Application of Computer-Controlled SIMS to Depth Profiling of Impurities Implanted in Silicon with High Dose of B+or BF2 + Ions View Full Text


Ontology type: schema:Chapter     


Chapter Info

DATE

1984

AUTHORS

T. Tanigaki , S. Kawado , K. Nishiyama

ABSTRACT

Recently, TANIGAKI and co-workers have developed an electronic data processing system for an ion microprobe mass analyzer (ARL-IMMA) interfaced with a personal computer, that is to say an “automatic depth profiler” [1]. In this system, conversion of secondary ion intensity to atomic concentration and of sputtering time to depth scale can be easily carried out by setting two main parameters, viz. the measured conversion coefficient and the sputtering rate. More... »

PAGES

305-307

References to SciGraph publications

Book

TITLE

Secondary Ion Mass Spectrometry SIMS IV

ISBN

978-3-642-82258-2
978-3-642-82256-8

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-3-642-82256-8_81

DOI

http://dx.doi.org/10.1007/978-3-642-82256-8_81

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1029273105


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