Effect of C2H4/N2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films ... View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2010-04

AUTHORS

Christian Sarra-Bournet, Nicolas Gherardi, Hervé Glénat, Gaétan Laroche, Francoise Massines

ABSTRACT

The goal of this study was to investigate the properties and growth mechanisms of nitrogen-containing carbon-based coatings obtained with an atmospheric pressure dielectric barrier discharge in an N2-C2H4 atmosphere. Radically different chemical compositions were observed depending on C2H4/N2 ratio. With a low C2H4 concentration (<400 ppm) as a function of the residence time in the discharge, two different growth mechanisms were observed consisting of a highly nitrogenated coating (N/C > 0.8) and low hydrogen content. At the short residence time, growth was due to mobile small radicals that procured a smooth yet soluble coating, while at the longer residence time, diffusion-limited aggregation of high sticking N-containing radicals produced a cauliflower-like structure. With a high C2H4 concentration (≥2,000 ppm), a polymer-like coating with relatively lower nitrogen content (N/C ~ 0.2) was observed with a cauliflower morphology for the entire coating. Nanoindentation measurements revealed very different physical properties in the two types of coatings. More... »

PAGES

213-239

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s11090-010-9214-y

DOI

http://dx.doi.org/10.1007/s11090-010-9214-y

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1049684052


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