Hole drilling in stainless steel and silicon by femtosecond pulses at low pressure View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2004-09

AUTHORS

S. Juodkazis, H. Okuno, N. Kujime, S. Matsuo, H. Misawa

ABSTRACT

We report on the ablation and hole drilling in stainless steel SUS304 and Si by femtosecond pulses (wavelength 800 nm; pulse duration >80 fs) at the room and low (5 Torr) air pressure ambient. It was found that the quality of surface processing is improved at low pressure avoiding debris formation. The improvement is due to suppression of the conical emission, resulting from the air optical breakdown at a pre-surface area of sample. Debris-free processing of the movable Si-MEMS components is demonstrated. Techniques for the precise measurement of focal spot size and pulse duration are discussed. More... »

PAGES

1555-1559

Journal

TITLE

Applied Physics A

ISSUE

4-6

VOLUME

79

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s00339-004-2846-0

DOI

http://dx.doi.org/10.1007/s00339-004-2846-0

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1029088247


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