Growth of diamond films on crystalline silicon by hot-filament chemical vapor deposition View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2002-06

AUTHORS

M. V. Baidakova, A. Ya. Vul’, V. G. Golubev, S. A. Grudinkin, V. G. Melekhin, N. A. Feoktistov, A. Krüger

ABSTRACT

The effect of hot-filament chemical vapor deposition conditions on the phase composition of diamond films grown on a silicon substrate was studied. The growth conditions providing the highest content of diamond phase at a growth rate of about 1 µm/h were ascertained.

PAGES

615-620

Identifiers

URI

http://scigraph.springernature.com/pub.10.1134/1.1485657

DOI

http://dx.doi.org/10.1134/1.1485657

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1045736019


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