Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

2004-12

AUTHORS

C.-H. Lee, T.-W. Chang, K.-L. Lee, J.-Y. Lin, J. Wang

ABSTRACT

We fabricated sub-micrometer objects with feature sizes about one third of the exposure wavelength using two-photon photopolymerization in an epoxy-based photoresist SU-8 . Owing to the high mechanical strength of this photoresist, an aspect ratio as high as nine was achieved with a 200–300 nm lateral dimension. A simple equation was used to estimate the feature size from the laser parameters such as spot size, exposure time, pulse width, pulse repetition rate, and the material properties including the two-photon absorption coefficient and the exposure threshold dose. Patterns in SU-8 were transferred onto silicon using reactive ion etching, preserving both the feature size and aspect ratio. Vertical sidewalls of the transferred patterns were achieved using the black silicon method. More... »

PAGES

2027-2031

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/s00339-003-2423-y

DOI

http://dx.doi.org/10.1007/s00339-003-2423-y

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1016996634


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/1117", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Public Health and Health Services", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/11", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Medical and Health Sciences", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Academia Sinica", 
          "id": "https://www.grid.ac/institutes/grid.28665.3f", 
          "name": [
            "Institute of Applied Science and Engineering Research, Academia Sinica, 115, Taipei, Taiwan"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Lee", 
        "givenName": "C.-H.", 
        "id": "sg:person.0601630562.35", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0601630562.35"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "National Chung Cheng University", 
          "id": "https://www.grid.ac/institutes/grid.412047.4", 
          "name": [
            "Department of Physics, National Chung Cheng University, 621, Chia-Yi, Taiwan"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Chang", 
        "givenName": "T.-W.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Academia Sinica", 
          "id": "https://www.grid.ac/institutes/grid.28665.3f", 
          "name": [
            "Institute of Applied Science and Engineering Research, Academia Sinica, 115, Taipei, Taiwan"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Lee", 
        "givenName": "K.-L.", 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "National Chung Cheng University", 
          "id": "https://www.grid.ac/institutes/grid.412047.4", 
          "name": [
            "Department of Physics, National Chung Cheng University, 621, Chia-Yi, Taiwan"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Lin", 
        "givenName": "J.-Y.", 
        "id": "sg:person.015754775766.56", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015754775766.56"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "National Taiwan University", 
          "id": "https://www.grid.ac/institutes/grid.19188.39", 
          "name": [
            "Institute of Atomic and Molecular Sciences, Academia Sinica, 106, Taipei, Taiwan", 
            "Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, National Taiwan University, 106, Taipei, Taiwan"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Wang", 
        "givenName": "J.", 
        "id": "sg:person.013052170721.21", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013052170721.21"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "sg:pub.10.1007/s003390100934", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1003025617", 
          "https://doi.org/10.1007/s003390100934"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0167-9317(02)00623-8", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1019108424"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1038/17989", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1025228833", 
          "https://doi.org/10.1038/17989"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1038/17989", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1025228833", 
          "https://doi.org/10.1038/17989"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0924-4247(98)80055-1", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1031647359"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0026-2692(01)00109-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1035799307"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0167-9317(94)00149-o", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1041490527"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0960-1317/5/2/015", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1047078776"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1339258", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057696577"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1432450", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057706285"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1478128", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057710596"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1569987", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057721367"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1598293", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057724331"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1364/josab.18.001084", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1065169848"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1364/ol.22.000132", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1065217176"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1364/ol.23.001745", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1065218290"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1364/ol.28.000301", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1065220828"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2004-12", 
    "datePublishedReg": "2004-12-01", 
    "description": "We fabricated sub-micrometer objects with feature sizes about one third of the exposure wavelength using two-photon photopolymerization in an epoxy-based photoresist SU-8 . Owing to the high mechanical strength of this photoresist, an aspect ratio as high as nine was achieved with a 200\u2013300 nm lateral dimension. A simple equation was used to estimate the feature size from the laser parameters such as spot size, exposure time, pulse width, pulse repetition rate, and the material properties including the two-photon absorption coefficient and the exposure threshold dose. Patterns in SU-8 were transferred onto silicon using reactive ion etching, preserving both the feature size and aspect ratio. Vertical sidewalls of the transferred patterns were achieved using the black silicon method.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/s00339-003-2423-y", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": false, 
    "isPartOf": [
      {
        "id": "sg:journal.1022207", 
        "issn": [
          "0947-8396", 
          "1432-0630"
        ], 
        "name": "Applied Physics A", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "8", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "79"
      }
    ], 
    "name": "Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching", 
    "pagination": "2027-2031", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "50faa7a0dfbafa78a2ba3df18daa0d0ac152a6bcfe7d9a21e8070a4b2d6475bf"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/s00339-003-2423-y"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1016996634"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/s00339-003-2423-y", 
      "https://app.dimensions.ai/details/publication/pub.1016996634"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-10T22:26", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8690_00000487.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007/s00339-003-2423-y"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

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This table displays all metadata directly associated to this object as RDF triples.

