Polytype Stability and Microstructural Characterization of Silicon Carbide Epitaxial Films Grown on []- and [0001]-Oriented Silicon Carbide Substrates View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2007-04

AUTHORS

S.M. Bishop, C.L. Reynolds, Z. Liliental-Weber, Y. Uprety, J. Zhu, D. Wang, M. Park, J.C. Molstad, D.E. Barnhardt, A. Shrivastava, T.S. Sudarshan, R.F. Davis

ABSTRACT

The polytype and surface and defect microstructure of epitaxial layers grown on 4H(), 4H(0001) on-axis, 4H(0001) 8° off-axis, and 6H(0001) on-axis substrates have been investigated. High-resolution x-ray diffraction (XRD) revealed the epitaxial layers on 4H() and 4H(0001) 8° off-axis to have the 4H-SiC (silicon carbide) polytype, while the 3C-SiC polytype was identified for epitaxial layers on 4H(0001) and 6H(0001) on-axis substrates. Cathodoluminescence (CL), Raman spectroscopy, and transmission electron microscopy (TEM) confirmed these results. The epitaxial surface of 4H() films was specular with a roughness of 0.16-nm root-mean-square (RMS), in contrast to the surfaces of the other epitaxial layer-substrate orientations, which contained curvilinear boundaries, growth pits (∼3 × 104 cm−2), triangular defects >100 μm, and significant step bunching. Molten KOH etching revealed large defect densities within 4H() films that decreased with film thickness to ∼106 cm−2 at 2.5 μm, while cross-sectional TEM studies showed areas free of defects and an indistinguishable film-substrate interface for 4H() epitaxial layers. More... »

PAGES

285-296

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s11664-006-0076-2

DOI

http://dx.doi.org/10.1007/s11664-006-0076-2

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1022724866


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "North Carolina State University", 
          "id": "https://www.grid.ac/institutes/grid.40803.3f", 
          "name": [
            "Department of Materials Science and Engineering, North Carolina State University, 27695, Raleigh, NC, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Bishop", 
        "givenName": "S.M.", 
        "id": "sg:person.016210102717.04", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016210102717.04"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "North Carolina State University", 
          "id": "https://www.grid.ac/institutes/grid.40803.3f", 
          "name": [
            "Department of Materials Science and Engineering, North Carolina State University, 27695, Raleigh, NC, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Reynolds", 
        "givenName": "C.L.", 
        "id": "sg:person.0607207430.09", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0607207430.09"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Lawrence Berkeley National Laboratory", 
          "id": "https://www.grid.ac/institutes/grid.184769.5", 
          "name": [
            "Lawrence Berkeley National Laboratory, 94720, Berkeley, CA, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Liliental-Weber", 
        "givenName": "Z.", 
        "id": "sg:person.013012572317.18", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013012572317.18"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Lawrence Berkeley National Laboratory", 
          "id": "https://www.grid.ac/institutes/grid.184769.5", 
          "name": [
            "Lawrence Berkeley National Laboratory, 94720, Berkeley, CA, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Uprety", 
        "givenName": "Y.", 
        "id": "sg:person.013014722313.24", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013014722313.24"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Auburn University", 
          "id": "https://www.grid.ac/institutes/grid.252546.2", 
          "name": [
            "Laboratory for Nanophotonics, Department of Physics, Auburn University, 36849, Auburn, AL, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhu", 
        "givenName": "J.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Auburn University", 
          "id": "https://www.grid.ac/institutes/grid.252546.2", 
          "name": [
            "Laboratory for Nanophotonics, Department of Physics, Auburn University, 36849, Auburn, AL, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Wang", 
        "givenName": "D.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Auburn University", 
          "id": "https://www.grid.ac/institutes/grid.252546.2", 
          "name": [
            "Laboratory for Nanophotonics, Department of Physics, Auburn University, 36849, Auburn, AL, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Park", 
        "givenName": "M.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "United States Army Research Laboratory", 
          "id": "https://www.grid.ac/institutes/grid.420282.e", 
          "name": [
            "Maxion Technologies, 20782, Hyattsville, MD, USA", 
            "Work performed at Army Research Laboratory, 20783, Adelphi, MD, USA", 
            "Global Technologies, Inc., 2265 E 25th St., 83404, Idaho Falls, ID, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Molstad", 
        "givenName": "J.C.", 
        "id": "sg:person.015251015532.14", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015251015532.14"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "University of South Carolina", 
          "id": "https://www.grid.ac/institutes/grid.254567.7", 
          "name": [
