Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement View Full Text


Ontology type: schema:ScholarlyArticle      Open Access: True


Article Info

DATE

2011-06

AUTHORS

Weimin Zhou, Guoquan Min, Jing Zhang, Yanbo Liu, Jinhe Wang, Yanping Zhang, Feng Sun

ABSTRACT

Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier. More... »

PAGES

135-140

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/bf03353663

DOI

http://dx.doi.org/10.1007/bf03353663

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1041418257


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhou", 
        "givenName": "Weimin", 
        "id": "sg:person.016030673711.06", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016030673711.06"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Min", 
        "givenName": "Guoquan", 
        "id": "sg:person.01333723632.69", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01333723632.69"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhang", 
        "givenName": "Jing", 
        "id": "sg:person.013607572077.11", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013607572077.11"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Liu", 
        "givenName": "Yanbo", 
        "id": "sg:person.014747233736.16", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014747233736.16"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Wang", 
        "givenName": "Jinhe", 
        "id": "sg:person.010052631311.80", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010052631311.80"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Zhang", 
        "givenName": "Yanping", 
        "id": "sg:person.015524001163.87", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015524001163.87"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Shanghai Nanotechnology Promotion Center", 
          "id": "https://www.grid.ac/institutes/grid.484633.e", 
          "name": [
            "Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Sun", 
        "givenName": "Feng", 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1002/adma.200600882", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1002192141"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2006.11.009", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1006832981"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1039/b705388f", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1007790672"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200400521", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1008529320"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200400521", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1008529320"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/18/4/044007", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010451421"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adma.200401192", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010453607"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adma.200401192", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1010453607"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.apsusc.2008.08.045", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1013438539"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200500420", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1014147269"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1002/adfm.200500420", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1014147269"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.2494/photopolymer.15.475", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1017638223"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2008.12.090", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1022498218"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.apsusc.2009.05.006", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1030842486"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/18/5/055306", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1034537995"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/j.mee.2009.04.024", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1036175352"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/20/31/315304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1041664454"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/21/20/205304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043099816"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1088/0957-4484/21/20/205304", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1043099816"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0379-6779(03)00195-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1046147274"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/s0379-6779(03)00195-4", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1046147274"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "sg:pub.10.1007/s00339-004-3176-y", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1052842109", 
          "https://doi.org/10.1007/s00339-004-3176-y"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/cm049617w", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1055411168"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/cm049617w", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1055411168"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl048355u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056215869"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl048355u", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056215869"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl0603395", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056216658"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nl0603395", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056216658"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1021/nn9003633", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1056227141"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.114851", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057676883"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1109/tsm.2006.890315", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1061791875"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.1635849", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062169196"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.2130352", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062171032"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1116/1.588605", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062198652"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1126/science.272.5258.85", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1062552676"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "2011-06", 
    "datePublishedReg": "2011-06-01", 
    "description": "Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.", 
    "genre": "research_article", 
    "id": "sg:pub.10.1007/bf03353663", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": true, 
    "isPartOf": [
      {
        "id": "sg:journal.1136349", 
        "issn": [
          "2311-6706", 
          "2150-5551"
        ], 
        "name": "Nano-Micro Letters", 
        "type": "Periodical"
      }, 
      {
        "issueNumber": "2", 
        "type": "PublicationIssue"
      }, 
      {
        "type": "PublicationVolume", 
        "volumeNumber": "3"
      }
    ], 
    "name": "Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement", 
    "pagination": "135-140", 
    "productId": [
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "c54de0d7d930e6c033e6ba6dfbf5be1c599330ae3d5e5a083fa5b3c74b723d9a"
        ]
      }, 
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/bf03353663"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1041418257"
        ]
      }
    ], 
    "sameAs": [
      "https://doi.org/10.1007/bf03353663", 
      "https://app.dimensions.ai/details/publication/pub.1041418257"
    ], 
    "sdDataset": "articles", 
    "sdDatePublished": "2019-04-11T02:01", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8700_00000515.jsonl", 
    "type": "ScholarlyArticle", 
    "url": "http://link.springer.com/10.1007%2FBF03353663"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1007/bf03353663'


 

This table displays all metadata directly associated to this object as RDF triples.