144 TRIPLES      21 PREDICATES      43 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/s00339-003-2423-y schema:about anzsrc-for:11
2 anzsrc-for:1117
3 schema:author Na6c0b4c7b135431ca8801d947852f777
4 schema:citation sg:pub.10.1007/s003390100934
5 sg:pub.10.1038/17989
6 https://doi.org/10.1016/0167-9317(94)00149-o
7 https://doi.org/10.1016/s0026-2692(01)00109-4
8 https://doi.org/10.1016/s0167-9317(02)00623-8
9 https://doi.org/10.1016/s0924-4247(98)80055-1
10 https://doi.org/10.1063/1.1339258
11 https://doi.org/10.1063/1.1432450
12 https://doi.org/10.1063/1.1478128
13 https://doi.org/10.1063/1.1569987
14 https://doi.org/10.1063/1.1598293
15 https://doi.org/10.1088/0960-1317/5/2/015
16 https://doi.org/10.1364/josab.18.001084
17 https://doi.org/10.1364/ol.22.000132
18 https://doi.org/10.1364/ol.23.001745
19 https://doi.org/10.1364/ol.28.000301
20 schema:datePublished 2004-12
21 schema:datePublishedReg 2004-12-01
22 schema:description We fabricated sub-micrometer objects with feature sizes about one third of the exposure wavelength using two-photon photopolymerization in an epoxy-based photoresist SU-8 . Owing to the high mechanical strength of this photoresist, an aspect ratio as high as nine was achieved with a 200–300 nm lateral dimension. A simple equation was used to estimate the feature size from the laser parameters such as spot size, exposure time, pulse width, pulse repetition rate, and the material properties including the two-photon absorption coefficient and the exposure threshold dose. Patterns in SU-8 were transferred onto silicon using reactive ion etching, preserving both the feature size and aspect ratio. Vertical sidewalls of the transferred patterns were achieved using the black silicon method.
23 schema:genre research_article
24 schema:inLanguage en
25 schema:isAccessibleForFree false
26 schema:isPartOf N604b7da5bf784cb4b7207cf67005951d
27 N8f491a77f9f1401198d206202d877036
28 sg:journal.1022207
29 schema:name Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching
30 schema:pagination 2027-2031
31 schema:productId N6fe6f1a69e4344d18357e7fdd79e10fc
32 N9463db0e8b3d48419970fc960df947af
33 Nc3c96c8824da4539a9035d82e5df806b
34 schema:sameAs https://app.dimensions.ai/details/publication/pub.1016996634
35 https://doi.org/10.1007/s00339-003-2423-y
36 schema:sdDatePublished 2019-04-10T22:26
37 schema:sdLicense https://scigraph.springernature.com/explorer/license/
38 schema:sdPublisher Nd3110a3fab514bafb2c26bc281ea28af
39 schema:url http://link.springer.com/10.1007/s00339-003-2423-y
40 sgo:license sg:explorer/license/
41 sgo:sdDataset articles
42 rdf:type schema:ScholarlyArticle
43 N0a382330085846e8a3aa60f67c934161 rdf:first N90917414b443497f944bcbfec1a00fbd
44 rdf:rest N326821a18c434b63bce4c85054e00f77
45 N0cb2481a97e848c3a5acfd9e97e7ea31 rdf:first N7b129c36b02e4934baa000de45fa15eb
46 rdf:rest N0a382330085846e8a3aa60f67c934161
47 N326821a18c434b63bce4c85054e00f77 rdf:first sg:person.015754775766.56
48 rdf:rest Nb3a6c4ab327f40e89891e640690663e9
49 N604b7da5bf784cb4b7207cf67005951d schema:volumeNumber 79
50 rdf:type schema:PublicationVolume
51 N6fe6f1a69e4344d18357e7fdd79e10fc schema:name doi
52 schema:value 10.1007/s00339-003-2423-y
53 rdf:type schema:PropertyValue
54 N7b129c36b02e4934baa000de45fa15eb schema:affiliation https://www.grid.ac/institutes/grid.412047.4
55 schema:familyName Chang
56 schema:givenName T.-W.
57 rdf:type schema:Person
58 N8f491a77f9f1401198d206202d877036 schema:issueNumber 8
59 rdf:type schema:PublicationIssue
60 N90917414b443497f944bcbfec1a00fbd schema:affiliation https://www.grid.ac/institutes/grid.28665.3f
61 schema:familyName Lee
62 schema:givenName K.-L.
63 rdf:type schema:Person
64 N9463db0e8b3d48419970fc960df947af schema:name dimensions_id
65 schema:value pub.1016996634
66 rdf:type schema:PropertyValue
67 Na6c0b4c7b135431ca8801d947852f777 rdf:first sg:person.0601630562.35
68 rdf:rest N0cb2481a97e848c3a5acfd9e97e7ea31
69 Nb3a6c4ab327f40e89891e640690663e9 rdf:first sg:person.013052170721.21
70 rdf:rest rdf:nil
71 Nc3c96c8824da4539a9035d82e5df806b schema:name readcube_id
72 schema:value 50faa7a0dfbafa78a2ba3df18daa0d0ac152a6bcfe7d9a21e8070a4b2d6475bf
73 rdf:type schema:PropertyValue
74 Nd3110a3fab514bafb2c26bc281ea28af schema:name Springer Nature - SN SciGraph project
75 rdf:type schema:Organization
