Impurity-defect interaction and diffusion in In-implanted nickel View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

1979-03

AUTHORS

A. Traverse, L. Thomé, L. Brossard, C. Cohen

ABSTRACT

Rutherford backscattering and time-differential perturbed angular correlation experiments were performed on In-implanted nickel foils annealed up to 900 K. The impuritydamage interaction is shown to anneal out just at (or very slightly below) the In diffusion temperature.

PAGES

333-337

References to SciGraph publications

  • 1978-01. Resistivity- and perturbed angular correlation-study of implanted nickel hydrides in HYPERFINE INTERACTIONS
  • 1977-01. Damage studies on the system in HYPERFINE INTERACTIONS
  • Identifiers

    URI

    http://scigraph.springernature.com/pub.10.1007/bf01021516

    DOI

    http://dx.doi.org/10.1007/bf01021516

    DIMENSIONS

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