Physicochemical Properties and Structure of SiCxNy:Fe Films Grown From a Gas Mixture of Ferrocene, Hydrogen and 1,1,3,3,5,5-Hexamethylcyclotrisilazane View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2018-12

AUTHORS

N. I. Fainer, R. V. Pushkarev, S. B. Ehrenburg, S. V. Trubina, V. A. Shestakov, I. S. Merenkov, M. Terauchi

ABSTRACT

Raman spectroscopy, high-resolution transmission electron microscopy (HRTEM), and EXAFS spectroscopy are used to study the composition and structure of SiCxNy:Fe films obtained by chemical vapor deposition (CVD) in the Fe–Si–C–N–H system from a mixture of hydrogen, ferrocene (C5H5)2Fe, and organosilicon compound 1,1,3,3,5,5–hexamethylcyclotrisilazane (HMCTS) C6H21N3Si3. The films are deposited under low pressures (LPCVD) at 1123–1273 K, and their phase composition at 300–1300 K is predicted using thermodynamic modeling. The obtained films are nanocomposites with amorphous matrices containing α-Fe crystallites and carbon clusters with a size of 5–10 nm. More... »

PAGES

1588-1595

References to SciGraph publications

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s0022476618070107

DOI

http://dx.doi.org/10.1134/s0022476618070107

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38 schema:description Raman spectroscopy, high-resolution transmission electron microscopy (HRTEM), and EXAFS spectroscopy are used to study the composition and structure of SiCxNy:Fe films obtained by chemical vapor deposition (CVD) in the Fe–Si–C–N–H system from a mixture of hydrogen, ferrocene (C5H5)2Fe, and organosilicon compound 1,1,3,3,5,5–hexamethylcyclotrisilazane (HMCTS) C6H21N3Si3. The films are deposited under low pressures (LPCVD) at 1123–1273 K, and their phase composition at 300–1300 K is predicted using thermodynamic modeling. The obtained films are nanocomposites with amorphous matrices containing α-Fe crystallites and carbon clusters with a size of 5–10 nm.
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