Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement View Full Text


Ontology type: schema:ScholarlyArticle      Open Access: True


Article Info

DATE

2011-06

AUTHORS

Weimin Zhou, Guoquan Min, Jing Zhang, Yanbo Liu, Jinhe Wang, Yanping Zhang, Feng Sun

ABSTRACT

Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier. More... »

PAGES

135-140

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/bf03353663

DOI

http://dx.doi.org/10.1007/bf03353663

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1041418257


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhou", 
        "givenName": "Weimin", 
        "id": "sg:person.016030673711.06", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016030673711.06"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Min", 
        "givenName": "Guoquan", 
        "id": "sg:person.01333723632.69", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01333723632.69"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhang", 
        "givenName": "Jing", 
        "id": "sg:person.013607572077.11", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013607572077.11"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Liu", 
        "givenName": "Yanbo", 
        "id": "sg:person.014747233736.16", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014747233736.16"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Wang", 
        "givenName": "Jinhe", 
        "id": "sg:person.010052631311.80", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010052631311.80"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhang", 
        "givenName": "Yanping", 
        "id": "sg:person.015524001163.87", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015524001163.87"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Sun", 
        "givenName": "Feng", 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1002/adma.200600882", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1002192141"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2006.11.009", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1006832981"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1039/b705388f", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1007790672"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200400521", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1008529320"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200400521", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1008529320"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/18/4/044007", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010451421"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adma.200401192", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010453607"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adma.200401192", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010453607"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.apsusc.2008.08.045", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1013438539"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200500420", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1014147269"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200500420", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1014147269"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.2494/photopolymer.15.475", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1017638223"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2008.12.090", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1022498218"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.apsusc.2009.05.006", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1030842486"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/18/5/055306", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1034537995"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2009.04.024", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1036175352"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/20/31/315304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1041664454"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/21/20/205304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043099816"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/21/20/205304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043099816"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0379-6779(03)00195-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1046147274"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0379-6779(03)00195-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1046147274"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s00339-004-3176-y", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1052842109", 
          "https://doi.org/10.1007/s00339-004-3176-y"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/cm049617w", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1055411168"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/cm049617w", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1055411168"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl048355u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056215869"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl048355u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056215869"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl0603395", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056216658"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl0603395", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056216658"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nn9003633", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056227141"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.114851", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057676883"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1109/tsm.2006.890315", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1061791875"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.1635849", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062169196"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.2130352", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062171032"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.588605", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062198652"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1126/science.272.5258.85", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062552676"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2011-06", 
    "datePublishedReg": "2011-06-01", 
    "description": "Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/bf03353663", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": true, 
    "isPartOf": [
      {
        "id": "sg:journal.1136349", 
        "issn": [
          "2311-6706", 
          "2150-5551"
        ], 
        "name": "Nano-Micro Letters", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "2", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "3"
      }
    ], 
    "name": "Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement", 
    "pagination": "135-140", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "c54de0d7d930e6c033e6ba6dfbf5be1c599330ae3d5e5a083fa5b3c74b723d9a"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/bf03353663"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1041418257"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/bf03353663", 
      "https://app.dimensions.ai/details/publication/pub.1041418257"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T02:01", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8700_00000515.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007%2FBF03353663"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'


 

This table displays all metadata directly associated to this object as RDF triples.

