Microlens array fabrication by backside exposure using Fraunhofer diffraction View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2008-10

AUTHORS

In-Hyouk Song, Kyung-Nam Kang, Yoonyoung Jin, Daniel S.-W. Park, Pratul K. Ajmera

ABSTRACT

In UV-lithography, a gap between photoresist and UV-mask results in diffraction. Fresnel or near-field diffraction in thick positive and negative resists for microstructures resulting from a small gap in contact or proximity printing has been previously investigated. In this work, Fraunhofer or far-field diffraction is utilized to form microlens arrays. Backside-exposure of SU-8 resist through Pyrex 7740 transparent glass substrate is conducted. The exposure intensity profile on the interface between Pyrex 7740 glass wafer and negative SU-8 resist is modeled taking into account Fraunhofer diffraction for a circular aperture opening. The effects of varying applied UV-doses and aperture diameters on the formation of microlens arrays are described. The simulated surface profile shows a good agreement with the experimentally observed surface profiles of the microstructures. The paper demonstrates the ease with which a microlens array can be fabricated by backside exposure technique using Fraunhofer diffraction. More... »

PAGES

1285-1290

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s00542-007-0510-2

DOI

http://dx.doi.org/10.1007/s00542-007-0510-2

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1017118054


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Ecole Polytechnique de Montr\u00e9al", 
          "id": "https://www.grid.ac/institutes/grid.183158.6", 
          "name": [
            "Department of Physics Engineering, \u00c9cole Polytechnique de Montr\u00e9al, H3C 3A7, Montr\u00e9al, QC, Canada"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Song", 
        "givenName": "In-Hyouk", 
        "id": "sg:person.0711650425.50", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0711650425.50"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Louisiana State University", 
          "id": "https://www.grid.ac/institutes/grid.64337.35", 
          "name": [
            "Department of Electrical and Computer Engineering, Louisiana State University, 70803, Baton Rouge, LA, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Kang", 
        "givenName": "Kyung-Nam", 
        "id": "sg:person.07650261517.40", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.07650261517.40"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Louisiana State University", 
          "id": "https://www.grid.ac/institutes/grid.64337.35", 
          "name": [
            "Center for Advanced Microstructures and Devices, Louisiana State University, 70806, Baton Rouge, LA, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Jin", 
        "givenName": "Yoonyoung", 
        "id": "sg:person.010120126675.38", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010120126675.38"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Louisiana State University", 
          "id": "https://www.grid.ac/institutes/grid.64337.35", 
          "name": [
            "Center for BioModular Multi-scale Systems, Louisiana State University, 70803, Baton Rouge, LA, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Park", 
        "givenName": "Daniel S.-W.", 
        "id": "sg:person.015434024742.65", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015434024742.65"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Louisiana State University", 
          "id": "https://www.grid.ac/institutes/grid.64337.35", 
          "name": [
            "Department of Electrical and Computer Engineering, Louisiana State University, 70803, Baton Rouge, LA, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Ajmera", 
        "givenName": "Pratul K.", 
        "id": "sg:person.012546105716.49", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.012546105716.49"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1088/0960-1317/14/4/021", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1002592745"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s00542-006-0333-6", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1014813962", 
          "https://doi.org/10.1007/s00542-006-0333-6"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0960-1317/13/3/305", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1022526961"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1039/b403304c", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043398186"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s00542-002-0176-8", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1044955299", 
          "https://doi.org/10.1007/s00542-002-0176-8"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1109/84.749398", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1061240663"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2008-10", 
    "datePublishedReg": "2008-10-01", 
    "description": "In UV-lithography, a gap between photoresist and UV-mask results in diffraction. Fresnel or near-field diffraction in thick positive and negative resists for microstructures resulting from a small gap in contact or proximity printing has been previously investigated. In this work, Fraunhofer or far-field diffraction is utilized to form microlens arrays. Backside-exposure of SU-8 resist through Pyrex 7740 transparent glass substrate is conducted. The exposure intensity profile on the interface between Pyrex 7740 glass wafer and negative SU-8 resist is modeled taking into account Fraunhofer diffraction for a circular aperture opening. The effects of varying applied UV-doses and aperture diameters on the formation of microlens arrays are described. The simulated surface profile shows a good agreement with the experimentally observed surface profiles of the microstructures. The paper demonstrates the ease with which a microlens array can be fabricated by backside exposure technique using Fraunhofer diffraction.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/s00542-007-0510-2", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1294787", 
        "issn": [
          "0946-7076", 
          "1432-1858"
        ], 
        "name": "Microsystem Technologies", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "9-11", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "14"
      }
    ], 
    "name": "Microlens array fabrication by backside exposure using Fraunhofer diffraction", 
    "pagination": "1285-1290", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "518eb261581038ea4b2a6e51d8d3ac4e5dbef7c190a55fa40034502ae5cbc25d"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/s00542-007-0510-2"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1017118054"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/s00542-007-0510-2", 
      "https://app.dimensions.ai/details/publication/pub.1017118054"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T14:31", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000373_0000000373/records_13096_00000000.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007%2Fs00542-007-0510-2"
  }
]
 

