Fabrication of aluminum nano-scale structures using direct-embossing with a nickel template View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2011-10

AUTHORS

Sang Chul Oh, Byeong Ju Bae, Ki Yeon Yang, Moo Hyun Kwon, Heon Lee

ABSTRACT

Al plate was patterned by a direct embossing process. An electroformed Ni plate with a nano-sized surface protrusion pattern was used as an embossing mold. The Ni stamp with a nano-sized surface protrusion pattern was pressed onto an electro-polished Al plate; thus, a reversed Al nano-pattern was formed on the Al surface by the localized plastic deformation of Al. The Al plate was softened by annealing at 400 °C for 5 min; thus, high-fidelity pattern transfer was achieved at a low embossing pressure. More... »

PAGES

771-775

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s12540-011-1012-4

DOI

http://dx.doi.org/10.1007/s12540-011-1012-4

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1005898995


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Korea University", 
          "id": "https://www.grid.ac/institutes/grid.222754.4", 
          "name": [
            "Department of Nano-Semiconductor, Korea University, Seoul, Korea"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Oh", 
        "givenName": "Sang Chul", 
        "id": "sg:person.07664563465.06", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.07664563465.06"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "name": [
            "Samsung Electronics Semiconductor R&D Center Process Development Team, Samsung Electronics Company, Gyeonggi-do, Korea"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Bae", 
        "givenName": "Byeong Ju", 
        "id": "sg:person.013204773241.30", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013204773241.30"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Samsung (South Korea)", 
          "id": "https://www.grid.ac/institutes/grid.419666.a", 
          "name": [
            "Nano fabrication Group, Samsung Advanced Institute of Technology, Gyeonggi-do, Korea"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Yang", 
        "givenName": "Ki Yeon", 
        "id": "sg:person.01202531614.24", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01202531614.24"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Woosuk University", 
          "id": "https://www.grid.ac/institutes/grid.412965.d", 
          "name": [
            "Department of Applied Chemistry, Woosuk University, 565-701, Jeonbuk, Korea"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Kwon", 
        "givenName": "Moo Hyun", 
        "id": "sg:person.016404636525.71", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016404636525.71"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Korea University", 
          "id": "https://www.grid.ac/institutes/grid.222754.4", 
          "name": [
            "Department of Nano-Semiconductor, Korea University, Seoul, Korea", 
            "Department of Material Science and Engineering, Korea University, Seoul, Korea"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Lee", 
        "givenName": "Heon", 
        "id": "sg:person.01030770305.50", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01030770305.50"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1016/j.mee.2010.04.009", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1004156208"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/12/2/321", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1005121855"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0167-9317(98)00135-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1007118024"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2006.01.095", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1019325478"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.3365/eml.2009.03.039", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1023718182", 
          "https://doi.org/10.3365/eml.2009.03.039"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.3365/eml.2009.12.139", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1041520225", 
          "https://doi.org/10.3365/eml.2009.12.139"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.3365/eml.2009.12.139", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1041520225", 
          "https://doi.org/10.3365/eml.2009.12.139"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2007.01.101", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043095035"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0924-4247(00)00296-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043848235"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1361/105994903770343349", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1045158722", 
          "https://doi.org/10.1361/105994903770343349"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2006.01.038", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1048080301"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1038/nature00792", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1051269288", 
          "https://doi.org/10.1038/nature00792"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1038/nature00792", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1051269288", 
          "https://doi.org/10.1038/nature00792"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/la060617f", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056150297"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/la060617f", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056150297"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/la801706q", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056163150"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/la801706q", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056163150"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.1941247", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062170669"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.1941247", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062170669"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.2395958", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062172063"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1143/jjap.41.4186", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063068071"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.510-511.462", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072121888"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2011-10", 
    "datePublishedReg": "2011-10-01", 
    "description": "Al plate was patterned by a direct embossing process. An electroformed Ni plate with a nano-sized surface protrusion pattern was used as an embossing mold. The Ni stamp with a nano-sized surface protrusion pattern was pressed onto an electro-polished Al plate; thus, a reversed Al nano-pattern was formed on the Al surface by the localized plastic deformation of Al. The Al plate was softened by annealing at 400 \u00b0C for 5 min; thus, high-fidelity pattern transfer was achieved at a low embossing pressure.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/s12540-011-1012-4", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1136083", 
        "issn": [
          "1225-9438", 
          "2005-4149"
        ], 
        "name": "Metals and Materials International", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "5", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "17"
      }
    ], 
    "name": "Fabrication of aluminum nano-scale structures using direct-embossing with a nickel template", 
    "pagination": "771-775", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "1c1a391c9aca70b87a1bd844f11a00d3990ae1ab5c0b1eb18f9f5cdff9f6d507"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/s12540-011-1012-4"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1005898995"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/s12540-011-1012-4", 
      "https://app.dimensions.ai/details/publication/pub.1005898995"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-10T23:26", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8693_00000520.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007%2Fs12540-011-1012-4"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

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This table displays all metadata directly associated to this object as RDF triples.

