Preferred orientations of NiO thin films prepared by RF magnetron sputtering View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2004-07

AUTHORS

H. W. Ryu, G. P. Choi, W. S. Lee, J. S. Park

ABSTRACT

N/A

PAGES

4375-4377

References to SciGraph publications

Journal

TITLE

Journal of Materials Science

ISSUE

13

VOLUME

39

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1023/b:jmsc.0000033431.52659.e5

DOI

http://dx.doi.org/10.1023/b:jmsc.0000033431.52659.e5

DIMENSIONS

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