184 TRIPLES      21 PREDICATES      54 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/bf03353663 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N0590b90c18ba488288afb595b8c4a4a6
4 schema:citation sg:pub.10.1007/s00339-004-3176-y
5 https://doi.org/10.1002/adfm.200400521
6 https://doi.org/10.1002/adfm.200500420
7 https://doi.org/10.1002/adma.200401192
8 https://doi.org/10.1002/adma.200600882
9 https://doi.org/10.1016/j.apsusc.2008.08.045
10 https://doi.org/10.1016/j.apsusc.2009.05.006
11 https://doi.org/10.1016/j.mee.2006.11.009
12 https://doi.org/10.1016/j.mee.2008.12.090
13 https://doi.org/10.1016/j.mee.2009.04.024
14 https://doi.org/10.1016/s0379-6779(03)00195-4
15 https://doi.org/10.1021/cm049617w
16 https://doi.org/10.1021/nl048355u
17 https://doi.org/10.1021/nl0603395
18 https://doi.org/10.1021/nn9003633
19 https://doi.org/10.1039/b705388f
20 https://doi.org/10.1063/1.114851
21 https://doi.org/10.1088/0957-4484/18/4/044007
22 https://doi.org/10.1088/0957-4484/18/5/055306
23 https://doi.org/10.1088/0957-4484/20/31/315304
24 https://doi.org/10.1088/0957-4484/21/20/205304
25 https://doi.org/10.1109/tsm.2006.890315
26 https://doi.org/10.1116/1.1635849
27 https://doi.org/10.1116/1.2130352
28 https://doi.org/10.1116/1.588605
29 https://doi.org/10.1126/science.272.5258.85
30 https://doi.org/10.2494/photopolymer.15.475
31 schema:datePublished 2011-06
32 schema:datePublishedReg 2011-06-01
33 schema:description Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.
34 schema:genre research_article
35 schema:inLanguage en
36 schema:isAccessibleForFree true
37 schema:isPartOf N8a15eadb85634c0da649bbdeba61969c
38 Ndd8ec05c58de4aeca03ca5aec523a2cf
39 sg:journal.1136349
40 schema:name Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement
41 schema:pagination 135-140
42 schema:productId N3c94e7beb6b345718bc5dbff53abb639
43 N603833233478463aa7e4319c281ac70a
44 Nc09d7fd3ecf5429ba82ece4af42901e5
45 schema:sameAs https://app.dimensions.ai/details/publication/pub.1041418257
46 https://doi.org/10.1007/bf03353663
47 schema:sdDatePublished 2019-04-11T02:01
48 schema:sdLicense https://scigraph.springernature.com/explorer/license/
49 schema:sdPublisher N4703e5f724044e7a8fa33651d8799012
50 schema:url http://link.springer.com/10.1007%2FBF03353663
51 sgo:license sg:explorer/license/
52 sgo:sdDataset articles
53 rdf:type schema:ScholarlyArticle
54 N0590b90c18ba488288afb595b8c4a4a6 rdf:first sg:person.016030673711.06
55 rdf:rest Nd3cf742ae44548ca80f4923d7e24f5e2
56 N3c94e7beb6b345718bc5dbff53abb639 schema:name readcube_id
57 schema:value c54de0d7d930e6c033e6ba6dfbf5be1c599330ae3d5e5a083fa5b3c74b723d9a
58 rdf:type schema:PropertyValue
59 N4703e5f724044e7a8fa33651d8799012 schema:name Springer Nature - SN SciGraph project
60 rdf:type schema:Organization
61 N4d6c9ebf2d1e4cf28eb4969ac7ca2400 rdf:first N7a29a30ce5f24c5192aecb389d618208
62 rdf:rest rdf:nil
63 N603833233478463aa7e4319c281ac70a schema:name doi
64 schema:value 10.1007/bf03353663
65 rdf:type schema:PropertyValue
66 N61d6c21260d447c685f445c507488085 rdf:first sg:person.015524001163.87
67 rdf:rest N4d6c9ebf2d1e4cf28eb4969ac7ca2400
68 N63db2d97889049e39e7f5acd3971aef9 rdf:first sg:person.014747233736.16
69 rdf:rest N826c057c5d714a0cbe021556c4479ddd
70 N6b150fe39cdb424ba7308061df2974e1 rdf:first sg:person.013607572077.11
71 rdf:rest N63db2d97889049e39e7f5acd3971aef9
72 N7a29a30ce5f24c5192aecb389d618208 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
73 schema:familyName Sun
74 schema:givenName Feng
75 rdf:type schema:Person
76 N826c057c5d714a0cbe021556c4479ddd rdf:first sg:person.010052631311.80
77 rdf:rest N61d6c21260d447c685f445c507488085
78 N8a15eadb85634c0da649bbdeba61969c schema:issueNumber 2
79 rdf:type schema:PublicationIssue
80 Nc09d7fd3ecf5429ba82ece4af42901e5 schema:name dimensions_id
81 schema:value pub.1041418257
82 rdf:type schema:PropertyValue
83 Nd3cf742ae44548ca80f4923d7e24f5e2 rdf:first sg:person.01333723632.69
84 rdf:rest N6b150fe39cdb424ba7308061df2974e1
85 Ndd8ec05c58de4aeca03ca5aec523a2cf schema:volumeNumber 3
86 rdf:type schema:PublicationVolume
87 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
88 schema:name Engineering
89 rdf:type schema:DefinedTerm
90 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
91 schema:name Materials Engineering
92 rdf:type schema:DefinedTerm
93 sg:journal.1136349 schema:issn 2150-5551
94 2311-6706
95 schema:name Nano-Micro Letters
96 rdf:type schema:Periodical
97 sg:person.010052631311.80 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
98 schema:familyName Wang
99 schema:givenName Jinhe
100 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010052631311.80
101 rdf:type schema:Person
102 sg:person.01333723632.69 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
103 schema:familyName Min
104 schema:givenName Guoquan
105 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01333723632.69
106 rdf:type schema:Person
107 sg:person.013607572077.11 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
108 schema:familyName Zhang
109 schema:givenName Jing
