High-intensity ion implantation - a technique to form finely dispersed intermetallic compounds in surface layers of metals View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2004-01

AUTHORS

Yu. P. Sharkeev, A. I. Ryabchikov, E. V. Kozlov, I. A. Kurzina, I. B. Stepanov, I. A. Bozhko, M. P. Kalashnikov, S. V. Fortuna, D. O. Sivin

ABSTRACT

The results of experimental investigations of microstructure and phase composition of surface ion-alloyed layers of nickel, titanium, and iron formed under the conditions of high-intensity aluminum-ion implantation are presented. It is established that aluminum-ion implantation under high-intensity modes makes it possible to form finely-dispersed intermetallic phases of Me3Al (Me = Ni, Ti, Fe) and MeAl (Ni, Ti), as well as solid solutions of a composition variable with respect to depth in the surface layers measuring up to 2000 nm. It is shown that the average grain-size of intermetallic phases formed in ion-alloyed layers is 20–80 nm. Regions of localization of the phases thus formed over the implanted layer depth are determined. More... »

PAGES

936-945

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s11182-004-0004-y

DOI

http://dx.doi.org/10.1007/s11182-004-0004-y

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1007465882


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