Structural and Morphological Investigations of Deposited Tungsten Nitride Thin Films Using Plasma Focus Device View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2011-10

AUTHORS

M. T. Hosseinnejad, G. R. Etaati, M. Ghoranneviss, M. shirazi, Z. Ghorannevis

ABSTRACT

Tungsten nitride thin films were deposited on the stainless steel-304 substrates by a 2 kJ Mather-type plasma focus device. The preparation method and characterization data are presented. The average size of crystallites, sub-micro structures and size of grains were characterized by X-ray diffractometer (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) respectively, which increases by increasing the number of focus shots from 10 to 20 then 30 shots. More... »

PAGES

382-387

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s10894-011-9391-6

DOI

http://dx.doi.org/10.1007/s10894-011-9391-6

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1051545639


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