Mechanical properties of thin Ag films on a silicon substrate studied using the nanoindentation technique View Full Text


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Article Info

DATE

2005-11

AUTHORS

A. V. Panin, A. R. Shugurov, K. V. Oskomov

ABSTRACT

The mechanical properties of thin Ag films of equal thickness containing grains of various sizes were studied. The film hardness was measured using the Oliver-Pharr techniques based on indentation work calculations or on direct measurements of the area of pyramid imprints in AFM images. In order to avoid the influence of a substrate on the measured hardness, a technique was developed to determine the true values of the film hardness. It was established that the hardness of Ag films decreases with an increase in mean grain size, whereas the elastic modulus remains almost unchanged. It was shown that the dependence of the yield stress of Ag films on grain size does not obey the classical Hall-Petch law. More... »

PAGES

2055-2059

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/1.2131144

DOI

http://dx.doi.org/10.1134/1.2131144

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1037416180


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Institute of Strength Physics and Materials Science", 
          "id": "https://www.grid.ac/institutes/grid.467103.7", 
          "name": [
            "Institute of Strength Physics and Materials Science, Siberian Division, Russian Academy of Sciences, Akademicheskii pr. 2/1, 634021, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Panin", 
        "givenName": "A. V.", 
        "id": "sg:person.014616167505.66", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014616167505.66"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Tomsk State University", 
          "id": "https://www.grid.ac/institutes/grid.77602.34", 
          "name": [
            "Institute of Strength Physics and Materials Science, Siberian Division, Russian Academy of Sciences, Akademicheskii pr. 2/1, 634021, Tomsk, Russia", 
            "Tomsk State University, pr. Lenina 36, 634050, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Shugurov", 
        "givenName": "A. R.", 
        "id": "sg:person.011712150477.60", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011712150477.60"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Institute of High Current Electronics", 
          "id": "https://www.grid.ac/institutes/grid.465280.d", 
          "name": [
            "Tomsk State University, pr. Lenina 36, 634050, Tomsk, Russia", 
            "Institute of High-Current Electronics, Siberian Division, Russian Academy of Sciences, Akademicheskii pr. 2/3, 634021, Tomsk, Russia"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Oskomov", 
        "givenName": "K. V.", 
        "id": "sg:person.014370247105.82", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014370247105.82"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1016/0040-6090(95)05834-6", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1006763618"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0257-8972(97)00522-7", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1016293369"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s1359-6454(01)00328-7", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1016424367"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0022-5096(01)00035-7", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1016504001"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0040-6090(03)00034-8", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1025827445"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0040-6090(03)00034-8", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1025827445"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/bf02666659", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1028696296", 
          "https://doi.org/10.1007/bf02666659"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/bf02666659", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1028696296", 
          "https://doi.org/10.1007/bf02666659"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1557/jmr.1992.1564", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043643805"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0257-8972(00)01063-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1045144267"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1557/jmr.1992.2040", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1052993218"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1115/1.3173068", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062105979"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2005-11", 
    "datePublishedReg": "2005-11-01", 
    "description": "The mechanical properties of thin Ag films of equal thickness containing grains of various sizes were studied. The film hardness was measured using the Oliver-Pharr techniques based on indentation work calculations or on direct measurements of the area of pyramid imprints in AFM images. In order to avoid the influence of a substrate on the measured hardness, a technique was developed to determine the true values of the film hardness. It was established that the hardness of Ag films decreases with an increase in mean grain size, whereas the elastic modulus remains almost unchanged. It was shown that the dependence of the yield stress of Ag films on grain size does not obey the classical Hall-Petch law.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1134/1.2131144", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1136591", 
        "issn": [
          "0367-3294", 
          "1063-7834"
        ], 
        "name": "Physics of the Solid State", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "11", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "47"
      }
    ], 
    "name": "Mechanical properties of thin Ag films on a silicon substrate studied using the nanoindentation technique", 
    "pagination": "2055-2059", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "b23c087b82dee9a5734fe8d2d1f7898e864c7e4ddc01fd5b8ae438816781f8b2"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1134/1.2131144"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1037416180"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1134/1.2131144", 
      "https://app.dimensions.ai/details/publication/pub.1037416180"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T13:55", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000371_0000000371/records_130814_00000003.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1134/1.2131144"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

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This table displays all metadata directly associated to this object as RDF triples.

