On the mechanism of the narrowing and broadening of Kikuchi lines during long-range action View Full Text


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Article Info

DATE

2015-07

AUTHORS

V. V. Kozlovski, V. L. Levshunova, G. P. Pokhil, D. I. Tetelbaum

ABSTRACT

In this work, a new model of a change in the structure of the surface layer under light exposure is proposed. The model is the orientation of initially randomly distributed dislocation loops due to long-range action. The preferred direction is associated with stress in the surface layer of a sample. Differently oriented crystallographic planes being equivalent at the random-loop orientation become nonequivalent after loop alignment. So, the width of corresponding Kikuchi lines changes in different ways. More... »

PAGES

836-838

References to SciGraph publications

  • 2009-04-29. Long-range effect under low-intensity irradiation of solids in JOURNAL OF SURFACE INVESTIGATION: X-RAY, SYNCHROTRON AND NEUTRON TECHNIQUES
  • 2014-11. Investigation of the effect of long-range action by measuring the Kikuchi line width in JOURNAL OF SURFACE INVESTIGATION: X-RAY, SYNCHROTRON AND NEUTRON TECHNIQUES
  • 2011-04-26. Oscillations of the charge in oxide at silicon surface as an origin of the process leading to the long-range effect in JOURNAL OF SURFACE INVESTIGATION: X-RAY, SYNCHROTRON AND NEUTRON TECHNIQUES
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    http://scigraph.springernature.com/pub.10.1134/s1027451015040308

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