Closed-loop modeling of silicon nanophotonics from design to fabrication and back again View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2008-09

AUTHORS

Wim Bogaerts, Paul Bradt, Lieven Vanholme, Peter Bienstman, Roel Baets

ABSTRACT

We present a method for component-centric modeling of silicon nanophotonics, where a closed optimization loop allows to take the effects of the fabrication process into account during the design of nanophotonic components. This enables black-box component descriptions with functional parameters. Underlying mask layouts of the components can then automatically be optimized for their actual performance, and not just for their geometric layout. To simulate the effect of fabrication, we developed a projection lithography simulator which was included inside the optimization loop. This method was applied to the design of a 1-dimensional distributed Bragg mirror. More... »

PAGES

801-811

References to SciGraph publications

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s11082-008-9265-y

DOI

http://dx.doi.org/10.1007/s11082-008-9265-y

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1044604345


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