Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement View Full Text


Ontology type: schema:ScholarlyArticle      Open Access: True


Article Info

DATE

2011-06

AUTHORS

Weimin Zhou, Guoquan Min, Jing Zhang, Yanbo Liu, Jinhe Wang, Yanping Zhang, Feng Sun

ABSTRACT

Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier. More... »

PAGES

135-140

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/bf03353663

DOI

http://dx.doi.org/10.1007/bf03353663

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1041418257


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhou", 
        "givenName": "Weimin", 
        "id": "sg:person.016030673711.06", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016030673711.06"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Min", 
        "givenName": "Guoquan", 
        "id": "sg:person.01333723632.69", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01333723632.69"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhang", 
        "givenName": "Jing", 
        "id": "sg:person.013607572077.11", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013607572077.11"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Liu", 
        "givenName": "Yanbo", 
        "id": "sg:person.014747233736.16", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014747233736.16"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Wang", 
        "givenName": "Jinhe", 
        "id": "sg:person.010052631311.80", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010052631311.80"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhang", 
        "givenName": "Yanping", 
        "id": "sg:person.015524001163.87", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015524001163.87"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Sun", 
        "givenName": "Feng", 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1002/adma.200600882", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1002192141"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2006.11.009", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1006832981"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1039/b705388f", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1007790672"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200400521", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1008529320"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200400521", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1008529320"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/18/4/044007", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010451421"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adma.200401192", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010453607"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adma.200401192", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010453607"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.apsusc.2008.08.045", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1013438539"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200500420", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1014147269"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200500420", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1014147269"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.2494/photopolymer.15.475", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1017638223"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2008.12.090", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1022498218"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.apsusc.2009.05.006", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1030842486"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/18/5/055306", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1034537995"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2009.04.024", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1036175352"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/20/31/315304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1041664454"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/21/20/205304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043099816"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/21/20/205304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043099816"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0379-6779(03)00195-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1046147274"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0379-6779(03)00195-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1046147274"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s00339-004-3176-y", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1052842109", 
          "https://doi.org/10.1007/s00339-004-3176-y"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/cm049617w", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1055411168"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/cm049617w", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1055411168"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl048355u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056215869"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl048355u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056215869"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl0603395", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056216658"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl0603395", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056216658"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nn9003633", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056227141"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.114851", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057676883"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1109/tsm.2006.890315", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1061791875"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.1635849", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062169196"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.2130352", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062171032"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.588605", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062198652"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1126/science.272.5258.85", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062552676"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2011-06", 
    "datePublishedReg": "2011-06-01", 
    "description": "Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/bf03353663", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": true, 
    "isPartOf": [
      {
        "id": "sg:journal.1136349", 
        "issn": [
          "2311-6706", 
          "2150-5551"
        ], 
        "name": "Nano-Micro Letters", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "2", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "3"
      }
    ], 
    "name": "Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement", 
    "pagination": "135-140", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "c54de0d7d930e6c033e6ba6dfbf5be1c599330ae3d5e5a083fa5b3c74b723d9a"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/bf03353663"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1041418257"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/bf03353663", 
      "https://app.dimensions.ai/details/publication/pub.1041418257"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T02:01", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8700_00000515.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007%2FBF03353663"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

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This table displays all metadata directly associated to this object as RDF triples.

