Ablation characteristics of Au, Ag, and Cu metals using a femtosecond Ti:sapphire laser View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

1999-12

AUTHORS

K. Furusawa, K. Takahashi, H. Kumagai, K. Midorikawa, M. Obara

ABSTRACT

Femtosecond laser ablation of metallic bulk crystals of Au, Ag and Cu was experimentally studied with laser pulse widths ranging from 120 fs through 800 fs at a center wavelength of 780 nm for micro-machining applications. Two different ablation regimes were found in terms of the laser fluence. The characteristic length of different ablation regimes was explained in terms of the optical skin depth and thermal diffusion length; it was determined by the peak electron temperature in the two-temperature model. The lateral feature of the two ablation regimes is discriminated by the amount of particles accumulated by the evaporation process. Ablated particle was observed less in the lower fluence regime than in the higher fluence regime, but there was no significant difference on the ablated surface. The parameters used in the two-temperature model, are discussed in order to model the ultrashort pulsed laser ablation process theoretically. It is shown that the obtainable range of the lower fluence regime is enhanced with the shorter pulse lasers, because the ablation etch rate is decreased with longer pulse width. More... »

PAGES

s359-s366

Journal

TITLE

Applied Physics A

ISSUE

Suppl 1

VOLUME

69

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s003390051417

DOI

http://dx.doi.org/10.1007/s003390051417

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1044382670


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0910", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Manufacturing Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Keio University", 
          "id": "https://www.grid.ac/institutes/grid.26091.3c", 
          "name": [
            "Department of Electronics and Electrical Engineering, Keio University, 3-14-1, Hiyoshi, Kouhoku-ku, Yokohama 223-8522, Japan (E-mail: obara@obara.elec.keio.ac.jp), JP"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Furusawa", 
        "givenName": "K.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Keio University", 
          "id": "https://www.grid.ac/institutes/grid.26091.3c", 
          "name": [
            "Department of Electronics and Electrical Engineering, Keio University, 3-14-1, Hiyoshi, Kouhoku-ku, Yokohama 223-8522, Japan (E-mail: obara@obara.elec.keio.ac.jp), JP"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Takahashi", 
        "givenName": "K.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "name": [
            "Laser Technology Laboratory, The Institute of Physical and Chemical Research (RIKEN) 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan, JP"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Kumagai", 
        "givenName": "H.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "name": [
            "Laser Technology Laboratory, The Institute of Physical and Chemical Research (RIKEN) 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan, JP"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Midorikawa", 
        "givenName": "K.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Keio University", 
          "id": "https://www.grid.ac/institutes/grid.26091.3c", 
          "name": [
            "Department of Electronics and Electrical Engineering, Keio University, 3-14-1, Hiyoshi, Kouhoku-ku, Yokohama 223-8522, Japan (E-mail: obara@obara.elec.keio.ac.jp), JP"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Obara", 
        "givenName": "M.", 
        "type": "Person"
      }
    ], 
    "datePublished": "1999-12", 
    "datePublishedReg": "1999-12-01", 
    "description": "Femtosecond laser ablation of metallic bulk crystals of Au, Ag and Cu was experimentally studied with laser pulse widths ranging from 120 fs through 800 fs at a center wavelength of 780 nm for micro-machining applications. Two different ablation regimes were found in terms of the laser fluence. The characteristic length of different ablation regimes was explained in terms of the optical skin depth and thermal diffusion length; it was determined by the peak electron temperature in the two-temperature model. The lateral feature of the two ablation regimes is discriminated by the amount of particles accumulated by the evaporation process. Ablated particle was observed less in the lower fluence regime than in the higher fluence regime, but there was no significant difference on the ablated surface. The parameters used in the two-temperature model, are discussed in order to model the ultrashort pulsed laser ablation process theoretically. It is shown that the obtainable range of the lower fluence regime is enhanced with the shorter pulse lasers, because the ablation etch rate is decreased with longer pulse width.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/s003390051417", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1022207", 
        "issn": [
          "0947-8396", 
          "1432-0630"
        ], 
        "name": "Applied Physics A", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "Suppl 1", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "69"
      }
    ], 
    "name": "Ablation characteristics of Au, Ag, and Cu metals using a femtosecond Ti:sapphire laser", 
    "pagination": "s359-s366", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "d3691e33c0ad42eb00430a4c922f2717461ba0bc4be569efc5c1e682df71f472"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/s003390051417"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1044382670"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/s003390051417", 
      "https://app.dimensions.ai/details/publication/pub.1044382670"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-10T14:55", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8663_00000491.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007/s003390051417"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1007/s003390051417'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1007/s003390051417'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1007/s003390051417'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1007/s003390051417'


 

This table displays all metadata directly associated to this object as RDF triples.