            "Department of Electrical Engineering, University of South Carolina, 29208, Columbia, SC, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Barnhardt", 
        "givenName": "D.E.", 
        "id": "sg:person.012113361751.03", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.012113361751.03"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "University of South Carolina", 
          "id": "https://www.grid.ac/institutes/grid.254567.7", 
          "name": [
            "Department of Electrical Engineering, University of South Carolina, 29208, Columbia, SC, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Shrivastava", 
        "givenName": "A.", 
        "id": "sg:person.015676644351.16", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015676644351.16"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "University of South Carolina", 
          "id": "https://www.grid.ac/institutes/grid.254567.7", 
          "name": [
            "Department of Electrical Engineering, University of South Carolina, 29208, Columbia, SC, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Sudarshan", 
        "givenName": "T.S.", 
        "id": "sg:person.010702144116.60", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010702144116.60"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Carnegie Mellon University", 
          "id": "https://www.grid.ac/institutes/grid.147455.6", 
          "name": [
            "Department of Material Science and Engineering, Carnegie Mellon University, 15213-3890, Pittsburgh, PA, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Davis", 
        "givenName": "R.F.", 
        "id": "sg:person.011752250231.90", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011752250231.90"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1002/1521-3951(199707)202:1<163::aid-pssb163>3.0.co;2-1", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1002895679"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0022-0248(96)00293-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1003277292"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0022-0248(01)02173-x", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1005981123"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0022-0248(03)01166-7", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1012357040"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0022-0248(03)01166-7", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1012357040"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0022-0248(97)00289-3", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1015723772"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1149/1.1498844", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1015866891"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2005.10.037", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1016326091"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0022-0248(93)90222-i", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1016337447"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0022-0248(93)90222-i", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1016337447"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/1521-3951(199707)202:1<529::aid-pssb529>3.0.co;2-e", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1018030047"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0039-6028(91)90877-u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1019313465"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0039-6028(91)90877-u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1019313465"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.jcrysgro.2006.02.011", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1021300765"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.jcrysgro.2006.10.207", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1022681099"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.microrel.2005.10.013", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1022753853"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.jcrysgro.2005.12.109", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1030612462"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0022-0248(90)90013-b", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1033271284"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0022-0248(90)90013-b", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1033271284"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0022-0248(01)02331-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1035649187"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0169-4332(01)00495-0", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1051849968"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0927-796x(97)00005-3", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1054664463"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.102492", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057650069"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.109291", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057656858"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.114127", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057668926"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1436293", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057706689"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1662116", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057740412"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1931039", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