Structural, optoelectronic and electrochemical properties of nickel oxide films View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2009-10

AUTHORS

B. Subramanian, M. Mohammed Ibrahim, K. R. Murali, V. S. Vidhya, C. Sanjeeviraja, M. Jayachandran

ABSTRACT

Thin nickel oxide (NiO) films were deposited by the electron beam evaporation technique. The films were post annealed in air at 450–500 °C for 5 h and the effect of annealing on the structural, microstructural, electrical and optical properties were studied. X-ray diffraction studies indicated the polycrystalline nature of the films. The microstructural parameters were evaluated. The band gap of the films was found to be about 3.60 eV. Electrical resistivity of the films was 4.5 × 10−4 Ω cm. FTIR studies indicated a broad spectrum centered at 461.6 cm−1. Cyclic voltammetry studies in 1 M KOH solution revealed good electronic electrochromic behaviour. More... »

PAGES

953-957

References to SciGraph publications

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s10854-008-9819-6

DOI

http://dx.doi.org/10.1007/s10854-008-9819-6

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https://app.dimensions.ai/details/publication/pub.1032311606


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