Vertically aligned layers of hexagonal boron nitride: PECVD synthesis from triethylaminoborane and structural features View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2017-09

AUTHORS

I. S. Merenkov, I. A. Kasatkin, E. A. Maksimovskii, N. I. Alferova, M. L. Kosinova

ABSTRACT

A low-temperature plasma enhanced chemical vapor deposition procedure is developed for hexagonaloro boron nitride nanowalls that are an array of sheets vertically aligned relative to the Si(100) substrate. A triethylaminoborane and ammonia gas phase was used for the first time to form h-BN nanowalls. Nanowall sizes are 50–250 nm long and 10–25 nm thick. Grazing incidence X-ray diffraction and high-resolution transmission electron microscopy techniques are employed to study the structures of boron nitridex nanowalls. The effect of synthesis parameters (film deposition temperature and growth time) on the chemical and phase compositions, surface morphology, film structure, and their optical properties are analyzed. More... »

PAGES

1018-1024

References to SciGraph publications

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/s0022476617050237

DOI

http://dx.doi.org/10.1134/s0022476617050237

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1092335281


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