184 TRIPLES      21 PREDICATES      54 URIs      19 LITERALS      7 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/bf03353663 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author N64edf6d64a434b1887f6d37637670866
4 schema:citation sg:pub.10.1007/s00339-004-3176-y
5 https://doi.org/10.1002/adfm.200400521
6 https://doi.org/10.1002/adfm.200500420
7 https://doi.org/10.1002/adma.200401192
8 https://doi.org/10.1002/adma.200600882
9 https://doi.org/10.1016/j.apsusc.2008.08.045
10 https://doi.org/10.1016/j.apsusc.2009.05.006
11 https://doi.org/10.1016/j.mee.2006.11.009
12 https://doi.org/10.1016/j.mee.2008.12.090
13 https://doi.org/10.1016/j.mee.2009.04.024
14 https://doi.org/10.1016/s0379-6779(03)00195-4
15 https://doi.org/10.1021/cm049617w
16 https://doi.org/10.1021/nl048355u
17 https://doi.org/10.1021/nl0603395
18 https://doi.org/10.1021/nn9003633
19 https://doi.org/10.1039/b705388f
20 https://doi.org/10.1063/1.114851
21 https://doi.org/10.1088/0957-4484/18/4/044007
22 https://doi.org/10.1088/0957-4484/18/5/055306
23 https://doi.org/10.1088/0957-4484/20/31/315304
24 https://doi.org/10.1088/0957-4484/21/20/205304
25 https://doi.org/10.1109/tsm.2006.890315
26 https://doi.org/10.1116/1.1635849
27 https://doi.org/10.1116/1.2130352
28 https://doi.org/10.1116/1.588605
29 https://doi.org/10.1126/science.272.5258.85
30 https://doi.org/10.2494/photopolymer.15.475
31 schema:datePublished 2011-06
32 schema:datePublishedReg 2011-06-01
33 schema:description Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.
34 schema:genre research_article
35 schema:inLanguage en
36 schema:isAccessibleForFree true
37 schema:isPartOf N63d6ca7098fb4e59b9177f3014f3e018
38 Neadb04796f62410c908c438664d86649
39 sg:journal.1136349
40 schema:name Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement
41 schema:pagination 135-140
42 schema:productId N13e105d623984cca929bb3d94d74f1e5
43 N350bf51888b543e98782cb6d5f13608b
44 Ne6e02b4ef1534d9eac80b8272392e367
45 schema:sameAs https://app.dimensions.ai/details/publication/pub.1041418257
46 https://doi.org/10.1007/bf03353663
47 schema:sdDatePublished 2019-04-11T02:01
48 schema:sdLicense https://scigraph.springernature.com/explorer/license/
49 schema:sdPublisher N72c45958f0f44bb29d362832e0e756b5
50 schema:url http://link.springer.com/10.1007%2FBF03353663
51 sgo:license sg:explorer/license/
52 sgo:sdDataset articles
53 rdf:type schema:ScholarlyArticle
54 N0dad7999908343369dcb694c4044f5b9 rdf:first sg:person.015524001163.87
55 rdf:rest Nc8f2f8dab08247c7ab56fe74f8957cb2
56 N13e105d623984cca929bb3d94d74f1e5 schema:name dimensions_id
57 schema:value pub.1041418257
58 rdf:type schema:PropertyValue
59 N219f0cc3f26e4c81a0c4ada4b6b5a665 rdf:first sg:person.013607572077.11
60 rdf:rest N833a4e7453f14ccfa2483a809ae71c55
61 N350bf51888b543e98782cb6d5f13608b schema:name readcube_id
62 schema:value c54de0d7d930e6c033e6ba6dfbf5be1c599330ae3d5e5a083fa5b3c74b723d9a
63 rdf:type schema:PropertyValue
64 N619ac2f6e4ea4b77ad94acfbb7102211 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
65 schema:familyName Sun
66 schema:givenName Feng
67 rdf:type schema:Person
68 N63d6ca7098fb4e59b9177f3014f3e018 schema:issueNumber 2
69 rdf:type schema:PublicationIssue
70 N64edf6d64a434b1887f6d37637670866 rdf:first sg:person.016030673711.06
71 rdf:rest N6af345bb1b654221a69372e24051ea4c
72 N6af345bb1b654221a69372e24051ea4c rdf:first sg:person.01333723632.69