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This table displays all metadata directly associated to this object as RDF triples.

114 TRIPLES      21 PREDICATES      33 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/s00542-007-0510-2 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N277898b4226b42e1bfca66b66937f914
4 schema:citation sg:pub.10.1007/s00542-002-0176-8
5 sg:pub.10.1007/s00542-006-0333-6
6 https://doi.org/10.1039/b403304c
7 https://doi.org/10.1088/0960-1317/13/3/305
8 https://doi.org/10.1088/0960-1317/14/4/021
9 https://doi.org/10.1109/84.749398
10 schema:datePublished 2008-10
11 schema:datePublishedReg 2008-10-01
12 schema:description In UV-lithography, a gap between photoresist and UV-mask results in diffraction. Fresnel or near-field diffraction in thick positive and negative resists for microstructures resulting from a small gap in contact or proximity printing has been previously investigated. In this work, Fraunhofer or far-field diffraction is utilized to form microlens arrays. Backside-exposure of SU-8 resist through Pyrex 7740 transparent glass substrate is conducted. The exposure intensity profile on the interface between Pyrex 7740 glass wafer and negative SU-8 resist is modeled taking into account Fraunhofer diffraction for a circular aperture opening. The effects of varying applied UV-doses and aperture diameters on the formation of microlens arrays are described. The simulated surface profile shows a good agreement with the experimentally observed surface profiles of the microstructures. The paper demonstrates the ease with which a microlens array can be fabricated by backside exposure technique using Fraunhofer diffraction.
13 schema:genre research_article
14 schema:inLanguage en
15 schema:isAccessibleForFree false
16 schema:isPartOf N254147d4291b4875b05de00cf8f170b8
17 N3d3ccce4fcbb49e299e1abd9190e1be8
18 sg:journal.1294787
19 schema:name Microlens array fabrication by backside exposure using Fraunhofer diffraction
20 schema:pagination 1285-1290
21 schema:productId N2ee6568e6cf34ea793b3b0393289241d
22 Na81314304966421c85c4799dd3b899dd
23 Ne2d79c7510404e9e934094f7f493cab7
24 schema:sameAs https://app.dimensions.ai/details/publication/pub.1017118054
25 https://doi.org/10.1007/s00542-007-0510-2
26 schema:sdDatePublished 2019-04-11T14:31
27 schema:sdLicense https://scigraph.springernature.com/explorer/license/
28 schema:sdPublisher N5a539d5787554e4d81c4d65ea0c959ab
29 schema:url http://link.springer.com/10.1007%2Fs00542-007-0510-2
30 sgo:license sg:explorer/license/
31 sgo:sdDataset articles
32 rdf:type schema:ScholarlyArticle
33 N1376577b79984724b7eb7e6c054874b0 rdf:first sg:person.015434024742.65
34 rdf:rest Na867eaaba0964a2fb907a805ac256f84
35 N254147d4291b4875b05de00cf8f170b8 schema:issueNumber 9-11
36 rdf:type schema:PublicationIssue
37 N277898b4226b42e1bfca66b66937f914 rdf:first sg:person.0711650425.50
38 rdf:rest N61153370d2db45e380ac2413653101b9
39 N2ee6568e6cf34ea793b3b0393289241d schema:name readcube_id
40 schema:value 518eb261581038ea4b2a6e51d8d3ac4e5dbef7c190a55fa40034502ae5cbc25d
41 rdf:type schema:PropertyValue
42 N3d3ccce4fcbb49e299e1abd9190e1be8 schema:volumeNumber 14
43 rdf:type schema:PublicationVolume
44 N48ab33d7db2d4bd3a6913e8ea3722bb4 rdf:first sg:person.010120126675.38
45 rdf:rest N1376577b79984724b7eb7e6c054874b0
46 N5a539d5787554e4d81c4d65ea0c959ab schema:name Springer Nature - SN SciGraph project
47 rdf:type schema:Organization
48 N61153370d2db45e380ac2413653101b9 rdf:first sg:person.07650261517.40
49 rdf:rest N48ab33d7db2d4bd3a6913e8ea3722bb4
50 Na81314304966421c85c4799dd3b899dd schema:name dimensions_id
