Adsorption of Organic Volatiles on Silicon Surfaces and Their Removal by Wet Cleaning View Full Text


Ontology type: schema:Chapter     


Chapter Info

DATE

1998

AUTHORS

Koichiro Saga , Takeshi Hattori

ABSTRACT

As semiconductor devices continue to be highly integrated and their geometries also continue to shrink, not only particulate and metallic contamination but also trace organic contamination adsorbing on the surface of silicon wafers has been found to have an increasingly detrimental impact on the performance and yield of semiconductor products. It has been shown that such organic contaminants have deleterious effects not only on the gate oxide integrity (GOI) [1–7] but also in the CVD step [8]. More... »

PAGES

566-583

Book

TITLE

Ultraclean Surface Processing of Silicon Wafers

ISBN

978-3-642-08272-6
978-3-662-03535-1

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-3-662-03535-1_44

DOI

http://dx.doi.org/10.1007/978-3-662-03535-1_44

DIMENSIONS

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