88 TRIPLES      20 PREDICATES      27 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/s003390051417 schema:about anzsrc-for:09
2 anzsrc-for:0910
3 schema:author N562d531325124a299cc689c43ccb1a5d
4 schema:datePublished 1999-12
5 schema:datePublishedReg 1999-12-01
6 schema:description Femtosecond laser ablation of metallic bulk crystals of Au, Ag and Cu was experimentally studied with laser pulse widths ranging from 120 fs through 800 fs at a center wavelength of 780 nm for micro-machining applications. Two different ablation regimes were found in terms of the laser fluence. The characteristic length of different ablation regimes was explained in terms of the optical skin depth and thermal diffusion length; it was determined by the peak electron temperature in the two-temperature model. The lateral feature of the two ablation regimes is discriminated by the amount of particles accumulated by the evaporation process. Ablated particle was observed less in the lower fluence regime than in the higher fluence regime, but there was no significant difference on the ablated surface. The parameters used in the two-temperature model, are discussed in order to model the ultrashort pulsed laser ablation process theoretically. It is shown that the obtainable range of the lower fluence regime is enhanced with the shorter pulse lasers, because the ablation etch rate is decreased with longer pulse width.
7 schema:genre research_article
8 schema:inLanguage en
9 schema:isAccessibleForFree false
10 schema:isPartOf Nd00f2479039a4093b9b52355f4018e2c
11 Ne18f5945c2164f85807cebd9441c9d39
12 sg:journal.1022207
13 schema:name Ablation characteristics of Au, Ag, and Cu metals using a femtosecond Ti:sapphire laser
14 schema:pagination s359-s366
15 schema:productId N58c559015e8e4d239f11a263a646b578
16 N6371e5b437fa4054aa4db75254e0c3a3
17 Nd14bfde1f2604f77b69375effa8df072
18 schema:sameAs https://app.dimensions.ai/details/publication/pub.1044382670
19 https://doi.org/10.1007/s003390051417
20 schema:sdDatePublished 2019-04-10T14:55
21 schema:sdLicense https://scigraph.springernature.com/explorer/license/
22 schema:sdPublisher Nbc0a427660f846fc93ad4b56b3dd51b9
23 schema:url http://link.springer.com/10.1007/s003390051417
24 sgo:license sg:explorer/license/
25 sgo:sdDataset articles
26 rdf:type schema:ScholarlyArticle
27 N0b96a2d3961842e5aad2dfc1b39982f8 schema:name Laser Technology Laboratory, The Institute of Physical and Chemical Research (RIKEN) 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan, JP
28 rdf:type schema:Organization
29 N0d47c6b5371442a08356fa8b77a7f635 schema:affiliation N19d9f21d7a204a209f6095ada7182722
30 schema:familyName Kumagai
31 schema:givenName H.
32 rdf:type schema:Person
33 N1688fd5c1dbd47c9937bd5c006be316f rdf:first N3be75a9f7c5c4804b3b956c065f8ae31
34 rdf:rest rdf:nil
35 N174187fc61a94364ab4e42a3b6f4bd5e schema:affiliation N0b96a2d3961842e5aad2dfc1b39982f8
36 schema:familyName Midorikawa
37 schema:givenName K.
38 rdf:type schema:Person
39 N19d9f21d7a204a209f6095ada7182722 schema:name Laser Technology Laboratory, The Institute of Physical and Chemical Research (RIKEN) 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan, JP
40 rdf:type schema:Organization
41 N3be75a9f7c5c4804b3b956c065f8ae31 schema:affiliation https://www.grid.ac/institutes/grid.26091.3c
42 schema:familyName Obara
43 schema:givenName M.
44 rdf:type schema:Person
45 N562d531325124a299cc689c43ccb1a5d rdf:first Ne691ef99121a4ed4a90b7ead8581fc6a
46 rdf:rest Nd06e72847d8f4c97aa2a61162a7b7e01
47 N58c559015e8e4d239f11a263a646b578 schema:name dimensions_id
48 schema:value pub.1044382670
49 rdf:type schema:PropertyValue
50 N6371e5b437fa4054aa4db75254e0c3a3 schema:name doi
51 schema:value 10.1007/s003390051417
52 rdf:type schema:PropertyValue
53 N68adfa60620e42ee92793f1c4913481e rdf:first N0d47c6b5371442a08356fa8b77a7f635
54 rdf:rest N83c98691e24a4bfda41461f7be0c65ab
55 N83c98691e24a4bfda41461f7be0c65ab rdf:first N174187fc61a94364ab4e42a3b6f4bd5e
56 rdf:rest N1688fd5c1dbd47c9937bd5c006be316f
57 Nbc0a427660f846fc93ad4b56b3dd51b9 schema:name Springer Nature - SN SciGraph project
58 rdf:type schema:Organization
59 Nd00f2479039a4093b9b52355f4018e2c schema:volumeNumber 69
60 rdf:type schema:PublicationVolume
61 Nd06e72847d8f4c97aa2a61162a7b7e01 rdf:first Nf06bf2eafa3c4c0bac966cfded8e994d
62 rdf:rest N68adfa60620e42ee92793f1c4913481e
63 Nd14bfde1f2604f77b69375effa8df072 schema:name readcube_id
64 schema:value d3691e33c0ad42eb00430a4c922f2717461ba0bc4be569efc5c1e682df71f472
65 rdf:type schema:PropertyValue
66 Ne18f5945c2164f85807cebd9441c9d39 schema:issueNumber Suppl 1
67 rdf:type schema:PublicationIssue
68 Ne691ef99121a4ed4a90b7ead8581fc6a schema:affiliation https://www.grid.ac/institutes/grid.26091.3c
69 schema:familyName Furusawa
70 schema:givenName K.
71 rdf:type schema:Person
72 Nf06bf2eafa3c4c0bac966cfded8e994d schema:affiliation https://www.grid.ac/institutes/grid.26091.3c
73 schema:familyName Takahashi
74 schema:givenName K.
75 rdf:type schema:Person
76 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
77 schema:name Engineering
78 rdf:type schema:DefinedTerm
79 anzsrc-for:0910 schema:inDefinedTermSet anzsrc-for:
80 schema:name Manufacturing Engineering
81 rdf:type schema:DefinedTerm
82 sg:journal.1022207 schema:issn 0947-8396
83 1432-0630
84 schema:name Applied Physics A
85 rdf:type schema:Periodical
86 https://www.grid.ac/institutes/grid.26091.3c schema:alternateName Keio University
87 schema:name Department of Electronics and Electrical Engineering, Keio University, 3-14-1, Hiyoshi, Kouhoku-ku, Yokohama 223-8522, Japan (E-mail: obara@obara.elec.keio.ac.jp), JP
88 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...