057832726"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.341004", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057948047"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.341608", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057948743"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.353329", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057969430"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.358021", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057978522"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.360174", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057982919"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.365048", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057991869"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.368947", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1058001457"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrev.173.787", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060439349"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrev.173.787", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060439349"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.50.13401", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060572799"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.50.13401", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060572799"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.59.7282", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060591964"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1103/physrevb.59.7282", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1060591964"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1109/55.806101", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1061189392"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1109/jqe.2002.801005", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1061305932"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1143/jjap.26.l1815", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063042270"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1143/jjap.29.l343", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063046288"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1143/jjap.38.l1375", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063062818"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1143/jjap.40.3315", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063065916"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1557/proc-0911-b07-01", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1067902357"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1557/proc-815-j5.25", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1067958654"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1557/proc-815-j7.3", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1067958670"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1557/mrs2005.74", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1067968947"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.264-268.469", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072107683"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.338-342.189", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072110788"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.389-393.195", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072113251"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.433-436.247", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072115750"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.457-460.1105", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072117246"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.457-460.237", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072117405"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.457-460.83", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072117562"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/www.scientific.net/msf.483-485.113", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1072119576"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.4028/0-87849-963-6.113", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1101945159"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2007-04", 
    "datePublishedReg": "2007-04-01", 
    "description": "The polytype and surface and defect microstructure of epitaxial layers grown on 4H(), 4H(0001) on-axis, 4H(0001) 8\u00b0 off-axis, and 6H(0001) on-axis substrates have been investigated. High-resolution x-ray diffraction (XRD) revealed the epitaxial layers on 4H() and 4H(0001) 8\u00b0 off-axis to have the 4H-SiC (silicon carbide) polytype, while the 3C-SiC polytype was identified for epitaxial layers on 4H(0001) and 6H(0001) on-axis substrates. Cathodoluminescence (CL), Raman spectroscopy, and transmission electron microscopy (TEM) confirmed these results. The epitaxial surface of 4H() films was specular with a roughness of 0.16-nm root-mean-square (RMS), in contrast to the surfaces of the other epitaxial layer-substrate orientations, which contained curvilinear boundaries, growth pits (\u223c3 \u00d7 104 cm\u22122), triangular defects >100 \u03bcm, and significant step bunching. Molten KOH etching revealed large defect densities within 4H() films that decreased with film thickness to \u223c106 cm\u22122 at 2.5 \u03bcm, while cross-sectional TEM studies showed areas free of defects and an indistinguishable film-substrate interface for 4H() epitaxial layers.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/s11664-006-0076-2", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1136213", 
