Ontology type: schema:ScholarlyArticle
2020-05-25
AUTHORSYu. A. Teterin, K. I. Maslakov, E. N. Murav’ev, A. Yu. Teterin, N. A. Bulychev, B. B. Meshkov, D. S. Stepnov
ABSTRACT—Indium tin oxide (ITO) films grown on silicate glass substrates have been characterized by X-ray photoelectron spectroscopy (XPS). Valence band and core level XPS spectra have been used for qualitative and quantitative elemental analysis of the films before and after Ar+ ion etching to a depth of ~50 nm. It has been found that the densest (best quality) oxide layer was produced on the surface of sample M3, prepared at a lower pressure in comparison with the other samples and a higher discharge voltage in the magnetron plasma. Sample M2 and, to a lesser extent, sample M1 have been shown to contain constituent elements of the silicate glass substrate (Si, Al, Na, K, Ca, Mg, Fe, S, O, and C), which was due to the loose structure (poor quality) of the indium tin oxide coating on the substrate. The surface layer of the as-prepared samples contained mostly In3+ and Sn2+ ions bonded not only to oxygens of the In2O3 and SnO oxides but also to the oxygens of impurity hydroxyl and carbonate groups. Ar+ ion etching of the sample surface led to the removal of the impurities. As a result, there were mostly In3+ and Sn2+ ions bonded to oxygen in In2O3 and SnO. More... »
PAGES482-493
http://scigraph.springernature.com/pub.10.1134/s0020168520050131
DOIhttp://dx.doi.org/10.1134/s0020168520050131
DIMENSIONShttps://app.dimensions.ai/details/publication/pub.1127871329
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TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT
[
{
"@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json",
"about": [
{
"id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/03",
"inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/",
"name": "Chemical Sciences",
"type": "DefinedTerm"
},
{
"id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09",
"inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/",
"name": "Engineering",
"type": "DefinedTerm"
},
{
"id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0306",
"inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/",
"name": "Physical Chemistry (incl. Structural)",
"type": "DefinedTerm"
},
{
"id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912",
"inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/",
"name": "Materials Engineering",
"type": "DefinedTerm"
}
],
"author": [
{
"affiliation": {
"alternateName": "Prokhorov Academy of Engineering Sciences, Presnenskii val 17/1, 123557, Moscow, Russia",
"id": "http://www.grid.ac/institutes/None",
"name": [
"Kurchatov Institute National Research Centre, pl. Akademika Kurchatova 1, 123182, Moscow, Russia",
"Moscow State University, 119991, Moscow, Russia",
"Prokhorov Academy of Engineering Sciences, Presnenskii val 17/1, 123557, Moscow, Russia"
],
"type": "Organization"
},
"familyName": "Teterin",
"givenName": "Yu. A.",
"id": "sg:person.010767636021.56",
"sameAs": [
"https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010767636021.56"
],
"type": "Person"
},
{
"affiliation": {
"alternateName": "Moscow State University, 119991, Moscow, Russia",
"id": "http://www.grid.ac/institutes/grid.14476.30",
"name": [
"Moscow State University, 119991, Moscow, Russia"
],
"type": "Organization"
},
"familyName": "Maslakov",
"givenName": "K. I.",
"id": "sg:person.014735063543.61",
"sameAs": [
"https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014735063543.61"
],
