Formation of Magnetic Anisotropy by Lithography View Full Text


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Article Info

DATE

2016-07

AUTHORS

Si Nyeon Kim, Yoon Jae Nam, Yang Doo Kim, Jun Woo Choi, Heon Lee, Sang Ho Lim

ABSTRACT

Artificial interface anisotropy is demonstrated in alternating Co/Pt and Co/Pd stripe patterns, providing a means of forming magnetic anisotropy using lithography. In-plane hysteresis loops measured along two principal directions are explained in depth by two competing shape and interface anisotropies, thus confirming the formation of interface anisotropy at the Co/Pt and Co/Pd interfaces of the stripe patterns. The measured interface anisotropy energies, which are in the range of 0.2-0.3 erg/cm(2) for both stripes, are smaller than those observed in conventional multilayers, indicating a decrease in smoothness of the interfaces when formed by lithography. The demonstration of interface anisotropy in the Co/Pt and Co/Pd stripe patterns is of significant practical importance, because this setup makes it possible to form anisotropy using lithography and to modulate its strength by controlling the pattern width. Furthermore, this makes it possible to form more complex interface anisotropy by fabricating two-dimensional patterns. These artificial anisotropies are expected to open up new device applications such as multilevel bits using in-plane magnetoresistive thin-film structures. More... »

PAGES

26709

Identifiers

URI

http://scigraph.springernature.com/pub.10.1038/srep26709

DOI

http://dx.doi.org/10.1038/srep26709

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1015437627

PUBMED

https://www.ncbi.nlm.nih.gov/pubmed/27216420


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Korea University", 
          "id": "https://www.grid.ac/institutes/grid.222754.4", 
          "name": [
            "Department of Materials Science and Engineering, Korea University, Seoul 02841, Korea."
          ], 
          "type": "Organization"
        }, 
        "familyName": "Kim", 
        "givenName": "Si Nyeon", 
        "id": "sg:person.0630342043.30", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0630342043.30"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "SK Hynix (South Korea)", 
          "id": "https://www.grid.ac/institutes/grid.410908.4", 
          "name": [
            "Research and Development Division, SK Hynix Semiconductor Inc., Icheon 17336, Korea."
          ], 
          "type": "Organization"
        }, 
        "familyName": "Nam", 
        "givenName": "Yoon Jae", 
        "id": "sg:person.0676455243.18", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0676455243.18"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Korea University", 
          "id": "https://www.grid.ac/institutes/grid.222754.4", 
          "name": [
            "Department of Materials Science and Engineering, Korea University, Seoul 02841, Korea."
          ], 
          "type": "Organization"
        }, 
        "familyName": "Kim", 
        "givenName": "Yang Doo", 
        "id": "sg:person.01100452534.05", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01100452534.05"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Korea Institute of Science and Technology", 
          "id": "https://www.grid.ac/institutes/grid.35541.36", 
          "name": [
            "Center for Spintronics Research, Korea Institute of Science and Technology, Seoul 02792, Korea."
          ], 
          "type": "Organization"
        }, 
        "familyName": "Choi", 
        "givenName": "Jun Woo", 
        "id": "sg:person.01232327163.02", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01232327163.02"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Korea University", 
          "id": "https://www.grid.ac/institutes/grid.222754.4", 
          "name": [
            "Department of Materials Science and Engineering, Korea University, Seoul 02841, Korea."
          ], 
          "type": "Organization"
        }, 
        "familyName": "Lee", 
        "givenName": "Heon", 
        "id": "sg:person.01030770305.50", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01030770305.50"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Korea University", 
          "id": "https://www.grid.ac/institutes/grid.222754.4", 
          "name": [
            "Department of Materials Science and Engineering, Korea University, Seoul 02841, Korea."
          ], 
          "type": "Organization"
        }, 
        "familyName": "Lim", 
        "givenName": "Sang Ho", 
        "id": "sg:person.011610537562.96", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011610537562.96"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "sg:pub.10.1038/nnano.2012.125", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010658775", 
          "https://doi.org/10.1038/nnano.2012.125"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1080/14786435708243210", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1015111141"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0304-8853(91)90404-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1015634562"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0304-8853(91)90404-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1015634562"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1140/epjb/e2013-30933-6", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1022598118", 