184 TRIPLES      21 PREDICATES      54 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/bf03353663 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N5bccb1b44db64de3b88d73a8887442e9
4 schema:citation sg:pub.10.1007/s00339-004-3176-y
5 https://doi.org/10.1002/adfm.200400521
6 https://doi.org/10.1002/adfm.200500420
7 https://doi.org/10.1002/adma.200401192
8 https://doi.org/10.1002/adma.200600882
9 https://doi.org/10.1016/j.apsusc.2008.08.045
10 https://doi.org/10.1016/j.apsusc.2009.05.006
11 https://doi.org/10.1016/j.mee.2006.11.009
12 https://doi.org/10.1016/j.mee.2008.12.090
13 https://doi.org/10.1016/j.mee.2009.04.024
14 https://doi.org/10.1016/s0379-6779(03)00195-4
15 https://doi.org/10.1021/cm049617w
16 https://doi.org/10.1021/nl048355u
17 https://doi.org/10.1021/nl0603395
18 https://doi.org/10.1021/nn9003633
19 https://doi.org/10.1039/b705388f
20 https://doi.org/10.1063/1.114851
21 https://doi.org/10.1088/0957-4484/18/4/044007
22 https://doi.org/10.1088/0957-4484/18/5/055306
23 https://doi.org/10.1088/0957-4484/20/31/315304
24 https://doi.org/10.1088/0957-4484/21/20/205304
25 https://doi.org/10.1109/tsm.2006.890315
26 https://doi.org/10.1116/1.1635849
27 https://doi.org/10.1116/1.2130352
28 https://doi.org/10.1116/1.588605
29 https://doi.org/10.1126/science.272.5258.85
30 https://doi.org/10.2494/photopolymer.15.475
31 schema:datePublished 2011-06
32 schema:datePublishedReg 2011-06-01
33 schema:description Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.
34 schema:genre research_article
35 schema:inLanguage en
36 schema:isAccessibleForFree true
37 schema:isPartOf Nb09b927e451749149f7c8048eb338a3e
38 Nb93e47629d0c4d528b0f014db67e34dc
39 sg:journal.1136349
40 schema:name Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement
41 schema:pagination 135-140
42 schema:productId N376783cefe8048cdad6c09f2b12e98bf
43 N8070b7ad90ff47b5ab7d5e9cd778b6ad
44 Ne1e4a87016cd4c4e986db7305fd1990d
45 schema:sameAs https://app.dimensions.ai/details/publication/pub.1041418257
46 https://doi.org/10.1007/bf03353663
47 schema:sdDatePublished 2019-04-11T02:01
48 schema:sdLicense https://scigraph.springernature.com/explorer/license/
49 schema:sdPublisher Nc637bdd1b3b34a559725ebd561b1a222
50 schema:url http://link.springer.com/10.1007%2FBF03353663
51 sgo:license sg:explorer/license/
52 sgo:sdDataset articles
53 rdf:type schema:ScholarlyArticle
54 N3080b71a401e477c8e34b00871441e11 rdf:first sg:person.014747233736.16
55 rdf:rest Nd760c943f6a445668643b60af2cd662a
56 N376783cefe8048cdad6c09f2b12e98bf schema:name readcube_id
57 schema:value c54de0d7d930e6c033e6ba6dfbf5be1c599330ae3d5e5a083fa5b3c74b723d9a
58 rdf:type schema:PropertyValue
59 N5bccb1b44db64de3b88d73a8887442e9 rdf:first sg:person.016030673711.06
60 rdf:rest Na0166dcc46dc4d4da365cee04c510aa4
61 N798094b767934dccaf25815be2ae153d schema:affiliation https://www.grid.ac/institutes/grid.484633.e
62 schema:familyName Sun
63 schema:givenName Feng
64 rdf:type schema:Person
65 N8070b7ad90ff47b5ab7d5e9cd778b6ad schema:name doi
66 schema:value 10.1007/bf03353663
67 rdf:type schema:PropertyValue
68 N8a24dc8ad9fd430596bd1884c537512d rdf:first sg:person.013607572077.11
69 rdf:rest N3080b71a401e477c8e34b00871441e11
70 N9c880df817b847c78a9666fe65a229da rdf:first N798094b767934dccaf25815be2ae153d
71 rdf:rest rdf:nil
72 Na0166dcc46dc4d4da365cee04c510aa4 rdf:first sg:person.01333723632.69
73 rdf:rest N8a24dc8ad9fd430596bd1884c537512d
74 Nb09b927e451749149f7c8048eb338a3e schema:volumeNumber 3
75 rdf:type schema:PublicationVolume
76 Nb93e47629d0c4d528b0f014db67e34dc schema:issueNumber 2
77 rdf:type schema:PublicationIssue
78 Nc637bdd1b3b34a559725ebd561b1a222 schema:name Springer Nature - SN SciGraph project
79 rdf:type schema:Organization
80 Nd760c943f6a445668643b60af2cd662a rdf:first sg:person.010052631311.80
81 rdf:rest Nfc4228280127470483cb240ac6b18d1b
82 Ne1e4a87016cd4c4e986db7305fd1990d schema:name dimensions_id
83 schema:value pub.1041418257
84 rdf:type schema:PropertyValue
85 Nfc4228280127470483cb240ac6b18d1b rdf:first sg:person.015524001163.87
86 rdf:rest N9c880df817b847c78a9666fe65a229da
87 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
88 schema:name Engineering
89 rdf:type schema:DefinedTerm
90 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
91 schema:name Materials Engineering
92 rdf:type schema:DefinedTerm
93 sg:journal.1136349 schema:issn 2150-5551
94 2311-6706
95 schema:name Nano-Micro Letters
96 rdf:type schema:Periodical
97 sg:person.010052631311.80 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
98 schema:familyName Wang
99 schema:givenName Jinhe
100 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010052631311.80
101 rdf:type schema:Person
102 sg:person.01333723632.69 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
103 schema:familyName Min
104 schema:givenName Guoquan
105 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01333723632.69
106 rdf:type schema:Person
107 sg:person.013607572077.11 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
108 schema:familyName Zhang
109 schema:givenName Jing
110 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013607572077.11
