Analysis of Ti-N films by calibration of Ti X-ray spectra View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

1991-05

AUTHORS

F. Stobiecki, T. Stobiecki, F. Kellner, K. Thoma, K. Röll, H. Gärtner

ABSTRACT

An energy-dispersive X-ray analysis of Ti1−xNx films was performed by using an Si(Li) detector. The Ti1−xNx films were sputtered on polished steel substrates in a mixed Ar+N2 atmosphere by a reactive magnetron sputtering technique. Because the nitrogen X-ray line is absorbed by the Be window, an analysis method was developed based solely on the calibration of the characteristic Ti-Kα-intensities using a high-purity Ti standard. The film compositions were computed by means of a ZAF procedure. The samples closest to stoichiometric composition show maximum hardness. More... »

PAGES

365-368

Journal

TITLE

Journal of Analytical Chemistry

ISSUE

5-6

VOLUME

341

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/bf00321938

DOI

http://dx.doi.org/10.1007/bf00321938

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1009912664


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