76 anzsrc-for:11 schema:inDefinedTermSet anzsrc-for:
77 schema:name Medical and Health Sciences
78 rdf:type schema:DefinedTerm
79 anzsrc-for:1117 schema:inDefinedTermSet anzsrc-for:
80 schema:name Public Health and Health Services
81 rdf:type schema:DefinedTerm
82 sg:journal.1022207 schema:issn 0947-8396
83 1432-0630
84 schema:name Applied Physics A
85 rdf:type schema:Periodical
86 sg:person.013052170721.21 schema:affiliation https://www.grid.ac/institutes/grid.19188.39
87 schema:familyName Wang
88 schema:givenName J.
89 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013052170721.21
90 rdf:type schema:Person
91 sg:person.015754775766.56 schema:affiliation https://www.grid.ac/institutes/grid.412047.4
92 schema:familyName Lin
93 schema:givenName J.-Y.
94 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015754775766.56
95 rdf:type schema:Person
96 sg:person.0601630562.35 schema:affiliation https://www.grid.ac/institutes/grid.28665.3f
97 schema:familyName Lee
98 schema:givenName C.-H.
99 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.0601630562.35
100 rdf:type schema:Person
101 sg:pub.10.1007/s003390100934 schema:sameAs https://app.dimensions.ai/details/publication/pub.1003025617
102 https://doi.org/10.1007/s003390100934
103 rdf:type schema:CreativeWork
104 sg:pub.10.1038/17989 schema:sameAs https://app.dimensions.ai/details/publication/pub.1025228833
105 https://doi.org/10.1038/17989
106 rdf:type schema:CreativeWork
107 https://doi.org/10.1016/0167-9317(94)00149-o schema:sameAs https://app.dimensions.ai/details/publication/pub.1041490527
108 rdf:type schema:CreativeWork
109 https://doi.org/10.1016/s0026-2692(01)00109-4 schema:sameAs https://app.dimensions.ai/details/publication/pub.1035799307
110 rdf:type schema:CreativeWork
111 https://doi.org/10.1016/s0167-9317(02)00623-8 schema:sameAs https://app.dimensions.ai/details/publication/pub.1019108424
112 rdf:type schema:CreativeWork
113 https://doi.org/10.1016/s0924-4247(98)80055-1 schema:sameAs https://app.dimensions.ai/details/publication/pub.1031647359
114 rdf:type schema:CreativeWork
115 https://doi.org/10.1063/1.1339258 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057696577
116 rdf:type schema:CreativeWork
117 https://doi.org/10.1063/1.1432450 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057706285
118 rdf:type schema:CreativeWork
119 https://doi.org/10.1063/1.1478128 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057710596
120 rdf:type schema:CreativeWork
121 https://doi.org/10.1063/1.1569987 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057721367
122 rdf:type schema:CreativeWork
123 https://doi.org/10.1063/1.1598293 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057724331
124 rdf:type schema:CreativeWork
125 https://doi.org/10.1088/0960-1317/5/2/015 schema:sameAs https://app.dimensions.ai/details/publication/pub.1047078776
126 rdf:type schema:CreativeWork
127 https://doi.org/10.1364/josab.18.001084 schema:sameAs https://app.dimensions.ai/details/publication/pub.1065169848
128 rdf:type schema:CreativeWork
129 https://doi.org/10.1364/ol.22.000132 schema:sameAs https://app.dimensions.ai/details/publication/pub.1065217176
130 rdf:type schema:CreativeWork
131 https://doi.org/10.1364/ol.23.001745 schema:sameAs https://app.dimensions.ai/details/publication/pub.1065218290
132 rdf:type schema:CreativeWork
133 https://doi.org/10.1364/ol.28.000301 schema:sameAs https://app.dimensions.ai/details/publication/pub.1065220828
134 rdf:type schema:CreativeWork
135 https://www.grid.ac/institutes/grid.19188.39 schema:alternateName National Taiwan University
136 schema:name Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, National Taiwan University, 106, Taipei, Taiwan
137 Institute of Atomic and Molecular Sciences, Academia Sinica, 106, Taipei, Taiwan
138 rdf:type schema:Organization
139 https://www.grid.ac/institutes/grid.28665.3f schema:alternateName Academia Sinica
140 schema:name Institute of Applied Science and Engineering Research, Academia Sinica, 115, Taipei, Taiwan
141 rdf:type schema:Organization
142 https://www.grid.ac/institutes/grid.412047.4 schema:alternateName National Chung Cheng University
143 schema:name Department of Physics, National Chung Cheng University, 621, Chia-Yi, Taiwan
144 rdf:type schema:Organization
 




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