Ontology type: schema:ScholarlyArticle
2006-12
AUTHORSL. G. Lavrentieva, M. D. Vilisova, I. A. Bobrovnikova, I. V. Ivonin, V. V. Preobrazhenskii, V. V. Chaldyshev
ABSTRACTThe problem of defect formation in the GaAs and InGaAs layers grown by low-temperature molecular-beam epitaxy is discussed. The effect of growth conditions (temperature and flux ratio between the elements of groups III and V) on the morphology of growth surface, internal structure, type, and concentration of electrically-and optically active defects is analyzed. A comparison is made between the defect formation processes occuring during the epitaxial growth and post-growth annealing of the layers. More... »
PAGES1334-1343
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DOIhttp://dx.doi.org/10.1007/s11182-006-0263-x
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