Removal of pyramidal germanium nanoislands from the silicon (001) surface as a result of deposition/sputtering of a gold nanolayer View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2004-09

AUTHORS

A. I. Stognii, N. N. Novitskii, O. M. Stukalov, A. I. Demchenko, V. I. Khit’ko

ABSTRACT

Optimal conditions for selective removal of pyramidal germanium nanoislands from the silicon (001) surface by sequential ion-beam deposition/sputtering of a gold layer with a nanoscale thickness are determined experimentally; it is important that the sizes of large domelike germanium nanoislands change only slightly as a result of the ion-beam treatment.

PAGES

1236-1239

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/1.1800250

DOI

http://dx.doi.org/10.1134/1.1800250

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1023547893


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