"type": "Person"
},
{
"affiliation": {
"alternateName": "OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia",
"id": "http://www.grid.ac/institutes/grid.494930.3",
"name": [
"Prokhorov Academy of Engineering Sciences, Presnenskii val 17/1, 123557, Moscow, Russia",
"OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia"
],
"type": "Organization"
},
"familyName": "Murav\u2019ev",
"givenName": "E. N.",
"id": "sg:person.016355145667.50",
"sameAs": [
"https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016355145667.50"
],
"type": "Person"
},
{
"affiliation": {
"alternateName": "Kurchatov Institute National Research Centre, pl. Akademika Kurchatova 1, 123182, Moscow, Russia",
"id": "http://www.grid.ac/institutes/grid.18919.38",
"name": [
"Kurchatov Institute National Research Centre, pl. Akademika Kurchatova 1, 123182, Moscow, Russia"
],
"type": "Organization"
},
"familyName": "Teterin",
"givenName": "A. Yu.",
"id": "sg:person.013603652041.31",
"sameAs": [
"https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013603652041.31"
],
"type": "Person"
},
{
"affiliation": {
"alternateName": "Moscow Aviation Institute (National Research University), Volokolamskoe sh. 4, 125993, Moscow, Russia",
"id": "http://www.grid.ac/institutes/grid.17758.3c",
"name": [
"Lebedev Physical Institute, Russian Academy of Sciences, Leninskii pr. 53, 119991, Moscow, Russia",
"Moscow Aviation Institute (National Research University), Volokolamskoe sh. 4, 125993, Moscow, Russia"
],
"type": "Organization"
},
"familyName": "Bulychev",
"givenName": "N. A.",
"id": "sg:person.011471413375.17",
"sameAs": [
"https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011471413375.17"
],
"type": "Person"
},
{
"affiliation": {
"alternateName": "OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia",
"id": "http://www.grid.ac/institutes/grid.494930.3",
"name": [
"OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia"
],
"type": "Organization"
},
"familyName": "Meshkov",
"givenName": "B. B.",
"id": "sg:person.016475273561.51",
"sameAs": [
"https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016475273561.51"
],
"type": "Person"
},
{
"affiliation": {
"alternateName": "OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia",
"id": "http://www.grid.ac/institutes/grid.494930.3",
"name": [
"OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia"
],
"type": "Organization"
},
"familyName": "Stepnov",
"givenName": "D. S.",
"type": "Person"
}
],
"citation": [
{
"id": "sg:pub.10.1134/s0020168519020134",
"sameAs": [
"https://app.dimensions.ai/details/publication/pub.1115176149",
"https://doi.org/10.1134/s0020168519020134"
],
"type": "CreativeWork"
}
],
"datePublished": "2020-05-25",
"datePublishedReg": "2020-05-25",
"description": "Abstract\u2014Indium tin oxide (ITO) films grown on silicate glass substrates have been characterized by X-ray photoelectron spectroscopy (XPS). Valence band and core level XPS spectra have been used for qualitative and quantitative elemental analysis of the films before and after Ar+ ion etching to a depth of ~50 nm. It has been found that the densest (best quality) oxide layer was produced on the surface of sample M3, prepared at a lower pressure in comparison with the other samples and a higher discharge voltage in the magnetron plasma. Sample M2 and, to a lesser extent, sample M1 have been shown to contain constituent elements of the silicate glass substrate (Si, Al, Na, K, Ca, Mg, Fe, S, O, and C), which was due to the loose structure (poor quality) of the indium tin oxide coating on the substrate. The surface layer of the as-prepared samples contained mostly In3+ and Sn2+ ions bonded not only to oxygens of the In2O3 and SnO oxides but also to the oxygens of impurity hydroxyl and carbonate groups. Ar+ ion etching of the sample surface led to the removal of the impurities. As a result, there were mostly In3+ and Sn2+ ions bonded to oxygen in In2O3 and SnO.",