          "https://doi.org/10.1140/epjb/e2013-30933-6"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.jmmm.2006.02.005", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1029096238"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0034-4885/59/11/002", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1049002588"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1728618", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057795118"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.338459", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057944877"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.353532", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057969814"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.363124", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057988458"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.4829024", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1058085871"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.96254", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1058136387"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.64.134423", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060600927"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.64.134423", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060600927"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.79.014203", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060627018"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.79.014203", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060627018"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.86.064432", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060639650"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.86.064432", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060639650"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1109/20.908623", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1061118984"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1143/jpsj.11.551", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063091484"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/kem.497.8", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072084431"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/9780470386323", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1098661672"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/9780470386323", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1098661672"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2016-07", 
    "datePublishedReg": "2016-07-01", 
    "description": "Artificial interface anisotropy is demonstrated in alternating Co/Pt and Co/Pd stripe patterns, providing a means of forming magnetic anisotropy using lithography. In-plane hysteresis loops measured along two principal directions are explained in depth by two competing shape and interface anisotropies, thus confirming the formation of interface anisotropy at the Co/Pt and Co/Pd interfaces of the stripe patterns. The measured interface anisotropy energies, which are in the range of 0.2-0.3 erg/cm(2) for both stripes, are smaller than those observed in conventional multilayers, indicating a decrease in smoothness of the interfaces when formed by lithography. The demonstration of interface anisotropy in the Co/Pt and Co/Pd stripe patterns is of significant practical importance, because this setup makes it possible to form anisotropy using lithography and to modulate its strength by controlling the pattern width. Furthermore, this makes it possible to form more complex interface anisotropy by fabricating two-dimensional patterns. These artificial anisotropies are expected to open up new device applications such as multilevel bits using in-plane magnetoresistive thin-film structures.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1038/srep26709", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": true, 
    "isFundedItemOf": [
      {
        "id": "sg:grant.7453848", 
        "type": "MonetaryGrant"
      }
    ], 
    "isPartOf": [
      {
        "id": "sg:journal.1045337", 
        "issn": [
          "2045-2322"
        ], 
        "name": "Scientific Reports", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "1", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "6"
      }
    ], 
    "name": "Formation of Magnetic Anisotropy by Lithography", 
    "pagination": "26709", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "498dd54bde97a9c166c0b4f699d914e6458d14211b4d502c46fe3a9acb5772b1"
        ]
      }, 
      {
        "name": "pubmed_id", 
        "type": "PropertyValue", 
        "value": [
          "27216420"
        ]
      }, 
      {
        "name": "nlm_unique_id", 
        "type": "PropertyValue", 
        "value": [
          "101563288"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1038/srep26709"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1015437627"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1038/srep26709", 
      "https://app.dimensions.ai/details/publication/pub.1015437627"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T00:23", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8695_00000549.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://www.nature.com/srep/2016/160524/srep26709/full/srep26709.html"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