51 schema:value pub.1017118054
52 rdf:type schema:PropertyValue
53 Na867eaaba0964a2fb907a805ac256f84 rdf:first sg:person.012546105716.49
54 rdf:rest rdf:nil
55 Ne2d79c7510404e9e934094f7f493cab7 schema:name doi
56 schema:value 10.1007/s00542-007-0510-2
57 rdf:type schema:PropertyValue
58 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
59 schema:name Engineering
60 rdf:type schema:DefinedTerm
61 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
62 schema:name Materials Engineering
63 rdf:type schema:DefinedTerm
64 sg:journal.1294787 schema:issn 0946-7076
65 1432-1858
66 schema:name Microsystem Technologies
67 rdf:type schema:Periodical
68 sg:person.010120126675.38 schema:affiliation https://www.grid.ac/institutes/grid.64337.35
69 schema:familyName Jin
70 schema:givenName Yoonyoung
71 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010120126675.38
72 rdf:type schema:Person
73 sg:person.012546105716.49 schema:affiliation https://www.grid.ac/institutes/grid.64337.35
74 schema:familyName Ajmera
75 schema:givenName Pratul K.
76 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.012546105716.49
77 rdf:type schema:Person
78 sg:person.015434024742.65 schema:affiliation https://www.grid.ac/institutes/grid.64337.35
79 schema:familyName Park
80 schema:givenName Daniel S.-W.
81 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015434024742.65
82 rdf:type schema:Person
83 sg:person.0711650425.50 schema:affiliation https://www.grid.ac/institutes/grid.183158.6
84 schema:familyName Song
85 schema:givenName In-Hyouk
86 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0711650425.50
87 rdf:type schema:Person
88 sg:person.07650261517.40 schema:affiliation https://www.grid.ac/institutes/grid.64337.35
89 schema:familyName Kang
90 schema:givenName Kyung-Nam
91 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.07650261517.40
92 rdf:type schema:Person
93 sg:pub.10.1007/s00542-002-0176-8 schema:sameAs https://app.dimensions.ai/details/publication/pub.1044955299
94 https://doi.org/10.1007/s00542-002-0176-8
95 rdf:type schema:CreativeWork
96 sg:pub.10.1007/s00542-006-0333-6 schema:sameAs https://app.dimensions.ai/details/publication/pub.1014813962
97 https://doi.org/10.1007/s00542-006-0333-6
98 rdf:type schema:CreativeWork
99 https://doi.org/10.1039/b403304c schema:sameAs https://app.dimensions.ai/details/publication/pub.1043398186
100 rdf:type schema:CreativeWork
101 https://doi.org/10.1088/0960-1317/13/3/305 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022526961
102 rdf:type schema:CreativeWork
103 https://doi.org/10.1088/0960-1317/14/4/021 schema:sameAs https://app.dimensions.ai/details/publication/pub.1002592745
104 rdf:type schema:CreativeWork
105 https://doi.org/10.1109/84.749398 schema:sameAs https://app.dimensions.ai/details/publication/pub.1061240663
106 rdf:type schema:CreativeWork
107 https://www.grid.ac/institutes/grid.183158.6 schema:alternateName Ecole Polytechnique de Montréal
108 schema:name Department of Physics Engineering, École Polytechnique de Montréal, H3C 3A7, Montréal, QC, Canada
109 rdf:type schema:Organization
110 https://www.grid.ac/institutes/grid.64337.35 schema:alternateName Louisiana State University
111 schema:name Center for Advanced Microstructures and Devices, Louisiana State University, 70806, Baton Rouge, LA, USA
112 Center for BioModular Multi-scale Systems, Louisiana State University, 70803, Baton Rouge, LA, USA
113 Department of Electrical and Computer Engineering, Louisiana State University, 70803, Baton Rouge, LA, USA
114 rdf:type schema:Organization
 




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