153 TRIPLES      21 PREDICATES      44 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/s12540-011-1012-4 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author Nf56c346ec9d0413e93009d7fd84772f1
4 schema:citation sg:pub.10.1038/nature00792
5 sg:pub.10.1361/105994903770343349
6 sg:pub.10.3365/eml.2009.03.039
7 sg:pub.10.3365/eml.2009.12.139
8 https://doi.org/10.1016/j.mee.2006.01.038
9 https://doi.org/10.1016/j.mee.2006.01.095
10 https://doi.org/10.1016/j.mee.2007.01.101
11 https://doi.org/10.1016/j.mee.2010.04.009
12 https://doi.org/10.1016/s0167-9317(98)00135-x
13 https://doi.org/10.1016/s0924-4247(00)00296-x
14 https://doi.org/10.1021/la060617f
15 https://doi.org/10.1021/la801706q
16 https://doi.org/10.1088/0957-4484/12/2/321
17 https://doi.org/10.1116/1.1941247
18 https://doi.org/10.1116/1.2395958
19 https://doi.org/10.1143/jjap.41.4186
20 https://doi.org/10.4028/www.scientific.net/msf.510-511.462
21 schema:datePublished 2011-10
22 schema:datePublishedReg 2011-10-01
23 schema:description Al plate was patterned by a direct embossing process. An electroformed Ni plate with a nano-sized surface protrusion pattern was used as an embossing mold. The Ni stamp with a nano-sized surface protrusion pattern was pressed onto an electro-polished Al plate; thus, a reversed Al nano-pattern was formed on the Al surface by the localized plastic deformation of Al. The Al plate was softened by annealing at 400 °C for 5 min; thus, high-fidelity pattern transfer was achieved at a low embossing pressure.
24 schema:genre research_article
25 schema:inLanguage en
26 schema:isAccessibleForFree false
27 schema:isPartOf N60177a172f2b494bb45dd5a677891482
28 Neddfd26e6cba462cb0504cda3cf7293a
29 sg:journal.1136083
30 schema:name Fabrication of aluminum nano-scale structures using direct-embossing with a nickel template
31 schema:pagination 771-775
32 schema:productId N740b2c8896ab44778e7327ff4f6ba9f7
33 Nc77ec6a60eae47e68e76b3eb0561ce4a
34 Nd1ae727257084896b09e01416afc5beb
35 schema:sameAs https://app.dimensions.ai/details/publication/pub.1005898995
36 https://doi.org/10.1007/s12540-011-1012-4
37 schema:sdDatePublished 2019-04-10T23:26
38 schema:sdLicense https://scigraph.springernature.com/explorer/license/
39 schema:sdPublisher N98dae008f63f452aa59276b963dc820a
40 schema:url http://link.springer.com/10.1007%2Fs12540-011-1012-4
41 sgo:license sg:explorer/license/
42 sgo:sdDataset articles
43 rdf:type schema:ScholarlyArticle
44 N014c9fd2612c43f1a6033604436bda6c schema:name Samsung Electronics Semiconductor R&D Center Process Development Team, Samsung Electronics Company, Gyeonggi-do, Korea
45 rdf:type schema:Organization
46 N2654390bddc84ee1a095a6cd1198d010 rdf:first sg:person.016404636525.71
47 rdf:rest Nfe2ae265b64e443b9c81038c56b63974
48 N5bf8698990df497d9e45b25256843647 rdf:first sg:person.01202531614.24
49 rdf:rest N2654390bddc84ee1a095a6cd1198d010
50 N60177a172f2b494bb45dd5a677891482 schema:volumeNumber 17
51 rdf:type schema:PublicationVolume
52 N740b2c8896ab44778e7327ff4f6ba9f7 schema:name readcube_id
53 schema:value 1c1a391c9aca70b87a1bd844f11a00d3990ae1ab5c0b1eb18f9f5cdff9f6d507
54 rdf:type schema:PropertyValue
55 N7cfe8dce64ae49c58e8efbfbdaff72cc rdf:first sg:person.013204773241.30
56 rdf:rest N5bf8698990df497d9e45b25256843647
57 N98dae008f63f452aa59276b963dc820a schema:name Springer Nature - SN SciGraph project
58 rdf:type schema:Organization
59 Nc77ec6a60eae47e68e76b3eb0561ce4a schema:name dimensions_id
60 schema:value pub.1005898995
61 rdf:type schema:PropertyValue
62 Nd1ae727257084896b09e01416afc5beb schema:name doi
63 schema:value 10.1007/s12540-011-1012-4
64 rdf:type schema:PropertyValue
65 Neddfd26e6cba462cb0504cda3cf7293a schema:issueNumber 5
66 rdf:type schema:PublicationIssue
67 Nf56c346ec9d0413e93009d7fd84772f1 rdf:first sg:person.07664563465.06
68 rdf:rest N7cfe8dce64ae49c58e8efbfbdaff72cc
69 Nfe2ae265b64e443b9c81038c56b63974 rdf:first sg:person.01030770305.50
70 rdf:rest rdf:nil
71 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
72 schema:name Engineering
73 rdf:type schema:DefinedTerm
74 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
75 schema:name Materials Engineering
76 rdf:type schema:DefinedTerm
77 sg:journal.1136083 schema:issn 1225-9438
78 2005-4149
79 schema:name Metals and Materials International
80 rdf:type schema:Periodical
81 sg:person.01030770305.50 schema:affiliation https://www.grid.ac/institutes/grid.222754.4
82 schema:familyName Lee
83 schema:givenName Heon