111 rdf:type schema:Person
112 sg:person.014747233736.16 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
113 schema:familyName Liu
114 schema:givenName Yanbo
115 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014747233736.16
116 rdf:type schema:Person
117 sg:person.015524001163.87 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
118 schema:familyName Zhang
119 schema:givenName Yanping
120 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015524001163.87
121 rdf:type schema:Person
122 sg:person.016030673711.06 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
123 schema:familyName Zhou
124 schema:givenName Weimin
125 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016030673711.06
126 rdf:type schema:Person
127 sg:pub.10.1007/s00339-004-3176-y schema:sameAs https://app.dimensions.ai/details/publication/pub.1052842109
128 https://doi.org/10.1007/s00339-004-3176-y
129 rdf:type schema:CreativeWork
130 https://doi.org/10.1002/adfm.200400521 schema:sameAs https://app.dimensions.ai/details/publication/pub.1008529320
131 rdf:type schema:CreativeWork
132 https://doi.org/10.1002/adfm.200500420 schema:sameAs https://app.dimensions.ai/details/publication/pub.1014147269
133 rdf:type schema:CreativeWork
134 https://doi.org/10.1002/adma.200401192 schema:sameAs https://app.dimensions.ai/details/publication/pub.1010453607
135 rdf:type schema:CreativeWork
136 https://doi.org/10.1002/adma.200600882 schema:sameAs https://app.dimensions.ai/details/publication/pub.1002192141
137 rdf:type schema:CreativeWork
138 https://doi.org/10.1016/j.apsusc.2008.08.045 schema:sameAs https://app.dimensions.ai/details/publication/pub.1013438539
139 rdf:type schema:CreativeWork
140 https://doi.org/10.1016/j.apsusc.2009.05.006 schema:sameAs https://app.dimensions.ai/details/publication/pub.1030842486
141 rdf:type schema:CreativeWork
142 https://doi.org/10.1016/j.mee.2006.11.009 schema:sameAs https://app.dimensions.ai/details/publication/pub.1006832981
143 rdf:type schema:CreativeWork
144 https://doi.org/10.1016/j.mee.2008.12.090 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022498218
145 rdf:type schema:CreativeWork
146 https://doi.org/10.1016/j.mee.2009.04.024 schema:sameAs https://app.dimensions.ai/details/publication/pub.1036175352
147 rdf:type schema:CreativeWork
148 https://doi.org/10.1016/s0379-6779(03)00195-4 schema:sameAs https://app.dimensions.ai/details/publication/pub.1046147274
149 rdf:type schema:CreativeWork
150 https://doi.org/10.1021/cm049617w schema:sameAs https://app.dimensions.ai/details/publication/pub.1055411168
151 rdf:type schema:CreativeWork
152 https://doi.org/10.1021/nl048355u schema:sameAs https://app.dimensions.ai/details/publication/pub.1056215869
153 rdf:type schema:CreativeWork
154 https://doi.org/10.1021/nl0603395 schema:sameAs https://app.dimensions.ai/details/publication/pub.1056216658
155 rdf:type schema:CreativeWork
156 https://doi.org/10.1021/nn9003633 schema:sameAs https://app.dimensions.ai/details/publication/pub.1056227141
157 rdf:type schema:CreativeWork
158 https://doi.org/10.1039/b705388f schema:sameAs https://app.dimensions.ai/details/publication/pub.1007790672
159 rdf:type schema:CreativeWork
160 https://doi.org/10.1063/1.114851 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057676883
161 rdf:type schema:CreativeWork
162 https://doi.org/10.1088/0957-4484/18/4/044007 schema:sameAs https://app.dimensions.ai/details/publication/pub.1010451421
163 rdf:type schema:CreativeWork
164 https://doi.org/10.1088/0957-4484/18/5/055306 schema:sameAs https://app.dimensions.ai/details/publication/pub.1034537995
165 rdf:type schema:CreativeWork
166 https://doi.org/10.1088/0957-4484/20/31/315304 schema:sameAs https://app.dimensions.ai/details/publication/pub.1041664454
167 rdf:type schema:CreativeWork
168 https://doi.org/10.1088/0957-4484/21/20/205304 schema:sameAs https://app.dimensions.ai/details/publication/pub.1043099816
169 rdf:type schema:CreativeWork
170 https://doi.org/10.1109/tsm.2006.890315 schema:sameAs https://app.dimensions.ai/details/publication/pub.1061791875
171 rdf:type schema:CreativeWork
172 https://doi.org/10.1116/1.1635849 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062169196
173 rdf:type schema:CreativeWork
174 https://doi.org/10.1116/1.2130352 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062171032
175 rdf:type schema:CreativeWork
176 https://doi.org/10.1116/1.588605 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062198652
177 rdf:type schema:CreativeWork
178 https://doi.org/10.1126/science.272.5258.85 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062552676
179 rdf:type schema:CreativeWork
180 https://doi.org/10.2494/photopolymer.15.475 schema:sameAs https://app.dimensions.ai/details/publication/pub.1017638223
181 rdf:type schema:CreativeWork
182 https://www.grid.ac/institutes/grid.484633.e schema:alternateName Shanghai Nanotechnology Promotion Center
183 schema:name Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China
184 rdf:type schema:Organization
 




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