Analysis of concentration field formation in titanium under aluminum ion implantation via a gas-and-metal film deposited on a target surface View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2012-04

AUTHORS

G. A. Vershinin, T. S. Grekova, G. I. Gering, I. A. Kurzina, Yu. P. Sharkeev

ABSTRACT

The concentration profiles of aluminum ions in polycrystalline titanium implanted by the polychromatic beam from a vacuum arc source via a gas-and-metal film deposited on a target surface are analyzed.

PAGES

251-254

References to SciGraph publications

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s1027451012030226

DOI

http://dx.doi.org/10.1134/s1027451012030226

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1025516069


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