The effect of substrate material on the properties of tantalum oxide films View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2011-05-25

AUTHORS

V. M. Kalygina, A. T. Zyryanov, V. A. Novikov, Yu. S. Petrova, M. S. Skakunov, O. P. Tolbanov, A. V. Tyazhev, T. M. Yaskevich

ABSTRACT

The effect of substrate material on the electrical characteristics of TaxOy films produced by high-frequency magnetron sputtering of a tantalum oxide target is studied. The effect of oxygen plasma on leakage currents, dielectric permittivity, and dielectric dissipation factor of thin (300–400 nm) TaxOy layers is found. It is proposed to process tantalum oxide films in oxygen plasma to control their electrical and dielectric properties. More... »

PAGES

1312-1317

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s11182-011-9566-7

DOI

http://dx.doi.org/10.1007/s11182-011-9566-7

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1050603308


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