110 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013607572077.11
111 rdf:type schema:Person
112 sg:person.014747233736.16 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
113 schema:familyName Liu
114 schema:givenName Yanbo
115 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014747233736.16
116 rdf:type schema:Person
117 sg:person.015524001163.87 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
118 schema:familyName Zhang
119 schema:givenName Yanping
120 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015524001163.87
121 rdf:type schema:Person
122 sg:person.016030673711.06 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
123 schema:familyName Zhou
124 schema:givenName Weimin
125 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016030673711.06
126 rdf:type schema:Person
127 sg:pub.10.1007/s00339-004-3176-y schema:sameAs https://app.dimensions.ai/details/publication/pub.1052842109
128 https://doi.org/10.1007/s00339-004-3176-y
129 rdf:type schema:CreativeWork
130 https://doi.org/10.1002/adfm.200400521 schema:sameAs https://app.dimensions.ai/details/publication/pub.1008529320
131 rdf:type schema:CreativeWork
132 https://doi.org/10.1002/adfm.200500420 schema:sameAs https://app.dimensions.ai/details/publication/pub.1014147269
133 rdf:type schema:CreativeWork
134 https://doi.org/10.1002/adma.200401192 schema:sameAs https://app.dimensions.ai/details/publication/pub.1010453607
135 rdf:type schema:CreativeWork
136 https://doi.org/10.1002/adma.200600882 schema:sameAs https://app.dimensions.ai/details/publication/pub.1002192141
137 rdf:type schema:CreativeWork
138 https://doi.org/10.1016/j.apsusc.2008.08.045 schema:sameAs https://app.dimensions.ai/details/publication/pub.1013438539
139 rdf:type schema:CreativeWork
140 https://doi.org/10.1016/j.apsusc.2009.05.006 schema:sameAs https://app.dimensions.ai/details/publication/pub.1030842486
141 rdf:type schema:CreativeWork
142 https://doi.org/10.1016/j.mee.2006.11.009 schema:sameAs https://app.dimensions.ai/details/publication/pub.1006832981
143 rdf:type schema:CreativeWork
144 https://doi.org/10.1016/j.mee.2008.12.090 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022498218
145 rdf:type schema:CreativeWork
146 https://doi.org/10.1016/j.mee.2009.04.024 schema:sameAs https://app.dimensions.ai/details/publication/pub.1036175352
147 rdf:type schema:CreativeWork
148 https://doi.org/10.1016/s0379-6779(03)00195-4 schema:sameAs https://app.dimensions.ai/details/publication/pub.1046147274
149 rdf:type schema:CreativeWork
150 https://doi.org/10.1021/cm049617w schema:sameAs https://app.dimensions.ai/details/publication/pub.1055411168
151 rdf:type schema:CreativeWork
152 https://doi.org/10.1021/nl048355u schema:sameAs https://app.dimensions.ai/details/publication/pub.1056215869
153 rdf:type schema:CreativeWork
154 https://doi.org/10.1021/nl0603395 schema:sameAs https://app.dimensions.ai/details/publication/pub.1056216658
155 rdf:type schema:CreativeWork
156 https://doi.org/10.1021/nn9003633 schema:sameAs https://app.dimensions.ai/details/publication/pub.1056227141
157 rdf:type schema:CreativeWork
158 https://doi.org/10.1039/b705388f schema:sameAs https://app.dimensions.ai/details/publication/pub.1007790672
159 rdf:type schema:CreativeWork
160 https://doi.org/10.1063/1.114851 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057676883
161 rdf:type schema:CreativeWork
162 https://doi.org/10.1088/0957-4484/18/4/044007 schema:sameAs https://app.dimensions.ai/details/publication/pub.1010451421
163 rdf:type schema:CreativeWork
164 https://doi.org/10.1088/0957-4484/18/5/055306 schema:sameAs https://app.dimensions.ai/details/publication/pub.1034537995
165 rdf:type schema:CreativeWork
166 https://doi.org/10.1088/0957-4484/20/31/315304 schema:sameAs https://app.dimensions.ai/details/publication/pub.1041664454
167 rdf:type schema:CreativeWork
168 https://doi.org/10.1088/0957-4484/21/20/205304 schema:sameAs https://app.dimensions.ai/details/publication/pub.1043099816
169 rdf:type schema:CreativeWork
170 https://doi.org/10.1109/tsm.2006.890315 schema:sameAs https://app.dimensions.ai/details/publication/pub.1061791875
171 rdf:type schema:CreativeWork
172 https://doi.org/10.1116/1.1635849 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062169196
173 rdf:type schema:CreativeWork
174 https://doi.org/10.1116/1.2130352 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062171032
175 rdf:type schema:CreativeWork
176 https://doi.org/10.1116/1.588605 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062198652
177 rdf:type schema:CreativeWork
178 https://doi.org/10.1126/science.272.5258.85 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062552676
179 rdf:type schema:CreativeWork
180 https://doi.org/10.2494/photopolymer.15.475 schema:sameAs https://app.dimensions.ai/details/publication/pub.1017638223
181 rdf:type schema:CreativeWork
182 https://www.grid.ac/institutes/grid.484633.e schema:alternateName Shanghai Nanotechnology Promotion Center
183 schema:name Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China
184 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...