Precisely Assembled Multi Deflection Arrays – Key Components for Multi Shaped Beam Lithography View Full Text


Ontology type: schema:Chapter      Open Access: True


Chapter Info

DATE

2012

AUTHORS

Matthias Mohaupt , Erik Beckert , Thomas Burkhardt , Marcel Hornaff , Christoph Damm , Ramona Eberhardt , Andreas Tünnermann , Hans-Joachim Döring , Klaus Reimer

ABSTRACT

Multi shaped beam lithography requires the precise and durable alignment and fixation of MEMS based Multi Deflection Arrays on stable ceramic system platforms using vacuum and high temperature compatible interconnection and joining technologies. Micron accuracy during assembly is accomplished by mark detection using image processing and 3DOF alignment procedures; while interconnection as well as precise fixation is carried out using a fine pitch solder bumping process. Qualification investigations using electron beam equipment show that the precisely aligned multi shaped beam arrays are able to deflect the electron beams in accordance with the simulation results. More... »

PAGES

42-50

Book

TITLE

Precision Assembly Technologies and Systems

ISBN

978-3-642-28162-4
978-3-642-28163-1

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-3-642-28163-1_6

DOI

http://dx.doi.org/10.1007/978-3-642-28163-1_6

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1034330769


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