Contact mechanics of a flexible imprinter for photocured nanoimprint lithography View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2005-05

AUTHORS

G.M. McClelland, C.T. Rettner, M.W. Hart, K.R. Carter, M.I. Sanchez, M.E. Best, B.D. Terris

ABSTRACT

A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage. More... »

PAGES

59-63

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s11249-005-4265-6

DOI

http://dx.doi.org/10.1007/s11249-005-4265-6

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1037391917


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