Effect of local curvature of internal and external interfaces on mass transfer responsible for thin film degradation View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2013-10

AUTHORS

A. V. Panin, A. R. Shugurov

ABSTRACT

The degradation of thin films on thermal annealing was studied by atomic force and scanning electron microscopy. Main factors that govern high-temperature mass transfer in the multilayer structures were disclosed. It is shown that local curvature of internal and external interfaces is a driving force in the mass transfer responsible for thin film degradation, redistribution of alloying elements, and formation of silicides. More... »

PAGES

348-354

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s1029959913040085

DOI

http://dx.doi.org/10.1134/s1029959913040085

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1027837026


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