        "issn": [
          "0361-5235", 
          "1543-186X"
        ], 
        "name": "Journal of Electronic Materials", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "4", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "36"
      }
    ], 
    "name": "Polytype Stability and Microstructural Characterization of Silicon Carbide Epitaxial Films Grown on []- and [0001]-Oriented Silicon Carbide Substrates", 
    "pagination": "285-296", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "6c43ac80d67c6db1a8c0100a118c08af17db686a91c4df2325de118de0cdf3c2"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/s11664-006-0076-2"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1022724866"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/s11664-006-0076-2", 
      "https://app.dimensions.ai/details/publication/pub.1022724866"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-10T19:59", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8681_00000521.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007%2Fs11664-006-0076-2"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1007/s11664-006-0076-2'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1007/s11664-006-0076-2'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1007/s11664-006-0076-2'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1007/s11664-006-0076-2'


 

This table displays all metadata directly associated to this object as RDF triples.

311 TRIPLES      21 PREDICATES      80 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/s11664-006-0076-2 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N890fad5ef6504de2a707a1110f16329e
4 schema:citation https://doi.org/10.1002/1521-3951(199707)202:1<163::aid-pssb163>3.0.co;2-1
5 https://doi.org/10.1002/1521-3951(199707)202:1<529::aid-pssb529>3.0.co;2-e
6 https://doi.org/10.1016/0022-0248(90)90013-b
7 https://doi.org/10.1016/0022-0248(93)90222-i
8 https://doi.org/10.1016/0022-0248(96)00293-x
9 https://doi.org/10.1016/0039-6028(91)90877-u
10 https://doi.org/10.1016/j.jcrysgro.2005.12.109
11 https://doi.org/10.1016/j.jcrysgro.2006.02.011
12 https://doi.org/10.1016/j.jcrysgro.2006.10.207
13 https://doi.org/10.1016/j.mee.2005.10.037
14 https://doi.org/10.1016/j.microrel.2005.10.013
15 https://doi.org/10.1016/s0022-0248(01)02173-x
16 https://doi.org/10.1016/s0022-0248(01)02331-4
17 https://doi.org/10.1016/s0022-0248(03)01166-7
18 https://doi.org/10.1016/s0022-0248(97)00289-3
19 https://doi.org/10.1016/s0169-4332(01)00495-0
20 https://doi.org/10.1016/s0927-796x(97)00005-3
21 https://doi.org/10.1063/1.102492
22 https://doi.org/10.1063/1.109291
23 https://doi.org/10.1063/1.114127
24 https://doi.org/10.1063/1.1436293
25 https://doi.org/10.1063/1.1662116
26 https://doi.org/10.1063/1.1931039
27 https://doi.org/10.1063/1.341004
28 https://doi.org/10.1063/1.341608
29 https://doi.org/10.1063/1.353329
30 https://doi.org/10.1063/1.358021
31 https://doi.org/10.1063/1.360174
32 https://doi.org/10.1063/1.365048
33 https://doi.org/10.1063/1.368947
34 https://doi.org/10.1103/physrev.173.787
35 https://doi.org/10.1103/physrevb.50.13401
36 https://doi.org/10.1103/physrevb.59.7282
37 https://doi.org/10.1109/55.806101
38 https://doi.org/10.1109/jqe.2002.801005
39 https://doi.org/10.1143/jjap.26.l1815
40 https://doi.org/10.1143/jjap.29.l343
41 https://doi.org/10.1143/jjap.38.l1375
42 https://doi.org/10.1143/jjap.40.3315
43 https://doi.org/10.1149/1.1498844
44 https://doi.org/10.1557/mrs2005.74
45 https://doi.org/10.1557/proc-0911-b07-01
46 https://doi.org/10.1557/proc-815-j5.25
47 https://doi.org/10.1557/proc-815-j7.3
48 https://doi.org/10.4028/0-87849-963-6.113
49 https://doi.org/10.4028/www.scientific.net/msf.264-268.469
50 https://doi.org/10.4028/www.scientific.net/msf.338-342.189
51 https://doi.org/10.4028/www.scientific.net/msf.389-393.195
52 https://doi.org/10.4028/www.scientific.net/msf.433-436.247
53 https://doi.org/10.4028/www.scientific.net/msf.457-460.1105
54 https://doi.org/10.4028/www.scientific.net/msf.457-460.237
55 https://doi.org/10.4028/www.scientific.net/msf.457-460.83
56 https://doi.org/10.4028/www.scientific.net/msf.483-485.113
57 schema:datePublished 2007-04
58 schema:datePublishedReg 2007-04-01
59 schema:description The polytype and surface and defect microstructure of epitaxial layers grown on 4H(), 4H(0001) on-axis, 4H(0001) 8° off-axis, and 6H(0001) on-axis substrates have been investigated. High-resolution x-ray diffraction (XRD) revealed the epitaxial layers on 4H() and 4H(0001) 8° off-axis to have the 4H-SiC (silicon carbide) polytype, while the 3C-SiC polytype was identified for epitaxial layers on 4H(0001) and 6H(0001) on-axis substrates. Cathodoluminescence (CL), Raman spectroscopy, and transmission electron microscopy (TEM) confirmed these results. The epitaxial surface of 4H() films was specular with a roughness of 0.16-nm root-mean-square (RMS), in contrast to the surfaces of the other epitaxial layer-substrate orientations, which contained curvilinear boundaries, growth pits (∼3 × 104 cm−2), triangular defects >100 μm, and significant step bunching. Molten KOH etching revealed large defect densities within 4H() films that decreased with film thickness to ∼106 cm−2 at 2.5 μm, while cross-sectional TEM studies showed areas free of defects and an indistinguishable film-substrate interface for 4H() epitaxial layers.
