Methyl Concentration Measurements During Microwave Plasma-Assisted Diamond Deposition View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2000-03

AUTHORS

M. A. Cappelli, T. G. Owano, A. Gicquel, X. Duten

ABSTRACT

Absolute line-of-sight averaged measurements of methyl radical concentrationsin a microwave plasma-assisted diamond deposition reactor arepresented. The measurements are based on the use of broadband ultravioletabsorption spectroscopy to characterize the distinguishing absorptionfeature of methyl at 216 nm associated with the X(2A″2)→(2A′1) electronictransition. The dependence of the line-of-sight methyl concentration andmole fractions with the percentage of methane in the feed-gas, plasma powerdensity, and position of substrate relative to the optical probe volume isstudied. The measurements suggest that the near-substrate methyl molefraction is only weakly sensitive to changes in substrate temperature andare largely influenced by the gas-phase temperature. A comparison is madebetween the measured mole fractions and recent predictions based on aone-dimensional model of this process. The measured mole fractions areconsistently greater than those predicted by about a factor of ten. Thisdiscrepancy is explained in part by the line-of-sight limitations in theexperimental facility. More... »

PAGES

1-12

Identifiers

URI

http://scigraph.springernature.com/pub.10.1023/a:1006985925431

DOI

http://dx.doi.org/10.1023/a:1006985925431

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1031795926


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