114 TRIPLES      21 PREDICATES      37 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1134/1.2131144 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N94e215c6df814830899ea422ed65aea3
4 schema:citation sg:pub.10.1007/bf02666659
5 https://doi.org/10.1016/0040-6090(95)05834-6
6 https://doi.org/10.1016/s0022-5096(01)00035-7
7 https://doi.org/10.1016/s0040-6090(03)00034-8
8 https://doi.org/10.1016/s0257-8972(00)01063-x
9 https://doi.org/10.1016/s0257-8972(97)00522-7
10 https://doi.org/10.1016/s1359-6454(01)00328-7
11 https://doi.org/10.1115/1.3173068
12 https://doi.org/10.1557/jmr.1992.1564
13 https://doi.org/10.1557/jmr.1992.2040
14 schema:datePublished 2005-11
15 schema:datePublishedReg 2005-11-01
16 schema:description The mechanical properties of thin Ag films of equal thickness containing grains of various sizes were studied. The film hardness was measured using the Oliver-Pharr techniques based on indentation work calculations or on direct measurements of the area of pyramid imprints in AFM images. In order to avoid the influence of a substrate on the measured hardness, a technique was developed to determine the true values of the film hardness. It was established that the hardness of Ag films decreases with an increase in mean grain size, whereas the elastic modulus remains almost unchanged. It was shown that the dependence of the yield stress of Ag films on grain size does not obey the classical Hall-Petch law.
17 schema:genre research_article
18 schema:inLanguage en
19 schema:isAccessibleForFree false
20 schema:isPartOf N7f8e07f1003e4e9a8613df732b8ca3b1
21 Ncb1a8068261142faaed5603726450638
22 sg:journal.1136591
23 schema:name Mechanical properties of thin Ag films on a silicon substrate studied using the nanoindentation technique
24 schema:pagination 2055-2059
25 schema:productId N3a68f1c7531a4efc8104dc735e4d43a6
26 Nae6d1fa17c5a4892b7c3ef778e825180
27 Nf982214a41a84b7d907e91b579397aa4
28 schema:sameAs https://app.dimensions.ai/details/publication/pub.1037416180
29 https://doi.org/10.1134/1.2131144
30 schema:sdDatePublished 2019-04-11T13:55
31 schema:sdLicense https://scigraph.springernature.com/explorer/license/
32 schema:sdPublisher N454207ebf16748e392b5dfb3b6d4227a
33 schema:url http://link.springer.com/10.1134/1.2131144
34 sgo:license sg:explorer/license/
35 sgo:sdDataset articles
36 rdf:type schema:ScholarlyArticle
37 N3a68f1c7531a4efc8104dc735e4d43a6 schema:name dimensions_id
38 schema:value pub.1037416180
39 rdf:type schema:PropertyValue
40 N3d2215d481964b999e7790cd93f42356 rdf:first sg:person.011712150477.60
41 rdf:rest Ne23c0b26fe374c59b4e550f642330ad3
42 N454207ebf16748e392b5dfb3b6d4227a schema:name Springer Nature - SN SciGraph project
43 rdf:type schema:Organization
44 N7f8e07f1003e4e9a8613df732b8ca3b1 schema:volumeNumber 47
45 rdf:type schema:PublicationVolume
46 N94e215c6df814830899ea422ed65aea3 rdf:first sg:person.014616167505.66
47 rdf:rest N3d2215d481964b999e7790cd93f42356
48 Nae6d1fa17c5a4892b7c3ef778e825180 schema:name doi
49 schema:value 10.1134/1.2131144
50 rdf:type schema:PropertyValue
51 Ncb1a8068261142faaed5603726450638 schema:issueNumber 11
52 rdf:type schema:PublicationIssue
53 Ne23c0b26fe374c59b4e550f642330ad3 rdf:first sg:person.014370247105.82
54 rdf:rest rdf:nil
55 Nf982214a41a84b7d907e91b579397aa4 schema:name readcube_id
56 schema:value b23c087b82dee9a5734fe8d2d1f7898e864c7e4ddc01fd5b8ae438816781f8b2
57 rdf:type schema:PropertyValue
58 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
59 schema:name Engineering
60 rdf:type schema:DefinedTerm
61 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