"genre": "article",
"id": "sg:pub.10.1134/s0020168520050131",
"inLanguage": "en",
"isAccessibleForFree": false,
"isPartOf": [
{
"id": "sg:journal.1297638",
"issn": [
"0020-1685",
"1608-3172"
],
"name": "Inorganic Materials",
"publisher": "Pleiades Publishing",
"type": "Periodical"
},
{
"issueNumber": "5",
"type": "PublicationIssue"
},
{
"type": "PublicationVolume",
"volumeNumber": "56"
}
],
"keywords": [
"X-ray photoelectron spectroscopy",
"silicate glass substrates",
"glass substrates",
"core level XPS spectra",
"X-ray photoelectron spectroscopy studies",
"tin oxide films",
"quantitative elemental analysis",
"photoelectron spectroscopy studies",
"high discharge voltage",
"magnetron plasma",
"indium tin oxide",
"ion etching",
"valence band",
"elemental analysis",
"sample surface",
"photoelectron spectroscopy",
"mixed oxides",
"silicate glasses",
"oxide layer",
"oxide films",
"XPS spectra",
"tin oxide",
"carbonate groups",
"spectroscopy studies",
"sample M3",
"discharge voltage",
"surface layer",
"ions",
"sample M1",
"low pressure",
"loose structure",
"In2O3",
"oxide",
"Sn2",
"constituent elements",
"oxygen",
"films",
"In3",
"sample M2",
"surface",
"layer",
"substrate",
"etching",
"spectroscopy",
"hydroxyl",
"voltage",
"plasma",
"glass",
"spectra",
"impurities",
"band",
"m3",
"structure",
"samples",
"removal",
"depth",
"pressure",
"m2",
"elements",
"results",
"comparison",
"lesser extent",
"analysis",
"group",
"M1",
"study",
"extent"
],
"name": "X-ray Photoelectron Spectroscopy Study of Indium Tin Mixed Oxides on the Surface of Silicate Glass",
"pagination": "482-493",
"productId": [
{
"name": "dimensions_id",
"type": "PropertyValue",
"value": [
"pub.1127871329"
]
},
{
"name": "doi",
"type": "PropertyValue",
"value": [
"10.1134/s0020168520050131"
]
}
],
"sameAs": [
"https://doi.org/10.1134/s0020168520050131",
"https://app.dimensions.ai/details/publication/pub.1127871329"
],
"sdDataset": "articles",
"sdDatePublished": "2022-05-10T10:25",
"sdLicense": "https://scigraph.springernature.com/explorer/license/",
"sdPublisher": {
"name": "Springer Nature - SN SciGraph project",
"type": "Organization"
},
"sdSource": "s3://com-springernature-scigraph/baseset/20220509/entities/gbq_results/article/article_844.jsonl",
"type": "ScholarlyArticle",
"url": "https://doi.org/10.1134/s0020168520050131"
}
]
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This table displays all metadata directly associated to this object as RDF triples.
194 TRIPLES
22 PREDICATES
95 URIs
84 LITERALS
6 BLANK NODES
Subject | Predicate | Object | |
---|---|---|---|
1 | sg:pub.10.1134/s0020168520050131 | schema:about | anzsrc-for:03 |
2 | ″ | ″ | anzsrc-for:0306 |
3 | ″ | ″ | anzsrc-for:09 |
4 | ″ | ″ | anzsrc-for:0912 |
5 | ″ | schema:author | N1161f64e11344849ac208fd1847cb8ea |
6 | ″ | schema:citation | sg:pub.10.1134/s0020168519020134 |
7 | ″ | schema:datePublished | 2020-05-25 |
8 | ″ | schema:datePublishedReg | 2020-05-25 |
