Effect of the Pressure of Oxygen on the Plasma Oxidation of the Titanium Nitride Surface View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2019-11

AUTHORS

V. M. Mordvintsev, V. V. Naumov, S. G. Simakin

ABSTRACT

The dependences of the thickness of the TiO2 layer formed on the TiN surface on a partial pressure (flow) of oxygen in an argon-oxygen plasma of a magnetron sputtering system are established by secondary-ion mass spectrometry. The obtained dependences can be explained using a simple phenomenological model. Based on the previous data, a general expression for the dependences of the TiO2 thickness on the annealing time and temperature, as well as the partial pressure of oxygen, are derived. It is shown that the kinetic oxidation mode changes in the investigated annealing temperature range, which requires refining the model used previously and its parameters. The results can be used to form a nanometer oxide layer of the specified thickness on the titanium nitride surface. More... »

PAGES

402-408

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s1063739719060064

DOI

http://dx.doi.org/10.1134/s1063739719060064

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1124082936


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia", 
          "id": "http://www.grid.ac/institutes/grid.4886.2", 
          "name": [
            "Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Mordvintsev", 
        "givenName": "V. M.", 
        "id": "sg:person.016611034467.82", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016611034467.82"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia", 
          "id": "http://www.grid.ac/institutes/grid.4886.2", 
          "name": [
            "Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Naumov", 
        "givenName": "V. V.", 
        "id": "sg:person.010207276273.43", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010207276273.43"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia", 
          "id": "http://www.grid.ac/institutes/grid.4886.2", 
          "name": [
            "Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Simakin", 
        "givenName": "S. G.", 
        "id": "sg:person.014255337761.03", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014255337761.03"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "sg:pub.10.1134/s1063739716040065", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1038852470", 
          "https://doi.org/10.1134/s1063739716040065"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1134/s1995078009010133", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1048302741", 
          "https://doi.org/10.1134/s1995078009010133"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1134/s1063739713010034", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1050721590", 
          "https://doi.org/10.1134/s1063739713010034"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2019-11", 
    "datePublishedReg": "2019-11-01", 
    "description": "The dependences of the thickness of the TiO2 layer formed on the TiN surface on a partial pressure (flow) of oxygen in an argon-oxygen plasma of a magnetron sputtering system are established by secondary-ion mass spectrometry. The obtained dependences can be explained using a simple phenomenological model. Based on the previous data, a general expression for the dependences of the TiO2 thickness on the annealing time and temperature, as well as the partial pressure of oxygen, are derived. It is shown that the kinetic oxidation mode changes in the investigated annealing temperature range, which requires refining the model used previously and its parameters. The results can be used to form a nanometer oxide layer of the specified thickness on the titanium nitride surface.", 
    "genre": "article", 
    "id": "sg:pub.10.1134/s1063739719060064", 
    "inLanguage": "en", 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1136391", 
        "issn": [
          "1063-7397", 
          "1608-3415"
        ], 
        "name": "Russian Microelectronics", 
        "publisher": "Pleiades Publishing", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "6", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "48"
      }
    ], 
    "keywords": [
      "titanium nitride surface", 
      "nitride surface", 
      "nanometer oxide layer", 
      "magnetron sputtering system", 
      "argon-oxygen plasma", 
      "oxide layer", 
      "TiO2 thickness", 
      "TiO2 layer", 
      "sputtering system", 
      "specified thickness", 
      "partial pressure", 
      "TiN surface", 
      "plasma oxidation", 
      "secondary ion mass spectrometry", 
      "mode changes", 
      "temperature range", 
      "thickness", 
      "phenomenological model", 
      "simple phenomenological model", 
      "surface", 
      "layer", 
      "pressure of oxygen", 
      "pressure", 
      "oxygen", 
      "dependence", 
      "temperature", 
      "general expression", 
      "model", 
      "parameters", 
      "oxidation", 
      "range", 
      "system", 
      "plasma", 
      "results", 
      "time", 
      "effect", 
      "data", 
      "changes", 
      "spectrometry", 
      "previous data", 
      "mass spectrometry", 
      "expression"
    ], 
    "name": "Effect of the Pressure of Oxygen on the Plasma Oxidation of the Titanium Nitride Surface", 
    "pagination": "402-408", 
    "productId": [
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1124082936"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1134/s1063739719060064"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1134/s1063739719060064", 
      "https://app.dimensions.ai/details/publication/pub.1124082936"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2022-05-10T10:25", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-springernature-scigraph/baseset/20220509/entities/gbq_results/article/article_806.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "https://doi.org/10.1134/s1063739719060064"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1134/s1063739719060064'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1134/s1063739719060064'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1134/s1063739719060064'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1134/s1063739719060064'


 

This table displays all metadata directly associated to this object as RDF triples.