73 rdf:rest N219f0cc3f26e4c81a0c4ada4b6b5a665
74 N72c45958f0f44bb29d362832e0e756b5 schema:name Springer Nature - SN SciGraph project
75 rdf:type schema:Organization
76 N833a4e7453f14ccfa2483a809ae71c55 rdf:first sg:person.014747233736.16
77 rdf:rest Nbe0a7ddf050643e588c31053fa40cfff
78 Nbe0a7ddf050643e588c31053fa40cfff rdf:first sg:person.010052631311.80
79 rdf:rest N0dad7999908343369dcb694c4044f5b9
80 Nc8f2f8dab08247c7ab56fe74f8957cb2 rdf:first N619ac2f6e4ea4b77ad94acfbb7102211
81 rdf:rest rdf:nil
82 Ne6e02b4ef1534d9eac80b8272392e367 schema:name doi
83 schema:value 10.1007/bf03353663
84 rdf:type schema:PropertyValue
85 Neadb04796f62410c908c438664d86649 schema:volumeNumber 3
86 rdf:type schema:PublicationVolume
87 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
88 schema:name Engineering
89 rdf:type schema:DefinedTerm
90 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
91 schema:name Materials Engineering
92 rdf:type schema:DefinedTerm
93 sg:journal.1136349 schema:issn 2150-5551
94 2311-6706
95 schema:name Nano-Micro Letters
96 rdf:type schema:Periodical
97 sg:person.010052631311.80 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
98 schema:familyName Wang
99 schema:givenName Jinhe
100 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.010052631311.80
101 rdf:type schema:Person
102 sg:person.01333723632.69 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
103 schema:familyName Min
104 schema:givenName Guoquan
105 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.01333723632.69
106 rdf:type schema:Person
107 sg:person.013607572077.11 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
108 schema:familyName Zhang
109 schema:givenName Jing
110 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013607572077.11
111 rdf:type schema:Person
112 sg:person.014747233736.16 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
113 schema:familyName Liu
114 schema:givenName Yanbo
115 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.014747233736.16
116 rdf:type schema:Person
117 sg:person.015524001163.87 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
118 schema:familyName Zhang
119 schema:givenName Yanping
120 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015524001163.87
121 rdf:type schema:Person
122 sg:person.016030673711.06 schema:affiliation https://www.grid.ac/institutes/grid.484633.e
123 schema:familyName Zhou
124 schema:givenName Weimin
125 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016030673711.06
126 rdf:type schema:Person
127 sg:pub.10.1007/s00339-004-3176-y schema:sameAs https://app.dimensions.ai/details/publication/pub.1052842109
128 https://doi.org/10.1007/s00339-004-3176-y
129 rdf:type schema:CreativeWork
130 https://doi.org/10.1002/adfm.200400521 schema:sameAs https://app.dimensions.ai/details/publication/pub.1008529320
131 rdf:type schema:CreativeWork
132 https://doi.org/10.1002/adfm.200500420 schema:sameAs https://app.dimensions.ai/details/publication/pub.1014147269
133 rdf:type schema:CreativeWork
134 https://doi.org/10.1002/adma.200401192 schema:sameAs https://app.dimensions.ai/details/publication/pub.1010453607
135 rdf:type schema:CreativeWork
136 https://doi.org/10.1002/adma.200600882 schema:sameAs https://app.dimensions.ai/details/publication/pub.1002192141
137 rdf:type schema:CreativeWork
138 https://doi.org/10.1016/j.apsusc.2008.08.045 schema:sameAs https://app.dimensions.ai/details/publication/pub.1013438539