9 | ″ | schema:description | Abstract—Indium tin oxide (ITO) films grown on silicate glass substrates have been characterized by X-ray photoelectron spectroscopy (XPS). Valence band and core level XPS spectra have been used for qualitative and quantitative elemental analysis of the films before and after Ar+ ion etching to a depth of ~50 nm. It has been found that the densest (best quality) oxide layer was produced on the surface of sample M3, prepared at a lower pressure in comparison with the other samples and a higher discharge voltage in the magnetron plasma. Sample M2 and, to a lesser extent, sample M1 have been shown to contain constituent elements of the silicate glass substrate (Si, Al, Na, K, Ca, Mg, Fe, S, O, and C), which was due to the loose structure (poor quality) of the indium tin oxide coating on the substrate. The surface layer of the as-prepared samples contained mostly In3+ and Sn2+ ions bonded not only to oxygens of the In2O3 and SnO oxides but also to the oxygens of impurity hydroxyl and carbonate groups. Ar+ ion etching of the sample surface led to the removal of the impurities. As a result, there were mostly In3+ and Sn2+ ions bonded to oxygen in In2O3 and SnO. |
10 | ″ | schema:genre | article |
11 | ″ | schema:inLanguage | en |
12 | ″ | schema:isAccessibleForFree | false |
13 | ″ | schema:isPartOf | N59fa4cf6abc24139ace0fb8906fc6779 |
14 | ″ | ″ | N82a378cf160a47e19b3cbc4d5bbf2106 |
15 | ″ | ″ | sg:journal.1297638 |
16 | ″ | schema:keywords | In2O3 |
17 | ″ | ″ | In3 |
18 | ″ | ″ | M1 |
19 | ″ | ″ | Sn2 |
20 | ″ | ″ | X-ray photoelectron spectroscopy |
21 | ″ | ″ | X-ray photoelectron spectroscopy studies |
22 | ″ | ″ | XPS spectra |
23 | ″ | ″ | analysis |
24 | ″ | ″ | band |
25 | ″ | ″ | carbonate groups |
26 | ″ | ″ | comparison |
27 | ″ | ″ | constituent elements |
28 | ″ | ″ | core level XPS spectra |
29 | ″ | ″ | depth |
30 | ″ | ″ | discharge voltage |
31 | ″ | ″ | elemental analysis |
32 | ″ | ″ | elements |
33 | ″ | ″ | etching |
34 | ″ | ″ | extent |
35 | ″ | ″ | films |
36 | ″ | ″ | glass |
37 | ″ | ″ | glass substrates |
38 | ″ | ″ | group |
39 | ″ | ″ | high discharge voltage |
40 | ″ | ″ | hydroxyl |
41 | ″ | ″ | impurities |
42 | ″ | ″ | indium tin oxide |
43 | ″ | ″ | ion etching |
44 | ″ | ″ | ions |
45 | ″ | ″ | layer |
46 | ″ | ″ | lesser extent |
47 | ″ | ″ | loose structure |
48 | ″ | ″ | low pressure |
49 | ″ | ″ | m2 |
50 | ″ | ″ | m3 |
51 | ″ | ″ | magnetron plasma |
52 | ″ | ″ | mixed oxides |
53 | ″ | ″ | oxide |
54 | ″ | ″ | oxide films |
55 | ″ | ″ | oxide layer |
56 | ″ | ″ | oxygen |
57 | ″ | ″ | photoelectron spectroscopy |
58 | ″ | ″ | photoelectron spectroscopy studies |
59 | ″ | ″ | plasma |
60 | ″ | ″ | pressure |
61 | ″ | ″ | quantitative elemental analysis |
62 | ″ | ″ | removal |
63 | ″ | ″ | results |
64 | ″ | ″ | sample M1 |
65 | ″ | ″ | sample M2 |
66 | ″ | ″ | sample M3 |
67 | ″ | ″ | sample surface |
68 | ″ | ″ | samples |
69 | ″ | ″ | silicate glass substrates |
70 | ″ | ″ | silicate glasses |
71 | ″ | ″ | spectra |
72 | ″ | ″ | spectroscopy |
73 | ″ | ″ | spectroscopy studies |
74 | ″ | ″ | structure |
75 | ″ | ″ | study |
76 | ″ | ″ | substrate |
77 | ″ | ″ | surface |
78 | ″ | ″ | surface layer |
79 | ″ | ″ | tin oxide |
80 | ″ | ″ | tin oxide films |
81 | ″ | ″ | valence band |
82 | ″ | ″ | voltage |
83 | ″ | schema:name | X-ray Photoelectron Spectroscopy Study of Indium Tin Mixed Oxides on the Surface of Silicate Glass |
84 | ″ | schema:pagination | 482-493 |
85 | ″ | schema:productId | N4e98b866256f469d97dc74cb568cc378 |
86 | ″ | ″ | Nf1a513afd55540d9a2c0f5d2d7fde32a |
87 | ″ | schema:sameAs | https://app.dimensions.ai/details/publication/pub.1127871329 |