84 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01030770305.50
85 rdf:type schema:Person
86 sg:person.01202531614.24 schema:affiliation https://www.grid.ac/institutes/grid.419666.a
87 schema:familyName Yang
88 schema:givenName Ki Yeon
89 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01202531614.24
90 rdf:type schema:Person
91 sg:person.013204773241.30 schema:affiliation N014c9fd2612c43f1a6033604436bda6c
92 schema:familyName Bae
93 schema:givenName Byeong Ju
94 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013204773241.30
95 rdf:type schema:Person
96 sg:person.016404636525.71 schema:affiliation https://www.grid.ac/institutes/grid.412965.d
97 schema:familyName Kwon
98 schema:givenName Moo Hyun
99 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016404636525.71
100 rdf:type schema:Person
101 sg:person.07664563465.06 schema:affiliation https://www.grid.ac/institutes/grid.222754.4
102 schema:familyName Oh
103 schema:givenName Sang Chul
104 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.07664563465.06
105 rdf:type schema:Person
106 sg:pub.10.1038/nature00792 schema:sameAs https://app.dimensions.ai/details/publication/pub.1051269288
107 https://doi.org/10.1038/nature00792
108 rdf:type schema:CreativeWork
109 sg:pub.10.1361/105994903770343349 schema:sameAs https://app.dimensions.ai/details/publication/pub.1045158722
110 https://doi.org/10.1361/105994903770343349
111 rdf:type schema:CreativeWork
112 sg:pub.10.3365/eml.2009.03.039 schema:sameAs https://app.dimensions.ai/details/publication/pub.1023718182
113 https://doi.org/10.3365/eml.2009.03.039
114 rdf:type schema:CreativeWork
115 sg:pub.10.3365/eml.2009.12.139 schema:sameAs https://app.dimensions.ai/details/publication/pub.1041520225
116 https://doi.org/10.3365/eml.2009.12.139
117 rdf:type schema:CreativeWork
118 https://doi.org/10.1016/j.mee.2006.01.038 schema:sameAs https://app.dimensions.ai/details/publication/pub.1048080301
119 rdf:type schema:CreativeWork
120 https://doi.org/10.1016/j.mee.2006.01.095 schema:sameAs https://app.dimensions.ai/details/publication/pub.1019325478
121 rdf:type schema:CreativeWork
122 https://doi.org/10.1016/j.mee.2007.01.101 schema:sameAs https://app.dimensions.ai/details/publication/pub.1043095035
123 rdf:type schema:CreativeWork
124 https://doi.org/10.1016/j.mee.2010.04.009 schema:sameAs https://app.dimensions.ai/details/publication/pub.1004156208
125 rdf:type schema:CreativeWork
126 https://doi.org/10.1016/s0167-9317(98)00135-x schema:sameAs https://app.dimensions.ai/details/publication/pub.1007118024
127 rdf:type schema:CreativeWork
128 https://doi.org/10.1016/s0924-4247(00)00296-x schema:sameAs https://app.dimensions.ai/details/publication/pub.1043848235
129 rdf:type schema:CreativeWork
130 https://doi.org/10.1021/la060617f schema:sameAs https://app.dimensions.ai/details/publication/pub.1056150297
131 rdf:type schema:CreativeWork
132 https://doi.org/10.1021/la801706q schema:sameAs https://app.dimensions.ai/details/publication/pub.1056163150
133 rdf:type schema:CreativeWork
134 https://doi.org/10.1088/0957-4484/12/2/321 schema:sameAs https://app.dimensions.ai/details/publication/pub.1005121855
135 rdf:type schema:CreativeWork
136 https://doi.org/10.1116/1.1941247 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062170669
137 rdf:type schema:CreativeWork
138 https://doi.org/10.1116/1.2395958 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062172063
139 rdf:type schema:CreativeWork
140 https://doi.org/10.1143/jjap.41.4186 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063068071
141 rdf:type schema:CreativeWork
142 https://doi.org/10.4028/www.scientific.net/msf.510-511.462 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072121888
143 rdf:type schema:CreativeWork
144 https://www.grid.ac/institutes/grid.222754.4 schema:alternateName Korea University
145 schema:name Department of Material Science and Engineering, Korea University, Seoul, Korea
146 Department of Nano-Semiconductor, Korea University, Seoul, Korea
147 rdf:type schema:Organization
148 https://www.grid.ac/institutes/grid.412965.d schema:alternateName Woosuk University
149 schema:name Department of Applied Chemistry, Woosuk University, 565-701, Jeonbuk, Korea
150 rdf:type schema:Organization
151 https://www.grid.ac/institutes/grid.419666.a schema:alternateName Samsung (South Korea)
152 schema:name Nano fabrication Group, Samsung Advanced Institute of Technology, Gyeonggi-do, Korea
153 rdf:type schema:Organization
 




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