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This table displays all metadata directly associated to this object as RDF triples.

170 TRIPLES      21 PREDICATES      48 URIs      21 LITERALS      9 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1038/srep26709 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author Nf2f69c998e9649a9a6f757fc31c3962e
4 schema:citation sg:pub.10.1038/nnano.2012.125
5 sg:pub.10.1140/epjb/e2013-30933-6
6 https://doi.org/10.1002/9780470386323
7 https://doi.org/10.1016/0304-8853(91)90404-x
8 https://doi.org/10.1016/j.jmmm.2006.02.005
9 https://doi.org/10.1063/1.1728618
10 https://doi.org/10.1063/1.338459
11 https://doi.org/10.1063/1.353532
12 https://doi.org/10.1063/1.363124
13 https://doi.org/10.1063/1.4829024
14 https://doi.org/10.1063/1.96254
15 https://doi.org/10.1080/14786435708243210
16 https://doi.org/10.1088/0034-4885/59/11/002
17 https://doi.org/10.1103/physrevb.64.134423
18 https://doi.org/10.1103/physrevb.79.014203
19 https://doi.org/10.1103/physrevb.86.064432
20 https://doi.org/10.1109/20.908623
21 https://doi.org/10.1143/jpsj.11.551
22 https://doi.org/10.4028/www.scientific.net/kem.497.8
23 schema:datePublished 2016-07
24 schema:datePublishedReg 2016-07-01
25 schema:description Artificial interface anisotropy is demonstrated in alternating Co/Pt and Co/Pd stripe patterns, providing a means of forming magnetic anisotropy using lithography. In-plane hysteresis loops measured along two principal directions are explained in depth by two competing shape and interface anisotropies, thus confirming the formation of interface anisotropy at the Co/Pt and Co/Pd interfaces of the stripe patterns. The measured interface anisotropy energies, which are in the range of 0.2-0.3 erg/cm(2) for both stripes, are smaller than those observed in conventional multilayers, indicating a decrease in smoothness of the interfaces when formed by lithography. The demonstration of interface anisotropy in the Co/Pt and Co/Pd stripe patterns is of significant practical importance, because this setup makes it possible to form anisotropy using lithography and to modulate its strength by controlling the pattern width. Furthermore, this makes it possible to form more complex interface anisotropy by fabricating two-dimensional patterns. These artificial anisotropies are expected to open up new device applications such as multilevel bits using in-plane magnetoresistive thin-film structures.
26 schema:genre research_article
27 schema:inLanguage en
28 schema:isAccessibleForFree true
29 schema:isPartOf N170eeea3014d487ea0621b13f9b16945
30 N7f11ff4c21c5437a90d33bff82b26044
31 sg:journal.1045337
32 schema:name Formation of Magnetic Anisotropy by Lithography
33 schema:pagination 26709
34 schema:productId N1a79424560ab44828f3ed6adb783ae3a
35 N3d773f346f4e417ab0838e7ac14d2dc1
36 N623b39b1d68b4881923a5ce66faa96c6
37 Nb6fb9d75780849cfa5756e6bb695f0d0
38 Nf873e11704b94529a0441e65f4a2b800
39 schema:sameAs https://app.dimensions.ai/details/publication/pub.1015437627
40 https://doi.org/10.1038/srep26709
41 schema:sdDatePublished 2019-04-11T00:23
42 schema:sdLicense https://scigraph.springernature.com/explorer/license/
43 schema:sdPublisher N68b18c024c17493d87a055ec32954277
44 schema:url http://www.nature.com/srep/2016/160524/srep26709/full/srep26709.html
45 sgo:license sg:explorer/license/
46 sgo:sdDataset articles
47 rdf:type schema:ScholarlyArticle
48 N170eeea3014d487ea0621b13f9b16945 schema:issueNumber 1
49 rdf:type schema:PublicationIssue
50 N1a79424560ab44828f3ed6adb783ae3a schema:name doi
51 schema:value 10.1038/srep26709
52 rdf:type schema:PropertyValue
53 N3d773f346f4e417ab0838e7ac14d2dc1 schema:name readcube_id
54 schema:value 498dd54bde97a9c166c0b4f699d914e6458d14211b4d502c46fe3a9acb5772b1
55 rdf:type schema:PropertyValue
56 N3e44709485bd4048a892d6ada544a573 rdf:first sg:person.01232327163.02
57 rdf:rest N585a33e9e8c242e9a40a5b9e14ee7071
58 N585a33e9e8c242e9a40a5b9e14ee7071 rdf:first sg:person.01030770305.50
59 rdf:rest N786e29238604416b8509619bb74044a3
60 N623b39b1d68b4881923a5ce66faa96c6 schema:name dimensions_id
61 schema:value pub.1015437627
62 rdf:type schema:PropertyValue
63 N68b18c024c17493d87a055ec32954277 schema:name Springer Nature - SN SciGraph project
64 rdf:type schema:Organization
65 N6967646e94c44cdba7b354e43534a43d rdf:first sg:person.01100452534.05
66 rdf:rest N3e44709485bd4048a892d6ada544a573
67 N786e29238604416b8509619bb74044a3 rdf:first sg:person.011610537562.96
68 rdf:rest rdf:nil
69 N7f11ff4c21c5437a90d33bff82b26044 schema:volumeNumber 6
70 rdf:type schema:PublicationVolume
71 Nb6fb9d75780849cfa5756e6bb695f0d0 schema:name nlm_unique_id
72 schema:value 101563288
73 rdf:type schema:PropertyValue
74 Ndf3a0d540d5543718b32393ed9b015ed rdf:first sg:person.0676455243.18
75 rdf:rest N6967646e94c44cdba7b354e43534a43d
76 Nf2f69c998e9649a9a6f757fc31c3962e rdf:first sg:person.0630342043.30
77 rdf:rest Ndf3a0d540d5543718b32393ed9b015ed
78 Nf873e11704b94529a0441e65f4a2b800 schema:name pubmed_id
79 schema:value 27216420
80 rdf:type schema:PropertyValue
81 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
82 schema:name Engineering
83 rdf:type schema:DefinedTerm
84 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
85 schema:name Materials Engineering
86 rdf:type schema:DefinedTerm