88 | ″ | ″ | https://doi.org/10.1134/s0020168520050131 |
89 | ″ | schema:sdDatePublished | 2022-05-10T10:25 |
90 | ″ | schema:sdLicense | https://scigraph.springernature.com/explorer/license/ |
91 | ″ | schema:sdPublisher | Na20742b04ecb4bf8b19689a91f9b05fa |
92 | ″ | schema:url | https://doi.org/10.1134/s0020168520050131 |
93 | ″ | sgo:license | sg:explorer/license/ |
94 | ″ | sgo:sdDataset | articles |
95 | ″ | rdf:type | schema:ScholarlyArticle |
96 | N1161f64e11344849ac208fd1847cb8ea | rdf:first | sg:person.010767636021.56 |
97 | ″ | rdf:rest | N2073da80bdfe408bad7735fed2d3e965 |
98 | N2073da80bdfe408bad7735fed2d3e965 | rdf:first | sg:person.014735063543.61 |
99 | ″ | rdf:rest | Na8277d080b3b42de9514ddd6ae7a97be |
100 | N4e98b866256f469d97dc74cb568cc378 | schema:name | doi |
101 | ″ | schema:value | 10.1134/s0020168520050131 |
102 | ″ | rdf:type | schema:PropertyValue |
103 | N59fa4cf6abc24139ace0fb8906fc6779 | schema:issueNumber | 5 |
104 | ″ | rdf:type | schema:PublicationIssue |
105 | N82a378cf160a47e19b3cbc4d5bbf2106 | schema:volumeNumber | 56 |
106 | ″ | rdf:type | schema:PublicationVolume |
107 | N83d0862d69bc42ea93826c04820d05b4 | rdf:first | Ne37290db779f4b00a9afde6d214858be |
108 | ″ | rdf:rest | rdf:nil |
109 | N89e5f9f3643d488c9081d74ade8c2d4d | rdf:first | sg:person.011471413375.17 |
110 | ″ | rdf:rest | Na9def9a89fce488cbb0b9896526c080a |
111 | Na20742b04ecb4bf8b19689a91f9b05fa | schema:name | Springer Nature - SN SciGraph project |
112 | ″ | rdf:type | schema:Organization |
113 | Na8277d080b3b42de9514ddd6ae7a97be | rdf:first | sg:person.016355145667.50 |
114 | ″ | rdf:rest | Nbb56caeeb423431590a50a396245e3f2 |
115 | Na9def9a89fce488cbb0b9896526c080a | rdf:first | sg:person.016475273561.51 |
116 | ″ | rdf:rest | N83d0862d69bc42ea93826c04820d05b4 |
117 | Nbb56caeeb423431590a50a396245e3f2 | rdf:first | sg:person.013603652041.31 |
118 | ″ | rdf:rest | N89e5f9f3643d488c9081d74ade8c2d4d |
119 | Ne37290db779f4b00a9afde6d214858be | schema:affiliation | grid-institutes:grid.494930.3 |
120 | ″ | schema:familyName | Stepnov |
121 | ″ | schema:givenName | D. S. |
122 | ″ | rdf:type | schema:Person |
123 | Nf1a513afd55540d9a2c0f5d2d7fde32a | schema:name | dimensions_id |
124 | ″ | schema:value | pub.1127871329 |
125 | ″ | rdf:type | schema:PropertyValue |
126 | anzsrc-for:03 | schema:inDefinedTermSet | anzsrc-for: |
127 | ″ | schema:name | Chemical Sciences |
128 | ″ | rdf:type | schema:DefinedTerm |
129 | anzsrc-for:0306 | schema:inDefinedTermSet | anzsrc-for: |
130 | ″ | schema:name | Physical Chemistry (incl. Structural) |
131 | ″ | rdf:type | schema:DefinedTerm |
132 | anzsrc-for:09 | schema:inDefinedTermSet | anzsrc-for: |
133 | ″ | schema:name | Engineering |
134 | ″ | rdf:type | schema:DefinedTerm |
135 | anzsrc-for:0912 | schema:inDefinedTermSet | anzsrc-for: |
136 | ″ | schema:name | Materials Engineering |
137 | ″ | rdf:type | schema:DefinedTerm |
138 | sg:journal.1297638 | schema:issn | 0020-1685 |
139 | ″ | ″ | 1608-3172 |
140 | ″ | schema:name | Inorganic Materials |
141 | ″ | schema:publisher | Pleiades Publishing |
142 | ″ | rdf:type | schema:Periodical |
143 | sg:person.010767636021.56 | schema:affiliation | grid-institutes:None |
144 | ″ | schema:familyName | Teterin |
145 | ″ | schema:givenName | Yu. A. |
146 | ″ | schema:sameAs | https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010767636021.56 |
147 | ″ | rdf:type | schema:Person |
148 | sg:person.011471413375.17 | schema:affiliation | grid-institutes:grid.17758.3c |
