Development of Al-based multilayer optics for EUV View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2010-01

AUTHORS

E. Meltchakov, C. Hecquet, M. Roulliay, S. De Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, F. Delmotte

ABSTRACT

We report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications. More... »

PAGES

111

References to SciGraph publications

Journal

TITLE

Applied Physics A

ISSUE

1

VOLUME

98

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s00339-009-5445-2

DOI

http://dx.doi.org/10.1007/s00339-009-5445-2

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1030747103


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40 schema:description We report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications.
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