A hollow-cathode plasma sputter source for production of metal cluster beams View Full Text


Ontology type: schema:Chapter     


Chapter Info

DATE

1995

AUTHORS

M. B. Nielsen , J. Borggreen , K. Hansen , J. Pedersen , B. Holst , M. Krogh , H. D. Rasmussen , E. Søndergård , A. Xenoulis

ABSTRACT

We have developed a source for the production of clusters of refractory metals by plasma sputtering. One aim is to produce metal clusters with a density of ~ 1012 atoms/cm3 in a size range of 102–105 atoms per cluster for the purpose of performing X-ray diffraction studies. Net sputtering rates have been measured for a Cu cathode, as a function of pressure, flow velocity, current, and cathode geometry. Computer simulations of the mass loss from the cathode reproduce the experimental results with reasonable agreement. More... »

PAGES

258-259

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-3-642-79696-8_61

DOI

http://dx.doi.org/10.1007/978-3-642-79696-8_61

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1003445128


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