Kinetics of photodegradation and nanoparticle surface accumulation of a nanosilica/epoxy coating exposed to UV light View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2017-07

AUTHORS

Hsiang-Chun Hsueh, Deborah S. Jacobs, Justin M. Gorham, Savelas A. Rabb, Lee L. Yu, Chun-Chieh Tien, Tinh Nguyen, Lipiin Sung

ABSTRACT

Temperature effect on the kinetics of photodegradation and surface accumulation of nanoparticles in an epoxy nanocoating exposed to ultraviolet light (UV) was investigated. A model epoxy coating containing 5% untreated nanosilica was selected. Exposed film specimens were removed at specified UV dose intervals for measurements of chemical degradation of the epoxy component, and nanosilica accumulation on specimen surface release as a function of UV dose for four temperatures. The chemical degradation was measured using Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and UV–visible spectroscopy. Atomic force microscopy was employed to determine the kinetics of nanosilica accumulation on the nanocoating surface during UV exposure. The temperature dependence behaviors of kinetic parameters obtained by various measurement techniques will be used to better understand the degradation mechanism and surface accumulation of nanoparticles in exterior nanocoatings. More... »

PAGES

893-902

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s11998-016-9911-4

DOI

http://dx.doi.org/10.1007/s11998-016-9911-4

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1085058840


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