Plasma-Jet Deposition of Diamond View Full Text


Ontology type: schema:Chapter     


Chapter Info

DATE

1998

AUTHORS

Mark A. Cappelli , Thomas G. Owano

ABSTRACT

The deposition of diamond using moderate- and high-pressure plasma jets is a promising alternative to the more conventional low-pressure plasma discharges (microwave, RF and DC glow discharges) and hot-filament chemical vapor deposition methods. Introduced in the mid- to late-1980s, these so-called “thermal” plasma methods are now widely use in the synthesis of diamond films. More... »

PAGES

59-84

References to SciGraph publications

Book

TITLE

Low-Pressure Synthetic Diamond

ISBN

978-3-642-71994-3
978-3-642-71992-9

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-3-642-71992-9_4

DOI

http://dx.doi.org/10.1007/978-3-642-71992-9_4

DIMENSIONS

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