60 schema:genre research_article
61 schema:inLanguage en
62 schema:isAccessibleForFree false
63 schema:isPartOf Na915ea7fb42c4c9598d50eaf790b48d9
64 Nb648f4e970c44b93b1e2c2acedc53f65
65 sg:journal.1136213
66 schema:name Polytype Stability and Microstructural Characterization of Silicon Carbide Epitaxial Films Grown on []- and [0001]-Oriented Silicon Carbide Substrates
67 schema:pagination 285-296
68 schema:productId N0af79d02b34e4c61aa02361ea19195a9
69 N1da09deaa3a64789ad93ad2b3d865579
70 N6131bed2a53d4e33b99cdb470e5344ed
71 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022724866
72 https://doi.org/10.1007/s11664-006-0076-2
73 schema:sdDatePublished 2019-04-10T19:59
74 schema:sdLicense https://scigraph.springernature.com/explorer/license/
75 schema:sdPublisher N03b3106ea5e04da4b54897bb32fdbbaa
76 schema:url http://link.springer.com/10.1007%2Fs11664-006-0076-2
77 sgo:license sg:explorer/license/
78 sgo:sdDataset articles
79 rdf:type schema:ScholarlyArticle
80 N03b3106ea5e04da4b54897bb32fdbbaa schema:name Springer Nature - SN SciGraph project
81 rdf:type schema:Organization
82 N0a96023e6c4d44aab81cb8139913017a rdf:first Na0c389e4f48745e3ac662a132109d4e7
83 rdf:rest N6a86d92cb3fa4b36b0c92caa6bce19e2
84 N0af79d02b34e4c61aa02361ea19195a9 schema:name dimensions_id
85 schema:value pub.1022724866
86 rdf:type schema:PropertyValue
87 N1da09deaa3a64789ad93ad2b3d865579 schema:name readcube_id
88 schema:value 6c43ac80d67c6db1a8c0100a118c08af17db686a91c4df2325de118de0cdf3c2
89 rdf:type schema:PropertyValue
90 N2c58b4c32579413b83a553ce4b70fa35 rdf:first sg:person.010702144116.60
91 rdf:rest N72edbb9f477e4d9aa097d1b838eec7de
92 N2cdd06f480b147ab899fa0376a6e9763 rdf:first sg:person.013014722313.24
93 rdf:rest N5afdd62802be4d2c8719e53a70d9df6c
94 N573736aa2b204f51a52a86a621a76c2d rdf:first sg:person.013012572317.18
95 rdf:rest N2cdd06f480b147ab899fa0376a6e9763
96 N5afdd62802be4d2c8719e53a70d9df6c rdf:first N8c98358ab04b430cae7694bc04b8d842
97 rdf:rest Nb0fb7511fe2a47e4aca5abbd0b42cecf
98 N6131bed2a53d4e33b99cdb470e5344ed schema:name doi
99 schema:value 10.1007/s11664-006-0076-2
100 rdf:type schema:PropertyValue
101 N6a86d92cb3fa4b36b0c92caa6bce19e2 rdf:first sg:person.015251015532.14
102 rdf:rest Nfca90e6e77c54fdfb498c34fcd52e7a3
103 N7160024aab654f738471ed3eaf6177f5 schema:affiliation https://www.grid.ac/institutes/grid.252546.2
104 schema:familyName Wang
105 schema:givenName D.
106 rdf:type schema:Person
107 N72edbb9f477e4d9aa097d1b838eec7de rdf:first sg:person.011752250231.90
108 rdf:rest rdf:nil
109 N890fad5ef6504de2a707a1110f16329e rdf:first sg:person.016210102717.04
110 rdf:rest Nc10407e5aedb435eb93d500b214b159b
111 N8c98358ab04b430cae7694bc04b8d842 schema:affiliation https://www.grid.ac/institutes/grid.252546.2
112 schema:familyName Zhu
113 schema:givenName J.
114 rdf:type schema:Person
115 Na0c389e4f48745e3ac662a132109d4e7 schema:affiliation https://www.grid.ac/institutes/grid.252546.2
116 schema:familyName Park
117 schema:givenName M.
118 rdf:type schema:Person
119 Na915ea7fb42c4c9598d50eaf790b48d9 schema:issueNumber 4
120 rdf:type schema:PublicationIssue
121 Nb0fb7511fe2a47e4aca5abbd0b42cecf rdf:first N7160024aab654f738471ed3eaf6177f5
122 rdf:rest N0a96023e6c4d44aab81cb8139913017a
123 Nb648f4e970c44b93b1e2c2acedc53f65 schema:volumeNumber 36
124 rdf:type schema:PublicationVolume
125 Nc10407e5aedb435eb93d500b214b159b rdf:first sg:person.0607207430.09
126 rdf:rest N573736aa2b204f51a52a86a621a76c2d
127 Nfca90e6e77c54fdfb498c34fcd52e7a3 rdf:first sg:person.012113361751.03
128 rdf:rest Nfce60a2a69df46b9a930301c4e176386
129 Nfce60a2a69df46b9a930301c4e176386 rdf:first sg:person.015676644351.16
130 rdf:rest N2c58b4c32579413b83a553ce4b70fa35
131 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
132 schema:name Engineering
133 rdf:type schema:DefinedTerm
134 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
135 schema:name Materials Engineering
136 rdf:type schema:DefinedTerm
137 sg:journal.1136213 schema:issn 0361-5235
138 1543-186X
139 schema:name Journal of Electronic Materials
140 rdf:type schema:Periodical
141 sg:person.010702144116.60 schema:affiliation https://www.grid.ac/institutes/grid.254567.7
142 schema:familyName Sudarshan
143 schema:givenName T.S.
