Submicron focusing of XUV radiation from a laser plasma source using a multilayer Laue lens View Full Text


Ontology type: schema:ScholarlyArticle      Open Access: True


Article Info

DATE

2011-01

AUTHORS

M. Reese, B. Schäfer, P. Großmann, A. Bayer, K. Mann, T. Liese, H. U. Krebs

ABSTRACT

The focusing properties of a one-dimensional multilayer Laue lens (MLL) were investigated using monochromatic soft X-ray radiation from a table-top, laser-produced plasma source. The MLL was fabricated by a focused ion beam (FIB) structuring of pulsed laser deposited ZrO2/Ti multilayers. This novel method offers the potential to overcome limitations encountered in electron lithographic processes. Utilizing this multilayer Laue lens, a line focus of XUV radiation from a laser-induced plasma in a nitrogen gas puff target could be generated. The evaluated focal length is close to the designed value of 220 μm for the measurement wavelength of 2.88 nm. Divergence angle and beam waist diameter are measured by a moving knife edge and a far-field experiment, determining all relevant second-order moments based beam parameters. The waist diameter has been found to be approximately 370 nm (FWHM). More... »

PAGES

85-90

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s00339-010-6148-4

DOI

http://dx.doi.org/10.1007/s00339-010-6148-4

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1042910389


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