Composition of Ti-N films: EDX analysis during the sputtering process View Full Text


Ontology type: schema:ScholarlyArticle     


Article Info

DATE

1993-01

AUTHORS

T. Stobiecki, F. Stobiecki, B. Matthes, M. Sonsalla, F. Wittig, K. Röll

ABSTRACT

Energy dispersive X-ray (EDX) analysis was applied in-situ for measurements of composition, surface mass and deposition rate of Ti atoms during reactive sputtering. Electron beam excitation was used for the determination of composition and X-ray fluorescence (XRF) for the surface mass determination. Intensity measurements of the optical emission of Ti atoms agree well with the deposition rate of Ti atoms measured by XRF. The influences of nitrogen mass flow and negative bias substrate voltage on concentration and sputtering rate were investigated in homogeneous TiNx films and TiNx/TiNy multilayers. More... »

PAGES

192-195

References to SciGraph publications

  • 1991-05. Analysis of Ti-N films by calibration of Ti X-ray spectra in JOURNAL OF ANALYTICAL CHEMISTRY
  • Identifiers

    URI

    http://scigraph.springernature.com/pub.10.1007/bf00321411

    DOI

    http://dx.doi.org/10.1007/bf00321411

    DIMENSIONS

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