144 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010702144116.60
145 rdf:type schema:Person
146 sg:person.011752250231.90 schema:affiliation https://www.grid.ac/institutes/grid.147455.6
147 schema:familyName Davis
148 schema:givenName R.F.
149 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011752250231.90
150 rdf:type schema:Person
151 sg:person.012113361751.03 schema:affiliation https://www.grid.ac/institutes/grid.254567.7
152 schema:familyName Barnhardt
153 schema:givenName D.E.
154 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.012113361751.03
155 rdf:type schema:Person
156 sg:person.013012572317.18 schema:affiliation https://www.grid.ac/institutes/grid.184769.5
157 schema:familyName Liliental-Weber
158 schema:givenName Z.
159 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013012572317.18
160 rdf:type schema:Person
161 sg:person.013014722313.24 schema:affiliation https://www.grid.ac/institutes/grid.184769.5
162 schema:familyName Uprety
163 schema:givenName Y.
164 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013014722313.24
165 rdf:type schema:Person
166 sg:person.015251015532.14 schema:affiliation https://www.grid.ac/institutes/grid.420282.e
167 schema:familyName Molstad
168 schema:givenName J.C.
169 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015251015532.14
170 rdf:type schema:Person
171 sg:person.015676644351.16 schema:affiliation https://www.grid.ac/institutes/grid.254567.7
172 schema:familyName Shrivastava
173 schema:givenName A.
174 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015676644351.16
175 rdf:type schema:Person
176 sg:person.016210102717.04 schema:affiliation https://www.grid.ac/institutes/grid.40803.3f
177 schema:familyName Bishop
178 schema:givenName S.M.
179 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016210102717.04
180 rdf:type schema:Person
181 sg:person.0607207430.09 schema:affiliation https://www.grid.ac/institutes/grid.40803.3f
182 schema:familyName Reynolds
183 schema:givenName C.L.
184 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0607207430.09
185 rdf:type schema:Person
186 https://doi.org/10.1002/1521-3951(199707)202:1<163::aid-pssb163>3.0.co;2-1 schema:sameAs https://app.dimensions.ai/details/publication/pub.1002895679
187 rdf:type schema:CreativeWork
188 https://doi.org/10.1002/1521-3951(199707)202:1<529::aid-pssb529>3.0.co;2-e schema:sameAs https://app.dimensions.ai/details/publication/pub.1018030047
189 rdf:type schema:CreativeWork
190 https://doi.org/10.1016/0022-0248(90)90013-b schema:sameAs https://app.dimensions.ai/details/publication/pub.1033271284
191 rdf:type schema:CreativeWork
192 https://doi.org/10.1016/0022-0248(93)90222-i schema:sameAs https://app.dimensions.ai/details/publication/pub.1016337447
193 rdf:type schema:CreativeWork
194 https://doi.org/10.1016/0022-0248(96)00293-x schema:sameAs https://app.dimensions.ai/details/publication/pub.1003277292
195 rdf:type schema:CreativeWork
196 https://doi.org/10.1016/0039-6028(91)90877-u schema:sameAs https://app.dimensions.ai/details/publication/pub.1019313465
197 rdf:type schema:CreativeWork
198 https://doi.org/10.1016/j.jcrysgro.2005.12.109 schema:sameAs https://app.dimensions.ai/details/publication/pub.1030612462
199 rdf:type schema:CreativeWork
200 https://doi.org/10.1016/j.jcrysgro.2006.02.011 schema:sameAs https://app.dimensions.ai/details/publication/pub.1021300765
201 rdf:type schema:CreativeWork
202 https://doi.org/10.1016/j.jcrysgro.2006.10.207 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022681099
203 rdf:type schema:CreativeWork
204 https://doi.org/10.1016/j.mee.2005.10.037 schema:sameAs https://app.dimensions.ai/details/publication/pub.1016326091
205 rdf:type schema:CreativeWork
206 https://doi.org/10.1016/j.microrel.2005.10.013 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022753853
207 rdf:type schema:CreativeWork