139 rdf:type schema:CreativeWork
140 https://doi.org/10.1016/j.apsusc.2009.05.006 schema:sameAs https://app.dimensions.ai/details/publication/pub.1030842486
141 rdf:type schema:CreativeWork
142 https://doi.org/10.1016/j.mee.2006.11.009 schema:sameAs https://app.dimensions.ai/details/publication/pub.1006832981
143 rdf:type schema:CreativeWork
144 https://doi.org/10.1016/j.mee.2008.12.090 schema:sameAs https://app.dimensions.ai/details/publication/pub.1022498218
145 rdf:type schema:CreativeWork
146 https://doi.org/10.1016/j.mee.2009.04.024 schema:sameAs https://app.dimensions.ai/details/publication/pub.1036175352
147 rdf:type schema:CreativeWork
148 https://doi.org/10.1016/s0379-6779(03)00195-4 schema:sameAs https://app.dimensions.ai/details/publication/pub.1046147274
149 rdf:type schema:CreativeWork
150 https://doi.org/10.1021/cm049617w schema:sameAs https://app.dimensions.ai/details/publication/pub.1055411168
151 rdf:type schema:CreativeWork
152 https://doi.org/10.1021/nl048355u schema:sameAs https://app.dimensions.ai/details/publication/pub.1056215869
153 rdf:type schema:CreativeWork
154 https://doi.org/10.1021/nl0603395 schema:sameAs https://app.dimensions.ai/details/publication/pub.1056216658
155 rdf:type schema:CreativeWork
156 https://doi.org/10.1021/nn9003633 schema:sameAs https://app.dimensions.ai/details/publication/pub.1056227141
157 rdf:type schema:CreativeWork
158 https://doi.org/10.1039/b705388f schema:sameAs https://app.dimensions.ai/details/publication/pub.1007790672
159 rdf:type schema:CreativeWork
160 https://doi.org/10.1063/1.114851 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057676883
161 rdf:type schema:CreativeWork
162 https://doi.org/10.1088/0957-4484/18/4/044007 schema:sameAs https://app.dimensions.ai/details/publication/pub.1010451421
163 rdf:type schema:CreativeWork
164 https://doi.org/10.1088/0957-4484/18/5/055306 schema:sameAs https://app.dimensions.ai/details/publication/pub.1034537995
165 rdf:type schema:CreativeWork
166 https://doi.org/10.1088/0957-4484/20/31/315304 schema:sameAs https://app.dimensions.ai/details/publication/pub.1041664454
167 rdf:type schema:CreativeWork
168 https://doi.org/10.1088/0957-4484/21/20/205304 schema:sameAs https://app.dimensions.ai/details/publication/pub.1043099816
169 rdf:type schema:CreativeWork
170 https://doi.org/10.1109/tsm.2006.890315 schema:sameAs https://app.dimensions.ai/details/publication/pub.1061791875
171 rdf:type schema:CreativeWork
172 https://doi.org/10.1116/1.1635849 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062169196
173 rdf:type schema:CreativeWork
174 https://doi.org/10.1116/1.2130352 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062171032
175 rdf:type schema:CreativeWork
176 https://doi.org/10.1116/1.588605 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062198652
177 rdf:type schema:CreativeWork
178 https://doi.org/10.1126/science.272.5258.85 schema:sameAs https://app.dimensions.ai/details/publication/pub.1062552676
179 rdf:type schema:CreativeWork
180 https://doi.org/10.2494/photopolymer.15.475 schema:sameAs https://app.dimensions.ai/details/publication/pub.1017638223
181 rdf:type schema:CreativeWork
182 https://www.grid.ac/institutes/grid.484633.e schema:alternateName Shanghai Nanotechnology Promotion Center
183 schema:name Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), 200237, Shanghai, China
184 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...