Sputtering and Secondary Ion Yields of Ti-Al Alloys Subjected to Oxygen Ion Bombardment View Full Text


Ontology type: schema:Chapter     


Chapter Info

DATE

1984

AUTHORS

K. Inoue , Y. Taga , K. Satta

ABSTRACT

A principal approach to the fundamental understanding of SIMS process requires the accumulation of reliable data. Recently, we determined the yields of sputtering and secondary ion emission of pure metals under oxygen ion bombardment, and found some factors governing fundamental phenomena of SIMS[1].

PAGES

11-13

Book

TITLE

Secondary Ion Mass Spectrometry SIMS IV

ISBN

978-3-642-82258-2
978-3-642-82256-8

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-3-642-82256-8_3

DOI

http://dx.doi.org/10.1007/978-3-642-82256-8_3

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1007361624


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