208 https://doi.org/10.1016/s0022-0248(01)02173-x schema:sameAs https://app.dimensions.ai/details/publication/pub.1005981123
209 rdf:type schema:CreativeWork
210 https://doi.org/10.1016/s0022-0248(01)02331-4 schema:sameAs https://app.dimensions.ai/details/publication/pub.1035649187
211 rdf:type schema:CreativeWork
212 https://doi.org/10.1016/s0022-0248(03)01166-7 schema:sameAs https://app.dimensions.ai/details/publication/pub.1012357040
213 rdf:type schema:CreativeWork
214 https://doi.org/10.1016/s0022-0248(97)00289-3 schema:sameAs https://app.dimensions.ai/details/publication/pub.1015723772
215 rdf:type schema:CreativeWork
216 https://doi.org/10.1016/s0169-4332(01)00495-0 schema:sameAs https://app.dimensions.ai/details/publication/pub.1051849968
217 rdf:type schema:CreativeWork
218 https://doi.org/10.1016/s0927-796x(97)00005-3 schema:sameAs https://app.dimensions.ai/details/publication/pub.1054664463
219 rdf:type schema:CreativeWork
220 https://doi.org/10.1063/1.102492 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057650069
221 rdf:type schema:CreativeWork
222 https://doi.org/10.1063/1.109291 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057656858
223 rdf:type schema:CreativeWork
224 https://doi.org/10.1063/1.114127 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057668926
225 rdf:type schema:CreativeWork
226 https://doi.org/10.1063/1.1436293 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057706689
227 rdf:type schema:CreativeWork
228 https://doi.org/10.1063/1.1662116 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057740412
229 rdf:type schema:CreativeWork
230 https://doi.org/10.1063/1.1931039 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057832726
231 rdf:type schema:CreativeWork
232 https://doi.org/10.1063/1.341004 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057948047
233 rdf:type schema:CreativeWork
234 https://doi.org/10.1063/1.341608 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057948743
235 rdf:type schema:CreativeWork
236 https://doi.org/10.1063/1.353329 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057969430
237 rdf:type schema:CreativeWork
238 https://doi.org/10.1063/1.358021 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057978522
239 rdf:type schema:CreativeWork
240 https://doi.org/10.1063/1.360174 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057982919
241 rdf:type schema:CreativeWork
242 https://doi.org/10.1063/1.365048 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057991869
243 rdf:type schema:CreativeWork
244 https://doi.org/10.1063/1.368947 schema:sameAs https://app.dimensions.ai/details/publication/pub.1058001457
245 rdf:type schema:CreativeWork
246 https://doi.org/10.1103/physrev.173.787 schema:sameAs https://app.dimensions.ai/details/publication/pub.1060439349
247 rdf:type schema:CreativeWork
248 https://doi.org/10.1103/physrevb.50.13401 schema:sameAs https://app.dimensions.ai/details/publication/pub.1060572799
249 rdf:type schema:CreativeWork
250 https://doi.org/10.1103/physrevb.59.7282 schema:sameAs https://app.dimensions.ai/details/publication/pub.1060591964
251 rdf:type schema:CreativeWork
252 https://doi.org/10.1109/55.806101 schema:sameAs https://app.dimensions.ai/details/publication/pub.1061189392
253 rdf:type schema:CreativeWork
254 https://doi.org/10.1109/jqe.2002.801005 schema:sameAs https://app.dimensions.ai/details/publication/pub.1061305932
255 rdf:type schema:CreativeWork
256 https://doi.org/10.1143/jjap.26.l1815 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063042270
257 rdf:type schema:CreativeWork
258 https://doi.org/10.1143/jjap.29.l343 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063046288
259 rdf:type schema:CreativeWork
260 https://doi.org/10.1143/jjap.38.l1375 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063062818
261 rdf:type schema:CreativeWork
