person.01150713152.97 schema:affiliation https://www.grid.ac/institutes/grid.440738.c
72 schema:familyName Oks
73 schema:givenName E. M.
74 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01150713152.97
75 rdf:type schema:Person
76 sg:pub.10.1134/s1063784207090186 schema:sameAs https://app.dimensions.ai/details/publication/pub.1032768848
77 https://doi.org/10.1134/s1063784207090186
78 rdf:type schema:CreativeWork
79 https://doi.org/10.1016/j.surfcoat.2004.06.020 schema:sameAs https://app.dimensions.ai/details/publication/pub.1012395736
80 rdf:type schema:CreativeWork
81 https://doi.org/10.1017/s0263034608000694 schema:sameAs https://app.dimensions.ai/details/publication/pub.1053753028
82 rdf:type schema:CreativeWork
83 https://doi.org/10.1147/rd.431.0127 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063182411
84 rdf:type schema:CreativeWork
85 https://www.grid.ac/institutes/grid.440738.c schema:alternateName Tomsk State University of Control Systems and Radio-Electronics
86 schema:name Tomsk State University of Control Systems and Radioelectronics, ul. Lenina 40, 634050, Tomsk, Russia
87 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...