87 sg:grant.7453848 http://pending.schema.org/fundedItem sg:pub.10.1038/srep26709
88 rdf:type schema:MonetaryGrant
89 sg:journal.1045337 schema:issn 2045-2322
90 schema:name Scientific Reports
91 rdf:type schema:Periodical
92 sg:person.01030770305.50 schema:affiliation https://www.grid.ac/institutes/grid.222754.4
93 schema:familyName Lee
94 schema:givenName Heon
95 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01030770305.50
96 rdf:type schema:Person
97 sg:person.01100452534.05 schema:affiliation https://www.grid.ac/institutes/grid.222754.4
98 schema:familyName Kim
99 schema:givenName Yang Doo
100 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01100452534.05
101 rdf:type schema:Person
102 sg:person.011610537562.96 schema:affiliation https://www.grid.ac/institutes/grid.222754.4
103 schema:familyName Lim
104 schema:givenName Sang Ho
105 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011610537562.96
106 rdf:type schema:Person
107 sg:person.01232327163.02 schema:affiliation https://www.grid.ac/institutes/grid.35541.36
108 schema:familyName Choi
109 schema:givenName Jun Woo
110 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01232327163.02
111 rdf:type schema:Person
112 sg:person.0630342043.30 schema:affiliation https://www.grid.ac/institutes/grid.222754.4
113 schema:familyName Kim
114 schema:givenName Si Nyeon
115 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0630342043.30
116 rdf:type schema:Person
117 sg:person.0676455243.18 schema:affiliation https://www.grid.ac/institutes/grid.410908.4
118 schema:familyName Nam
119 schema:givenName Yoon Jae
120 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0676455243.18
121 rdf:type schema:Person
122 sg:pub.10.1038/nnano.2012.125 schema:sameAs https://app.dimensions.ai/details/publication/pub.1010658775
123 https://doi.org/10.1038/nnano.2012.125
124 rdf:type schema:CreativeWork
125 sg:pub.10.1140/epjb/e2013-30933-6 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022598118
126 https://doi.org/10.1140/epjb/e2013-30933-6
127 rdf:type schema:CreativeWork
128 https://doi.org/10.1002/9780470386323 schema:sameAs https://app.dimensions.ai/details/publication/pub.1098661672
129 rdf:type schema:CreativeWork
130 https://doi.org/10.1016/0304-8853(91)90404-x schema:sameAs https://app.dimensions.ai/details/publication/pub.1015634562
131 rdf:type schema:CreativeWork
132 https://doi.org/10.1016/j.jmmm.2006.02.005 schema:sameAs https://app.dimensions.ai/details/publication/pub.1029096238
133 rdf:type schema:CreativeWork
134 https://doi.org/10.1063/1.1728618 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057795118
135 rdf:type schema:CreativeWork
136 https://doi.org/10.1063/1.338459 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057944877
137 rdf:type schema:CreativeWork
138 https://doi.org/10.1063/1.353532 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057969814
139 rdf:type schema:CreativeWork
140 https://doi.org/10.1063/1.363124 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057988458
141 rdf:type schema:CreativeWork
142 https://doi.org/10.1063/1.4829024 schema:sameAs https://app.dimensions.ai/details/publication/pub.1058085871
143 rdf:type schema:CreativeWork
144 https://doi.org/10.1063/1.96254 schema:sameAs https://app.dimensions.ai/details/publication/pub.1058136387
145 rdf:type schema:CreativeWork
146 https://doi.org/10.1080/14786435708243210 schema:sameAs https://app.dimensions.ai/details/publication/pub.1015111141
147 rdf:type schema:CreativeWork
148 https://doi.org/10.1088/0034-4885/59/11/002 schema:sameAs https://app.dimensions.ai/details/publication/pub.1049002588
149 rdf:type schema:CreativeWork
150 https://doi.org/10.1103/physrevb.64.134423 schema:sameAs https://app.dimensions.ai/details/publication/pub.1060600927
151 rdf:type schema:CreativeWork
152 https://doi.org/10.1103/physrevb.79.014203 schema:sameAs https://app.dimensions.ai/details/publication/pub.1060627018
153 rdf:type schema:CreativeWork
154 https://doi.org/10.1103/physrevb.86.064432 schema:sameAs https://app.dimensions.ai/details/publication/pub.1060639650
155 rdf:type schema:CreativeWork
156 https://doi.org/10.1109/20.908623 schema:sameAs https://app.dimensions.ai/details/publication/pub.1061118984
157 rdf:type schema:CreativeWork
158 https://doi.org/10.1143/jpsj.11.551 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063091484
159 rdf:type schema:CreativeWork
160 https://doi.org/10.4028/www.scientific.net/kem.497.8 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072084431
161 rdf:type schema:CreativeWork
162 https://www.grid.ac/institutes/grid.222754.4 schema:alternateName Korea University
163 schema:name Department of Materials Science and Engineering, Korea University, Seoul 02841, Korea.
164 rdf:type schema:Organization
165 https://www.grid.ac/institutes/grid.35541.36 schema:alternateName Korea Institute of Science and Technology
166 schema:name Center for Spintronics Research, Korea Institute of Science and Technology, Seoul 02792, Korea.
167 rdf:type schema:Organization
168 https://www.grid.ac/institutes/grid.410908.4 schema:alternateName SK Hynix (South Korea)
169 schema:name Research and Development Division, SK Hynix Semiconductor Inc., Icheon 17336, Korea.
170 rdf:type schema:Organization
 




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