62 schema:name Materials Engineering
63 rdf:type schema:DefinedTerm
64 sg:journal.1136591 schema:issn 0367-3294
65 1063-7834
66 schema:name Physics of the Solid State
67 rdf:type schema:Periodical
68 sg:person.011712150477.60 schema:affiliation https://www.grid.ac/institutes/grid.77602.34
69 schema:familyName Shugurov
70 schema:givenName A. R.
71 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011712150477.60
72 rdf:type schema:Person
73 sg:person.014370247105.82 schema:affiliation https://www.grid.ac/institutes/grid.465280.d
74 schema:familyName Oskomov
75 schema:givenName K. V.
76 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014370247105.82
77 rdf:type schema:Person
78 sg:person.014616167505.66 schema:affiliation https://www.grid.ac/institutes/grid.467103.7
79 schema:familyName Panin
80 schema:givenName A. V.
81 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014616167505.66
82 rdf:type schema:Person
83 sg:pub.10.1007/bf02666659 schema:sameAs https://app.dimensions.ai/details/publication/pub.1028696296
84 https://doi.org/10.1007/bf02666659
85 rdf:type schema:CreativeWork
86 https://doi.org/10.1016/0040-6090(95)05834-6 schema:sameAs https://app.dimensions.ai/details/publication/pub.1006763618
87 rdf:type schema:CreativeWork
88 https://doi.org/10.1016/s0022-5096(01)00035-7 schema:sameAs https://app.dimensions.ai/details/publication/pub.1016504001
89 rdf:type schema:CreativeWork
90 https://doi.org/10.1016/s0040-6090(03)00034-8 schema:sameAs https://app.dimensions.ai/details/publication/pub.1025827445
91 rdf:type schema:CreativeWork
92 https://doi.org/10.1016/s0257-8972(00)01063-x schema:sameAs https://app.dimensions.ai/details/publication/pub.1045144267
93 rdf:type schema:CreativeWork
94 https://doi.org/10.1016/s0257-8972(97)00522-7 schema:sameAs https://app.dimensions.ai/details/publication/pub.1016293369
95 rdf:type schema:CreativeWork
96 https://doi.org/10.1016/s1359-6454(01)00328-7 schema:sameAs https://app.dimensions.ai/details/publication/pub.1016424367
97 rdf:type schema:CreativeWork
98 https://doi.org/10.1115/1.3173068 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062105979
99 rdf:type schema:CreativeWork
100 https://doi.org/10.1557/jmr.1992.1564 schema:sameAs https://app.dimensions.ai/details/publication/pub.1043643805
101 rdf:type schema:CreativeWork
102 https://doi.org/10.1557/jmr.1992.2040 schema:sameAs https://app.dimensions.ai/details/publication/pub.1052993218
103 rdf:type schema:CreativeWork
104 https://www.grid.ac/institutes/grid.465280.d schema:alternateName Institute of High Current Electronics
105 schema:name Institute of High-Current Electronics, Siberian Division, Russian Academy of Sciences, Akademicheskii pr. 2/3, 634021, Tomsk, Russia
106 Tomsk State University, pr. Lenina 36, 634050, Tomsk, Russia
107 rdf:type schema:Organization
108 https://www.grid.ac/institutes/grid.467103.7 schema:alternateName Institute of Strength Physics and Materials Science
109 schema:name Institute of Strength Physics and Materials Science, Siberian Division, Russian Academy of Sciences, Akademicheskii pr. 2/1, 634021, Tomsk, Russia
110 rdf:type schema:Organization
111 https://www.grid.ac/institutes/grid.77602.34 schema:alternateName Tomsk State University
112 schema:name Institute of Strength Physics and Materials Science, Siberian Division, Russian Academy of Sciences, Akademicheskii pr. 2/1, 634021, Tomsk, Russia
113 Tomsk State University, pr. Lenina 36, 634050, Tomsk, Russia
114 rdf:type schema:Organization
 




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