262 https://doi.org/10.1143/jjap.40.3315 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063065916
263 rdf:type schema:CreativeWork
264 https://doi.org/10.1149/1.1498844 schema:sameAs https://app.dimensions.ai/details/publication/pub.1015866891
265 rdf:type schema:CreativeWork
266 https://doi.org/10.1557/mrs2005.74 schema:sameAs https://app.dimensions.ai/details/publication/pub.1067968947
267 rdf:type schema:CreativeWork
268 https://doi.org/10.1557/proc-0911-b07-01 schema:sameAs https://app.dimensions.ai/details/publication/pub.1067902357
269 rdf:type schema:CreativeWork
270 https://doi.org/10.1557/proc-815-j5.25 schema:sameAs https://app.dimensions.ai/details/publication/pub.1067958654
271 rdf:type schema:CreativeWork
272 https://doi.org/10.1557/proc-815-j7.3 schema:sameAs https://app.dimensions.ai/details/publication/pub.1067958670
273 rdf:type schema:CreativeWork
274 https://doi.org/10.4028/0-87849-963-6.113 schema:sameAs https://app.dimensions.ai/details/publication/pub.1101945159
275 rdf:type schema:CreativeWork
276 https://doi.org/10.4028/www.scientific.net/msf.264-268.469 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072107683
277 rdf:type schema:CreativeWork
278 https://doi.org/10.4028/www.scientific.net/msf.338-342.189 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072110788
279 rdf:type schema:CreativeWork
280 https://doi.org/10.4028/www.scientific.net/msf.389-393.195 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072113251
281 rdf:type schema:CreativeWork
282 https://doi.org/10.4028/www.scientific.net/msf.433-436.247 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072115750
283 rdf:type schema:CreativeWork
284 https://doi.org/10.4028/www.scientific.net/msf.457-460.1105 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072117246
285 rdf:type schema:CreativeWork
286 https://doi.org/10.4028/www.scientific.net/msf.457-460.237 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072117405
287 rdf:type schema:CreativeWork
288 https://doi.org/10.4028/www.scientific.net/msf.457-460.83 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072117562
289 rdf:type schema:CreativeWork
290 https://doi.org/10.4028/www.scientific.net/msf.483-485.113 schema:sameAs https://app.dimensions.ai/details/publication/pub.1072119576
291 rdf:type schema:CreativeWork
292 https://www.grid.ac/institutes/grid.147455.6 schema:alternateName Carnegie Mellon University
293 schema:name Department of Material Science and Engineering, Carnegie Mellon University, 15213-3890, Pittsburgh, PA, USA
294 rdf:type schema:Organization
295 https://www.grid.ac/institutes/grid.184769.5 schema:alternateName Lawrence Berkeley National Laboratory
296 schema:name Lawrence Berkeley National Laboratory, 94720, Berkeley, CA, USA
297 rdf:type schema:Organization
298 https://www.grid.ac/institutes/grid.252546.2 schema:alternateName Auburn University
299 schema:name Laboratory for Nanophotonics, Department of Physics, Auburn University, 36849, Auburn, AL, USA
300 rdf:type schema:Organization
301 https://www.grid.ac/institutes/grid.254567.7 schema:alternateName University of South Carolina
302 schema:name Department of Electrical Engineering, University of South Carolina, 29208, Columbia, SC, USA
303 rdf:type schema:Organization
304 https://www.grid.ac/institutes/grid.40803.3f schema:alternateName North Carolina State University
305 schema:name Department of Materials Science and Engineering, North Carolina State University, 27695, Raleigh, NC, USA
306 rdf:type schema:Organization
307 https://www.grid.ac/institutes/grid.420282.e schema:alternateName United States Army Research Laboratory
308 schema:name Global Technologies, Inc., 2265 E 25th St., 83404, Idaho Falls, ID, USA
309 Maxion Technologies, 20782, Hyattsville, MD, USA
310 Work performed at Army Research Laboratory, 20783, Adelphi, MD, USA
311 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...