126 TRIPLES      22 PREDICATES      71 URIs      60 LITERALS      6 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1134/s1063739719060064 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N3c46436e66bb426496c4335d056051c4
4 schema:citation sg:pub.10.1134/s1063739713010034
5 sg:pub.10.1134/s1063739716040065
6 sg:pub.10.1134/s1995078009010133
7 schema:datePublished 2019-11
8 schema:datePublishedReg 2019-11-01
9 schema:description The dependences of the thickness of the TiO2 layer formed on the TiN surface on a partial pressure (flow) of oxygen in an argon-oxygen plasma of a magnetron sputtering system are established by secondary-ion mass spectrometry. The obtained dependences can be explained using a simple phenomenological model. Based on the previous data, a general expression for the dependences of the TiO2 thickness on the annealing time and temperature, as well as the partial pressure of oxygen, are derived. It is shown that the kinetic oxidation mode changes in the investigated annealing temperature range, which requires refining the model used previously and its parameters. The results can be used to form a nanometer oxide layer of the specified thickness on the titanium nitride surface.
10 schema:genre article
11 schema:inLanguage en
12 schema:isAccessibleForFree false
13 schema:isPartOf N529429983d504aef8530c2f45e2aae48
14 N7e987f22234b4a23bd51deca5be6508d
15 sg:journal.1136391
16 schema:keywords TiN surface
17 TiO2 layer
18 TiO2 thickness
19 argon-oxygen plasma
20 changes
21 data
22 dependence
23 effect
24 expression
25 general expression
26 layer
27 magnetron sputtering system
28 mass spectrometry
29 mode changes
30 model
31 nanometer oxide layer
32 nitride surface
33 oxidation
34 oxide layer
35 oxygen
36 parameters
37 partial pressure
38 phenomenological model
39 plasma
40 plasma oxidation
41 pressure
42 pressure of oxygen
43 previous data
44 range
45 results
46 secondary ion mass spectrometry
47 simple phenomenological model
48 specified thickness
49 spectrometry
50 sputtering system
51 surface
52 system
53 temperature
54 temperature range
55 thickness
56 time
57 titanium nitride surface
58 schema:name Effect of the Pressure of Oxygen on the Plasma Oxidation of the Titanium Nitride Surface
59 schema:pagination 402-408
60 schema:productId N3fdb473af24d43afb943e76d41755f93
61 N528ece5ed73f48149218002fe211566e
62 schema:sameAs https://app.dimensions.ai/details/publication/pub.1124082936
63 https://doi.org/10.1134/s1063739719060064
64 schema:sdDatePublished 2022-05-10T10:25
65 schema:sdLicense https://scigraph.springernature.com/explorer/license/
66 schema:sdPublisher N0a52e97eaa8b49a3a8cb2faf8f78be22
67 schema:url https://doi.org/10.1134/s1063739719060064
68 sgo:license sg:explorer/license/
69 sgo:sdDataset articles
70 rdf:type schema:ScholarlyArticle
71 N0a52e97eaa8b49a3a8cb2faf8f78be22 schema:name Springer Nature - SN SciGraph project
72 rdf:type schema:Organization
73 N3c46436e66bb426496c4335d056051c4 rdf:first sg:person.016611034467.82
74 rdf:rest N55b2a4c66bf348469c03caa012286869
75 N3fdb473af24d43afb943e76d41755f93 schema:name dimensions_id
76 schema:value pub.1124082936
77 rdf:type schema:PropertyValue
78 N528ece5ed73f48149218002fe211566e schema:name doi
79 schema:value 10.1134/s1063739719060064
80 rdf:type schema:PropertyValue
81 N529429983d504aef8530c2f45e2aae48 schema:volumeNumber 48
82 rdf:type schema:PublicationVolume
83 N55b2a4c66bf348469c03caa012286869 rdf:first sg:person.010207276273.43
84 rdf:rest Nea11a42b2cc14e61b3b050b3f9a6f288
85 N7e987f22234b4a23bd51deca5be6508d schema:issueNumber 6
86 rdf:type schema:PublicationIssue
87 Nea11a42b2cc14e61b3b050b3f9a6f288 rdf:first sg:person.014255337761.03
88 rdf:rest rdf:nil
89 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
90 schema:name Engineering
91 rdf:type schema:DefinedTerm
92 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
93 schema:name Materials Engineering
94 rdf:type schema:DefinedTerm
95 sg:journal.1136391 schema:issn 1063-7397
96 1608-3415
97 schema:name Russian Microelectronics
98 schema:publisher Pleiades Publishing
99 rdf:type schema:Periodical
100 sg:person.010207276273.43 schema:affiliation grid-institutes:grid.4886.2
101 schema:familyName Naumov
102 schema:givenName V. V.
103 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010207276273.43
104 rdf:type schema:Person
105 sg:person.014255337761.03 schema:affiliation grid-institutes:grid.4886.2
106 schema:familyName Simakin
107 schema:givenName S. G.
108 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014255337761.03
109 rdf:type schema:Person
110 sg:person.016611034467.82 schema:affiliation grid-institutes:grid.4886.2
111 schema:familyName Mordvintsev
112 schema:givenName V. M.
113 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016611034467.82
114 rdf:type schema:Person
115 sg:pub.10.1134/s1063739713010034 schema:sameAs https://app.dimensions.ai/details/publication/pub.1050721590
116 https://doi.org/10.1134/s1063739713010034
117 rdf:type schema:CreativeWork
118 sg:pub.10.1134/s1063739716040065 schema:sameAs https://app.dimensions.ai/details/publication/pub.1038852470
119 https://doi.org/10.1134/s1063739716040065
120 rdf:type schema:CreativeWork
121 sg:pub.10.1134/s1995078009010133 schema:sameAs https://app.dimensions.ai/details/publication/pub.1048302741
122 https://doi.org/10.1134/s1995078009010133
123 rdf:type schema:CreativeWork
124 grid-institutes:grid.4886.2 schema:alternateName Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia
125 schema:name Valiev Institute of Physics and Technology, Russian Academy of Sciences, Yaroslavl Branch, 150007, Yaroslavl, Russia
126 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...