149 | ″ | schema:familyName | Bulychev |
150 | ″ | schema:givenName | N. A. |
151 | ″ | schema:sameAs | https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011471413375.17 |
152 | ″ | rdf:type | schema:Person |
153 | sg:person.013603652041.31 | schema:affiliation | grid-institutes:grid.18919.38 |
154 | ″ | schema:familyName | Teterin |
155 | ″ | schema:givenName | A. Yu. |
156 | ″ | schema:sameAs | https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013603652041.31 |
157 | ″ | rdf:type | schema:Person |
158 | sg:person.014735063543.61 | schema:affiliation | grid-institutes:grid.14476.30 |
159 | ″ | schema:familyName | Maslakov |
160 | ″ | schema:givenName | K. I. |
161 | ″ | schema:sameAs | https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014735063543.61 |
162 | ″ | rdf:type | schema:Person |
163 | sg:person.016355145667.50 | schema:affiliation | grid-institutes:grid.494930.3 |
164 | ″ | schema:familyName | Murav’ev |
165 | ″ | schema:givenName | E. N. |
166 | ″ | schema:sameAs | https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016355145667.50 |
167 | ″ | rdf:type | schema:Person |
168 | sg:person.016475273561.51 | schema:affiliation | grid-institutes:grid.494930.3 |
169 | ″ | schema:familyName | Meshkov |
170 | ″ | schema:givenName | B. B. |
171 | ″ | schema:sameAs | https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016475273561.51 |
172 | ″ | rdf:type | schema:Person |
173 | sg:pub.10.1134/s0020168519020134 | schema:sameAs | https://app.dimensions.ai/details/publication/pub.1115176149 |
174 | ″ | ″ | https://doi.org/10.1134/s0020168519020134 |
175 | ″ | rdf:type | schema:CreativeWork |
176 | grid-institutes:None | schema:alternateName | Prokhorov Academy of Engineering Sciences, Presnenskii val 17/1, 123557, Moscow, Russia |
177 | ″ | schema:name | Kurchatov Institute National Research Centre, pl. Akademika Kurchatova 1, 123182, Moscow, Russia |
178 | ″ | ″ | Moscow State University, 119991, Moscow, Russia |
179 | ″ | ″ | Prokhorov Academy of Engineering Sciences, Presnenskii val 17/1, 123557, Moscow, Russia |
180 | ″ | rdf:type | schema:Organization |
181 | grid-institutes:grid.14476.30 | schema:alternateName | Moscow State University, 119991, Moscow, Russia |
182 | ″ | schema:name | Moscow State University, 119991, Moscow, Russia |
183 | ″ | rdf:type | schema:Organization |
184 | grid-institutes:grid.17758.3c | schema:alternateName | Moscow Aviation Institute (National Research University), Volokolamskoe sh. 4, 125993, Moscow, Russia |
185 | ″ | schema:name | Lebedev Physical Institute, Russian Academy of Sciences, Leninskii pr. 53, 119991, Moscow, Russia |
186 | ″ | ″ | Moscow Aviation Institute (National Research University), Volokolamskoe sh. 4, 125993, Moscow, Russia |
187 | ″ | rdf:type | schema:Organization |
188 | grid-institutes:grid.18919.38 | schema:alternateName | Kurchatov Institute National Research Centre, pl. Akademika Kurchatova 1, 123182, Moscow, Russia |
189 | ″ | schema:name | Kurchatov Institute National Research Centre, pl. Akademika Kurchatova 1, 123182, Moscow, Russia |
190 | ″ | rdf:type | schema:Organization |
191 | grid-institutes:grid.494930.3 | schema:alternateName | OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia |
192 | ″ | schema:name | OAO Solinov Research Institute of Technical Glass, ul. Krzhizhanovskogo 29/5, 117218, Moscow, Russia |
193 | ″ | ″ | Prokhorov Academy of Engineering Sciences, Presnenskii val 17/1, 123557, Moscow, Russia |
194 | ″ | rdf:type | schema:Organization |